TW200609316A - Chemical-mechanical polishing composition and method for using the same - Google Patents

Chemical-mechanical polishing composition and method for using the same

Info

Publication number
TW200609316A
TW200609316A TW094107233A TW94107233A TW200609316A TW 200609316 A TW200609316 A TW 200609316A TW 094107233 A TW094107233 A TW 094107233A TW 94107233 A TW94107233 A TW 94107233A TW 200609316 A TW200609316 A TW 200609316A
Authority
TW
Taiwan
Prior art keywords
polishing composition
chemical
mechanical polishing
same
polishing
Prior art date
Application number
TW094107233A
Other languages
Chinese (zh)
Other versions
TWI329125B (en
Inventor
David J Schroeder
Kevin J Moeggenborg
Original Assignee
Cabot Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/US2004/029710 external-priority patent/WO2005026277A1/en
Application filed by Cabot Microelectronics Corp filed Critical Cabot Microelectronics Corp
Publication of TW200609316A publication Critical patent/TW200609316A/en
Application granted granted Critical
Publication of TWI329125B publication Critical patent/TWI329125B/en

Links

Abstract

The invention provides a chemical-mechanical polishing composition comprising: (a) fumed silica particles, (b) about 5 x 10 <SP>-3</SP> to about 10 millimoles per kilogram of at least one alkaline earth metal selected from the group consisting of calcium, strontium, barium, and mixtures thereof, based on the total weight of the polishing composition, (c) about 0.1 to about 15 wt. % of an oxidizing agent, and (d) a liquid carrier comprising water. The invention also provides a polishing composition, which optionally comprises an oxidizing agent, comprising about 5 x 10 <SP>-3</SP> to about 10 millimoles per kilogram of at least one alkaline earth metal selected from the group consisting of calcium, strontium, and mixtures thereof. The invention further provides methods for polishing a substrate using the aforementioned polishing compositions.
TW094107233A 2004-09-10 2005-03-09 Chemical-mechanical polishing composition and method for using the same TWI329125B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2004/029710 WO2005026277A1 (en) 2003-09-11 2004-09-10 Chemical-mechanical polishing composition and method for using the same

Publications (2)

Publication Number Publication Date
TW200609316A true TW200609316A (en) 2006-03-16
TWI329125B TWI329125B (en) 2010-08-21

Family

ID=45092478

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094107233A TWI329125B (en) 2004-09-10 2005-03-09 Chemical-mechanical polishing composition and method for using the same

Country Status (1)

Country Link
TW (1) TWI329125B (en)

Also Published As

Publication number Publication date
TWI329125B (en) 2010-08-21

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees