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Publication of TW200617597ApublicationCriticalpatent/TW200617597A/en
The present invention provides a photosensitive composition for a black matrix of a color filter resin capable of easily forming a pattern having a thin film property and a high light-shielding property by a photolithography method, and having sufficient sensitivity, resolution, developability, durability, and curing rate. The photosensitive composition comprises a binder resin (A) and a black-base pigment (B), wherein the binder resin (A) contains a urethane acrylate compound which is a reaction product of an isocyanate compound (a-1) shown by formula (1) CH2=CH-COO-R-NCO (where R represents a 1-30C hydrocarbon group) with a polyhydroxy compound (a-2).
TW094112427A2004-04-232005-04-19Photosensitive composition for black matrix
TW200617597A
(en)
Curable resin composition, curable resin composition for photo-process patterning, color filter, substrate for liquid crystal panel and liquid crystal panel