TW200612550A - Dynamic random access memory and fabfication thereof - Google Patents

Dynamic random access memory and fabfication thereof

Info

Publication number
TW200612550A
TW200612550A TW093132910A TW93132910A TW200612550A TW 200612550 A TW200612550 A TW 200612550A TW 093132910 A TW093132910 A TW 093132910A TW 93132910 A TW93132910 A TW 93132910A TW 200612550 A TW200612550 A TW 200612550A
Authority
TW
Taiwan
Prior art keywords
plate
pillar
random access
access memory
dynamic random
Prior art date
Application number
TW093132910A
Other languages
Chinese (zh)
Other versions
TWI246184B (en
Inventor
Tinys Wang
Original Assignee
Promos Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/711,939 external-priority patent/US7119390B2/en
Application filed by Promos Technologies Inc filed Critical Promos Technologies Inc
Application granted granted Critical
Publication of TWI246184B publication Critical patent/TWI246184B/en
Publication of TW200612550A publication Critical patent/TW200612550A/en

Links

Landscapes

  • Semiconductor Memories (AREA)

Abstract

A dynamic random access memory (DRAM) cell is described, including a semiconductor pillar on a substrate, a capacitor on a lower portion of a sidewall of the pillar, and a vertical transistor on an upper portion of the sidewall of the pillar. The capacitor includes a first plate in the lower portion of the pillar, a second plate as an upper electrode at the periphery of the first plate, a third plate at the periphery of the second plate electrically connected with the first plate to form a lower electrode, and a dielectric layer separating the second plate form the first and the third plates. A DRAM array based on the DRAM cell and a method for fabricating the DRAM array are also described.
TW93132910A 2004-10-14 2004-10-29 Dynamic random access memory and fabrication thereof TWI246184B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/711,939 US7119390B2 (en) 2002-08-02 2004-10-14 Dynamic random access memory and fabrication thereof

Publications (2)

Publication Number Publication Date
TWI246184B TWI246184B (en) 2005-12-21
TW200612550A true TW200612550A (en) 2006-04-16

Family

ID=37191346

Family Applications (1)

Application Number Title Priority Date Filing Date
TW93132910A TWI246184B (en) 2004-10-14 2004-10-29 Dynamic random access memory and fabrication thereof

Country Status (1)

Country Link
TW (1) TWI246184B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI573265B (en) * 2014-07-18 2017-03-01 台灣積體電路製造股份有限公司 Semiconductor device and method of forming vertical structure

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100956602B1 (en) * 2008-04-01 2010-05-11 주식회사 하이닉스반도체 Method for fabricating semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI573265B (en) * 2014-07-18 2017-03-01 台灣積體電路製造股份有限公司 Semiconductor device and method of forming vertical structure

Also Published As

Publication number Publication date
TWI246184B (en) 2005-12-21

Similar Documents

Publication Publication Date Title
TW200727456A (en) Dynamic random access memory structure and method for preparing the same
WO2006083993A3 (en) Fabrication process for increased capacitance in an embedded dram memory
US7326611B2 (en) DRAM arrays, vertical transistor structures and methods of forming transistor structures and DRAM arrays
US20060289914A1 (en) Semiconductor constructions, memory cells, DRAM arrays, electronic systems; methods of forming semiconductor constructions; and methods of forming DRAM arrays
TW200715477A (en) Method and structure for a 1T-RAM bit cell and macro
TW200737502A (en) Phase-change memory device and methods of fabricating the same
TW200625548A (en) DRAM device having capacitor and method thereof
TW429613B (en) Dynamic random access memory with trench type capacitor
EP1722418A3 (en) Semiconductor memory device
TW200625532A (en) Semiconductor device having mim element
ATE479189T1 (en) ORGANIC FERROELECTRIC OR ELECTRICAL STORAGE CIRCUIT AND PRODUCTION METHOD THEREOF
TW200627590A (en) A semiconductor device and method of fabricating the same, and a memory device
TW200601485A (en) Semiconductor device substrate with wmbedded capacitor
TWI268601B (en) Semiconductor device and its manufacturing method increasing the active area of capacitor without increasing the substrate area
TW200511545A (en) Storage node contact forming method and structure for use in semiconductor memory
SG146524A1 (en) Capacitor top plate over source/drain to form a 1t memory device
TW200518233A (en) Method and structure for vertical dram devices with self-aligned upper trench shaping
TW200605272A (en) Single transistor dram cell with reduced current leakage and method of manufacture
TW200511561A (en) Dual poly layer and method of manufacture thereof
TWI267189B (en) Cell of dynamic random access memory and array structure of the same
WO2010074948A3 (en) Integrated circuit, 1t-1c embedded memory cell containing same, and method of manufacturing 1t-1c memory cell for embedded memory application
TW200715479A (en) Dynamic random access memory and manufacturing method thereof
TW200516718A (en) SRAM cell structure and manufacturing method thereof
WO2002050896A3 (en) Method for fabricating vertical transistor rench capacitor dram cells
TW200631094A (en) Method for integrally fabricating memory cell capacitor and logic device and structure thereof