TW200612070A - Flat vapor chamber and supporting structure thereof - Google Patents

Flat vapor chamber and supporting structure thereof

Info

Publication number
TW200612070A
TW200612070A TW093131269A TW93131269A TW200612070A TW 200612070 A TW200612070 A TW 200612070A TW 093131269 A TW093131269 A TW 093131269A TW 93131269 A TW93131269 A TW 93131269A TW 200612070 A TW200612070 A TW 200612070A
Authority
TW
Taiwan
Prior art keywords
supporting structure
vapor chamber
flat vapor
apertured layer
flat
Prior art date
Application number
TW093131269A
Other languages
Chinese (zh)
Other versions
TWI275763B (en
Inventor
Ming-Te Chuang
Chi-Feng Lin
Chin-Ming Chen
Original Assignee
Delta Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Delta Electronics Inc filed Critical Delta Electronics Inc
Priority to TW93131269A priority Critical patent/TWI275763B/en
Publication of TW200612070A publication Critical patent/TW200612070A/en
Application granted granted Critical
Publication of TWI275763B publication Critical patent/TWI275763B/en

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  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

The present invention discloses a flat vapor chamber and a supporting structure thereof. The supporting structure contacts wick structures adhered or the inner wall of the flat vapor chamber for preventing wick structures from separating so as to maintain heat dissipation efficiency of the flat vapor chamber. The supporting structure includes a multi-apertured layer allowing vapored working fluid to pass through and liquid working fluid to flow back by the capillary attraction of the multi-apertured layer. The multi-apertured layer is a foaming metal layer, of which porosity ranges from 70% to 95%, and about 30ppi to 100ppi(pore per inch).
TW93131269A 2004-10-15 2004-10-15 Flat vapor chamber and supporting structure thereof TWI275763B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW93131269A TWI275763B (en) 2004-10-15 2004-10-15 Flat vapor chamber and supporting structure thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW93131269A TWI275763B (en) 2004-10-15 2004-10-15 Flat vapor chamber and supporting structure thereof

Publications (2)

Publication Number Publication Date
TW200612070A true TW200612070A (en) 2006-04-16
TWI275763B TWI275763B (en) 2007-03-11

Family

ID=38646042

Family Applications (1)

Application Number Title Priority Date Filing Date
TW93131269A TWI275763B (en) 2004-10-15 2004-10-15 Flat vapor chamber and supporting structure thereof

Country Status (1)

Country Link
TW (1) TWI275763B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI394925B (en) * 2007-10-08 2013-05-01 Cheonpyo Park Evaporator

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI394925B (en) * 2007-10-08 2013-05-01 Cheonpyo Park Evaporator

Also Published As

Publication number Publication date
TWI275763B (en) 2007-03-11

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