TW200604360A - Sputtering diamond-like target and method of making it - Google Patents
Sputtering diamond-like target and method of making itInfo
- Publication number
- TW200604360A TW200604360A TW093122077A TW93122077A TW200604360A TW 200604360 A TW200604360 A TW 200604360A TW 093122077 A TW093122077 A TW 093122077A TW 93122077 A TW93122077 A TW 93122077A TW 200604360 A TW200604360 A TW 200604360A
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- diamond
- target
- making
- sputtering
- Prior art date
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
Abstract
A sputtering diamond-like target comprising a substrate, a solder layer and an industrial diamond layer. A diffusing layer is formed between the industrial diamond layer and the solder layer. The diffusing layer makes the solder layer and the industrial diamond layer combined. The method of making the sputtering diamond-like target including the steps of: supplying a substrate, coating a solder layer, spraying an industrial diamond layer, vacuum welding the industrial diamond layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW93122077A TWI341873B (en) | 2004-07-23 | 2004-07-23 | Sputtering diamond-like target and method of making it |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW93122077A TWI341873B (en) | 2004-07-23 | 2004-07-23 | Sputtering diamond-like target and method of making it |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200604360A true TW200604360A (en) | 2006-02-01 |
TWI341873B TWI341873B (en) | 2011-05-11 |
Family
ID=45074814
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW93122077A TWI341873B (en) | 2004-07-23 | 2004-07-23 | Sputtering diamond-like target and method of making it |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI341873B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111320478A (en) * | 2020-03-27 | 2020-06-23 | 有研资源环境技术研究院(北京)有限公司 | Preparation method of carbon-silicon ceramic target material |
-
2004
- 2004-07-23 TW TW93122077A patent/TWI341873B/en not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111320478A (en) * | 2020-03-27 | 2020-06-23 | 有研资源环境技术研究院(北京)有限公司 | Preparation method of carbon-silicon ceramic target material |
CN111320478B (en) * | 2020-03-27 | 2022-02-11 | 有研资源环境技术研究院(北京)有限公司 | Preparation method of carbon-silicon ceramic target material |
Also Published As
Publication number | Publication date |
---|---|
TWI341873B (en) | 2011-05-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |