TW200604360A - Sputtering diamond-like target and method of making it - Google Patents

Sputtering diamond-like target and method of making it

Info

Publication number
TW200604360A
TW200604360A TW093122077A TW93122077A TW200604360A TW 200604360 A TW200604360 A TW 200604360A TW 093122077 A TW093122077 A TW 093122077A TW 93122077 A TW93122077 A TW 93122077A TW 200604360 A TW200604360 A TW 200604360A
Authority
TW
Taiwan
Prior art keywords
layer
diamond
target
making
sputtering
Prior art date
Application number
TW093122077A
Other languages
Chinese (zh)
Other versions
TWI341873B (en
Inventor
Shr-Je Jian
Original Assignee
Hon Hai Prec Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hon Hai Prec Ind Co Ltd filed Critical Hon Hai Prec Ind Co Ltd
Priority to TW93122077A priority Critical patent/TWI341873B/en
Publication of TW200604360A publication Critical patent/TW200604360A/en
Application granted granted Critical
Publication of TWI341873B publication Critical patent/TWI341873B/en

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

A sputtering diamond-like target comprising a substrate, a solder layer and an industrial diamond layer. A diffusing layer is formed between the industrial diamond layer and the solder layer. The diffusing layer makes the solder layer and the industrial diamond layer combined. The method of making the sputtering diamond-like target including the steps of: supplying a substrate, coating a solder layer, spraying an industrial diamond layer, vacuum welding the industrial diamond layer.
TW93122077A 2004-07-23 2004-07-23 Sputtering diamond-like target and method of making it TWI341873B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW93122077A TWI341873B (en) 2004-07-23 2004-07-23 Sputtering diamond-like target and method of making it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW93122077A TWI341873B (en) 2004-07-23 2004-07-23 Sputtering diamond-like target and method of making it

Publications (2)

Publication Number Publication Date
TW200604360A true TW200604360A (en) 2006-02-01
TWI341873B TWI341873B (en) 2011-05-11

Family

ID=45074814

Family Applications (1)

Application Number Title Priority Date Filing Date
TW93122077A TWI341873B (en) 2004-07-23 2004-07-23 Sputtering diamond-like target and method of making it

Country Status (1)

Country Link
TW (1) TWI341873B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111320478A (en) * 2020-03-27 2020-06-23 有研资源环境技术研究院(北京)有限公司 Preparation method of carbon-silicon ceramic target material

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111320478A (en) * 2020-03-27 2020-06-23 有研资源环境技术研究院(北京)有限公司 Preparation method of carbon-silicon ceramic target material
CN111320478B (en) * 2020-03-27 2022-02-11 有研资源环境技术研究院(北京)有限公司 Preparation method of carbon-silicon ceramic target material

Also Published As

Publication number Publication date
TWI341873B (en) 2011-05-11

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees