TW200605339A - Image sensor and fabricating method thereof - Google Patents
Image sensor and fabricating method thereofInfo
- Publication number
- TW200605339A TW200605339A TW093122849A TW93122849A TW200605339A TW 200605339 A TW200605339 A TW 200605339A TW 093122849 A TW093122849 A TW 093122849A TW 93122849 A TW93122849 A TW 93122849A TW 200605339 A TW200605339 A TW 200605339A
- Authority
- TW
- Taiwan
- Prior art keywords
- silicon
- insulator layer
- layer
- image sensor
- optical device
- Prior art date
Links
Abstract
An image sensor comprising an image sensing device layer, a silicon on insulator layer, a optical device array and a substrate is provided. The silicon on insulator layer has a first surface and a second surface. The image sensing device layer is formed on the first surface of the silicon on insulator layer. The optical device array is formed on the second surface of silicon on insulator layer. The substrate is configured above the second surface of the silicon on insulator layer and the optical device array is located between the substrate and the silicon on insulator layer. After emitting through the optical device array and the silicon on insulator layer, the light from environment is received by the photo sensor device forming in the image sensing device layer so as to reduce the probability of the absorption or reflection of the light and improve the photo sensing efficiency of the image sensor.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW93122849A TWI235490B (en) | 2004-07-30 | 2004-07-30 | Image sensor and fabricating method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW93122849A TWI235490B (en) | 2004-07-30 | 2004-07-30 | Image sensor and fabricating method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI235490B TWI235490B (en) | 2005-07-01 |
TW200605339A true TW200605339A (en) | 2006-02-01 |
Family
ID=36637690
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW93122849A TWI235490B (en) | 2004-07-30 | 2004-07-30 | Image sensor and fabricating method thereof |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI235490B (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI567960B (en) * | 2015-10-27 | 2017-01-21 | 晶睿通訊股份有限公司 | Image sensor with multi-exposure property and related image generating method |
US10644187B2 (en) | 2015-07-24 | 2020-05-05 | Artilux, Inc. | Multi-wafer based light absorption apparatus and applications thereof |
TWI713556B (en) * | 2015-07-24 | 2020-12-21 | 光澄科技股份有限公司 | Semiconductor light absorption structure and light absorption apparatus |
-
2004
- 2004-07-30 TW TW93122849A patent/TWI235490B/en active
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10644187B2 (en) | 2015-07-24 | 2020-05-05 | Artilux, Inc. | Multi-wafer based light absorption apparatus and applications thereof |
TWI713556B (en) * | 2015-07-24 | 2020-12-21 | 光澄科技股份有限公司 | Semiconductor light absorption structure and light absorption apparatus |
US11271132B2 (en) | 2015-07-24 | 2022-03-08 | Artilux, Inc. | Multi-wafer based light absorption apparatus and applications thereof |
US11316065B2 (en) | 2015-07-24 | 2022-04-26 | Artilux, Inc. | Multi-wafer based light absorption apparatus and applications thereof |
TWI567960B (en) * | 2015-10-27 | 2017-01-21 | 晶睿通訊股份有限公司 | Image sensor with multi-exposure property and related image generating method |
Also Published As
Publication number | Publication date |
---|---|
TWI235490B (en) | 2005-07-01 |
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