Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nagase Chemtex CorpfiledCriticalNagase Chemtex Corp
Publication of TW200604737ApublicationCriticalpatent/TW200604737A/en
Photosensitive Polymer And Photoresist Processing
(AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure
(AREA)
Laminated Bodies
(AREA)
Abstract
According to the present application, a method for preparing transparent permanent film being obtained by patenting the photosensitive resist film form on the substrate can be provided. The said method comprises a step that supple acidic solution to the photosensitive resist film made on the substrate to clean up, wherein the said film has been subjected to the espousing and developing treatments.
TW094120125A2004-06-182005-06-17Method for preparing transparent permanent film
TW200604737A
(en)