TW200611987A - Evaporation mask - Google Patents

Evaporation mask

Info

Publication number
TW200611987A
TW200611987A TW093129888A TW93129888A TW200611987A TW 200611987 A TW200611987 A TW 200611987A TW 093129888 A TW093129888 A TW 093129888A TW 93129888 A TW93129888 A TW 93129888A TW 200611987 A TW200611987 A TW 200611987A
Authority
TW
Taiwan
Prior art keywords
mask
evaporation
substrate
layer
working unit
Prior art date
Application number
TW093129888A
Other languages
Chinese (zh)
Inventor
Te-Lang Yeh
Original Assignee
Onano Ind Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Onano Ind Corp filed Critical Onano Ind Corp
Priority to TW093129888A priority Critical patent/TW200611987A/en
Publication of TW200611987A publication Critical patent/TW200611987A/en

Links

Landscapes

  • Physical Vapour Deposition (AREA)

Abstract

An evaporation mask has a mask substrate made of material, such as glass, quartz, MgF2 or CaF2, having an expansion coefficient identical to that of an object to be machined. The mask substrate is arranged with at least one mask working unit arranged as a matrix. The mask working unit has a concave mask layer installed on the mask substrate. The thickness of the layer is about 50 to 500 μm. At least one penetrating recess with a patter corresponding to a predetermined pattern is formed on the mask layer as an evaporation hole. With respect to the thinner mask layer, a periphery of the mask working unit has a thicker rib for enhancing the structure of the mask substrate and preventing the deformation of the mask substrate. A cross section view of the hole has a shape identical to "/ \", "> <", "╭ ╮", "\ /", or "< >". By the high strength and lower expansion coefficient of the evaporation mask, the deformation in the evaporation process is avoided and thus the pattern in the evaporation film is retained. A high precision evaporation pattern is acquired on a machined working substrate.
TW093129888A 2004-10-01 2004-10-01 Evaporation mask TW200611987A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW093129888A TW200611987A (en) 2004-10-01 2004-10-01 Evaporation mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW093129888A TW200611987A (en) 2004-10-01 2004-10-01 Evaporation mask

Publications (1)

Publication Number Publication Date
TW200611987A true TW200611987A (en) 2006-04-16

Family

ID=57807717

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093129888A TW200611987A (en) 2004-10-01 2004-10-01 Evaporation mask

Country Status (1)

Country Link
TW (1) TW200611987A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI509095B (en) * 2012-01-12 2015-11-21 大日本印刷股份有限公司 A manufacturing method of the imposition-type deposition mask and a manufacturing method of the resulting stencil sheet and an organic semiconductor device
TWI576445B (en) * 2014-08-13 2017-04-01 友達光電股份有限公司 Mask for evaporation deposition process
TWI707965B (en) * 2019-09-27 2020-10-21 旭暉應用材料股份有限公司 Metal mask
CN112670433A (en) * 2021-01-30 2021-04-16 浙江宏禧科技有限公司 Method for preparing silicon-based OLED microdisplay anode by mask plate technology
CN113215530A (en) * 2021-06-10 2021-08-06 蒋承忠 Ultrathin glass mask plate and evaporation method
CN113235043A (en) * 2021-06-10 2021-08-10 蒋承忠 Ultra-thin glass mask and method for manufacturing same
CN113235044A (en) * 2021-06-10 2021-08-10 蒋承忠 Ultrathin glass mask plate and cleaning method thereof
CN113493892A (en) * 2020-03-18 2021-10-12 旭晖应用材料股份有限公司 Composite metal mask plate with function of improving mesh flatness
WO2022257222A1 (en) * 2021-06-10 2022-12-15 蒋承忠 Ultra-thin glass mask plate, evaporation method, and method for cleaning ultra-thin glass mask plate

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI509095B (en) * 2012-01-12 2015-11-21 大日本印刷股份有限公司 A manufacturing method of the imposition-type deposition mask and a manufacturing method of the resulting stencil sheet and an organic semiconductor device
TWI576445B (en) * 2014-08-13 2017-04-01 友達光電股份有限公司 Mask for evaporation deposition process
TWI707965B (en) * 2019-09-27 2020-10-21 旭暉應用材料股份有限公司 Metal mask
CN113493892A (en) * 2020-03-18 2021-10-12 旭晖应用材料股份有限公司 Composite metal mask plate with function of improving mesh flatness
CN112670433A (en) * 2021-01-30 2021-04-16 浙江宏禧科技有限公司 Method for preparing silicon-based OLED microdisplay anode by mask plate technology
CN113215530A (en) * 2021-06-10 2021-08-06 蒋承忠 Ultrathin glass mask plate and evaporation method
CN113235043A (en) * 2021-06-10 2021-08-10 蒋承忠 Ultra-thin glass mask and method for manufacturing same
CN113235044A (en) * 2021-06-10 2021-08-10 蒋承忠 Ultrathin glass mask plate and cleaning method thereof
WO2022257221A1 (en) * 2021-06-10 2022-12-15 蒋承忠 Ultra-thin glass mask and fabrication method therefor
WO2022257222A1 (en) * 2021-06-10 2022-12-15 蒋承忠 Ultra-thin glass mask plate, evaporation method, and method for cleaning ultra-thin glass mask plate

Similar Documents

Publication Publication Date Title
TW200611987A (en) Evaporation mask
EP1767965A1 (en) Electromagnetic wave shielding grid polarizer and its manufacturing method and grid polarizer manufacturing method
AR064178A1 (en) MULTILAMINARY ELEMENT, PROCEDURE TO MANUFACTURE AND USE
HK1119788A1 (en) Analog display element made of crystalline material, timepiece provided with a display element of this type and method for the production thereof
DK1786632T4 (en) Metallized security element
EP2302453A3 (en) Photomask blank and photomask
BRPI0408760A (en) laminated article, monolithic article and processes for producing a laminated article and a laminated substrate
DK1846253T3 (en) Process for producing a multilayer body as well as a multilayer body thus produced
BR0110082A (en) Apparatus and method for continuous surface modification of substrates
BR9912618A (en) Article comprising a multilayer optical film and process of making the same
BRPI0411907A (en) optical security element
US20090092791A1 (en) Mold, mold production process, processing apparatus, and processing method
TW200520609A (en) Mask, method for manufacturing thereof, method for manufacturing organic electroluminescent device, and organic electroluminescent device
PL1819842T3 (en) Method of fabricating a scratch resistant coated glass article including carbide layer(s) resistant to fluoride-based etchant(s)
CN102109623A (en) Concavo-convex pattern forming sheet and method for manufacturing the same, reflection preventing body, phase difference plate, process sheet original plate, and method for manufacturing optical element
TW200633791A (en) Method for fabricating nano-adhesive
ES2110412T3 (en) COMPENSATION OF THE EFFECTS OF PROXIMITY LITHOGRAPHIC AND ENGRAVING ATTACHMENT.
TW200732754A (en) Light diffusion plate for liquid crystal display
FR2847346B1 (en) METHOD FOR OBTAINING A MARKING ON A LOW ENERGY SURFACE ENERGY OPHTHALMIC LENS
DE602004012952D1 (en) Decorative part, process of making a decorative part, and clock
KR101371185B1 (en) Method for manufacturing a decoration element and a decoration element
BRPI0408747A (en) powder coatings and thin layer preparation process in the manufacture of printed circuit boards
ATE505339T1 (en) METHOD FOR PRODUCING A COMPOSITE PACKAGING MATERIAL FOR USE IN LITHOGRAPHIC OFFSET PRINTING
PT1419049E (en) METHOD OF MANUFACTURE OF A COMPOSITE PANEL OF GLASS STONE, AND PANEL OBTAINED THROUGH THAT METHOD
TW200739249A (en) Photomask, method for manufacturing such photomask and pattern forming method using such photomask