TW200538581A - Preparation method of film-coating target - Google Patents

Abstract

This invention utilizes a method of electroplating or electroless plating to prepare a composite target wherein a phosphorous or boron containing film is formed on a substrate. The ratio of phosphorous or boron atoms of the phosphorous or boron containing film can be controlled by utilizing the solution or process parameters variation during the electroplating or electroless plating. By means of addition of the necessary amounts of phosphorous or boron atoms in the process of film coating, a multiple functional film coating can be used under a high temperature and better heat circulation properties and mechanical properties can be obtained.

Description

200538581 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a method for adding an atom of a mineral film, boron and other atoms to a coated alloy target, especially a method for preparing phosphorus, phosphorus, and W materials. The addition amount of ytterbium and boron atoms required in the coating process can be accurately controlled. [Prior technology] Sputtering DeDosWi · ^, (glow discharge) ^ ^ ^ CAr) ^ ^, the atoms of the target are ejected and deposited on the substrate surface shape a ^ \ et The properties and uniformity of the film are better than those of evaporation Woman with thin film; Type of shovel: Prepared by γ Capital: Use powerful magnets to spiral electrons to accelerate :: Zhou You; =: Γ, which increases the probability of collision with chlorine ions, and most of the metal coatings DC sputtering is used instead of RF sputtering. The basic principle is to use a glow discharge in a vacuum to strike argon (Ar) ions into the target (cations in the u-side plasma). Accelerate the impact to the negative electrode surface as the material to be sputtered. This impact will cause the target material to fly out and be deposited on the substrate to form a thin film. * Generally, there are several characteristics of thin film coating using the sputtering process: ( 1) Metals, alloys or insulators can be made into thin film materials. (2 Re-suitability ♦: Under the set conditions, multiple and complex targets can be made into thin films of the same composition. (3) Adding oxygen or other to the discharge atmosphere Reactive gas, / 'J Μ production Mixtures or compounds of target materials and gas molecules. (4) The inflow and sputtering time of the material can be controlled, and it is easy to obtain high-precision film thickness. Υ 1

5 Page 5 200538581 V. Description of the invention (2) Are other processes beneficial? Large area of uniform film. (6) The sputtered particles are almost unaffected by gravity. The position of the dry material and the substrate can be freely arranged. (7) The adhesion strength between the substrate and the film is more than 10 times that of the ordinary steam-bonded film, and because the sputtered particles have south energy 'the surface will continue to diffuse on the film-forming surface to obtain a hard and dense film' and this high energy A crystal film can be obtained by lowering the temperature of the substrate. (8) The nucleation density is high at the initial stage of the osmium film formation, and it is possible to produce an extremely thin continuous film at 100 nm. (9) The dry material has a long life and can be continuously and automatically produced for a long time. (10) The material can be made into various shapes, and the special design of the machine can be used for better control and most efficient production. Multi-component bond films are widely used in the so-called hard coating and surface treatment projects in the industry because they provide high hardness and robustness, and have good corrosion resistance and thermal cycling. They also provide functional coatings. There are many methods for making multicomponent alloys today, and in terms of multicomponent coatings, vacuum physical or chemical vapor deposition methods are mostly used. Among them, the vacuum physical vapor phase recording method for the multi-layer coating requires the use of one or more target materials, and the one or more dry materials contain all the elements in the multi-layer coating. When using a single target to plate multiple coatings, a single target must have all the required multielements. However, when the composition of the target material is fixed, the composition of the plated $ 疋 film is also fixed, and there is no room for composition adjustment. Therefore, it is more difficult to design the target material for single-target coating. The use of a multi-target vacuum coating method can improve the shortcomings of single target coatings in terms of component control. In a multi-target system, the elements required for each target are: one year or even one yuan, the elements of the coating film layer can be adjusted, and the adjustment method can be adjusted according to the parameters of each target. Therefore, you can Precise

200538581

V. Description of the invention (3) Control the amount of each element in the multi-layer coating. In addition, research data show that the use of phosphorus, boron, and other atoms can enable the multifunctional functional coating to obtain better thermal cycling and mechanical properties due to the precipitation of the second phase at high temperatures. However, the melting point of natural pure phosphorus is extremely low. Generally, dry materials in vacuum coating will be attacked by electricity, causing the temperature to reach more than Baidu. Therefore, pure osmium cannot be widely used in the vacuum coating process, which makes it impossible to add 璘 or The disadvantages of rotten atoms. [Summary of the Invention] The main object of the present invention is to provide a multi-mineral mineral film Gebaong containing phosphorus or boron. A method for preparing a multi-functional functional coating under high temperature by using a single target material containing phosphorus or boron and other atoms Due to the precipitation of the second phase, better thermal cycling and mechanical properties are obtained. Another object of the present invention is to use a multi-target coating system (including two or more systems) to deposit the required elements on the substrate and control the content of atoms such as phosphorus or boron.

In the present invention, an electro-plating or electroless plating method is used to fabricate a film containing lin or which on a substrate to become a composite target, and the phosphorus or boron film i Or the proportion of boron can be controlled by the change of solution or process parameters during electroplating or electroless plating. In this way, the required amount of phosphorus, boron and other atoms can be added in the bonding film manufacturing process, so that the multifunctional functional bonding film can obtain better thermal cycling and mechanical properties under the use of South temperature. [Embodiment]

200538581 V. Description of the invention (4) The detailed technical content of the present invention and its preferred embodiments are described below with reference to the drawings. Please refer to "Figure 1" for the schematic view of the composite coating target of the present invention. Because the natural pure structure and the point of refining the Buddha are extremely low, the material in the vacuum forging film will be bombarded with electricity, which will cause the temperature to reach Baidu or more. Disadvantages of atoms such as phosphorus or boron. Therefore, it must exist in the form of an alloy. This is a method for preparing a film recording material proposed by the present invention, which uses electroplating (£ 1 ^ 1 ^ 〇1) 131: 丨 1 ^) or electroless plating. A film 20 is formed on a substrate 10, and the film layer 20 contains atoms such as phosphorus or boron to form a composite target, and the ratio of the filling or boron in the film layer 20 containing phosphorus or boron It can use the change of solution or process parameters when using electricity (or electroless plating), so that the content of boron or boron in the film layer 20 can be accurately controlled, from 0.5 to 25% (atomic ratio) in the film layer 20 thick. The film is used as a target containing phosphorus or boron in a multi-target coating process. In this way, atoms containing phosphorus and boron are added to the coating process during the process of the mineral film. If the multifunctional functional coating is used at high temperature, it can obtain better thermal cycling and mechanical properties. Where 'the substrate is selected from the group consisting of copper, iron, copper, > 6th, titanium, copper, iron, molybdenum, ruthenium, germanium, palladium, thorium, button, tungsten, baht, hungry, iridium, chromium, manganese, "I W, made of silver, gold and one of the combinations, and the film system can be one of Shao, Shao, chromium, tungsten and their combinations. For the description of the manufacturing process, please refer to "Figure 2", which is the manufacturing process of the target of the electric ore method of the present invention. First for substrate 10, first

200538581 V. Description of the invention (5) Cutting 31, polishing of the substrate surface 32 and polishing of the substrate surface 33, etc. At the same time, the electro-mineral fluid 34 is prepared, and the plating solution 34 includes Nis% · 6 仏 〇 (150 G / L),] \ ^ 〇12 * 6 [120 (45 g / L),] \ ^ (] 〇3.1〇 {| 2〇 (40 g / L), 3P04 (50 g / L), and H3P 〇3 (50 g / L). 2 The last polished substrate 10 is subjected to electroplating process 35 in a plating solution 34, wherein the modulation parameters of the electroplating process 35 are temperature 50 ° c, pn13, and current density 10 〇11 ^ / (: 1112 and coating time of 1 to 5 hours; finally, the finished material is washed in clean water for 36 minutes, if it can complete an X layer containing ^ or boron film 20, and become a Composite target material. Please refer to "Figure 3" again for the production process of the electroless target material 4 of the present invention. First of all, for substrate 10, substrate cutting 41, substrate surface grinding 42 and substrate Surface polishing 43 and other steps, and at the same time, an electroless mineral liquid 44 is prepared. The electroplating liquid 44 includes NiS04 · 6H20 (20 g / L),

NaC4H4 04 · 6Η20 (16 g / L) and NaH2P〇2 · Η20 (27 g / L). The final polished substrate 10 is subjected to an electroless ore application 45 in an electroless ore solution 44. The adjustment parameters of the electroless plating application 45 are a volume area ratio of 20 cm3 / cm2, a temperature of 70 to 90 C, ρΗ4.0 to 5.8, Mineral film time 1 to 2 hours

Time and coating batch 1 to 20 times; finally, the target after plating is washed in clean water for 36 two minutes. If it can complete a film layer 20 containing phosphorus or boron, it becomes a composite handle. U In summary, through electrical keying or electroless plating technology, it is possible to produce 20-layer target materials containing phosphorus or · with precisely controlled composition, and it can be combined with other pure element or alloy target materials required in the multi-layer coating process. The multi-target coating system can be combined with a multi-target vacuum coating system. By using the parameter adjustment of each target,

200538581

With the precise control of the addition of the multi-component recording film, the multi-functional coating can obtain better thermal cycling and mechanical properties in the presence of atoms such as phosphorus and boron. Quality: Quality, etc. This is only a preferred embodiment of the present invention, and is not intended to indicate the scope of implementation, that is, all equivalent changes and modifications made in accordance with the scope of the patent application for the present invention are covered by the scope of the invention patent.

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200538581 ί: Base material 20: Film layer 31, 41: Base material cutting 32, 42: Base material surface polishing 33, 43: Base material surface polishing 34: Electric key liquid 3 5: Electric key application 3 6, 4 6: Washing strip 4 4: electroless mineral fluid 4 5: electroless plating

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Claims (1)

200538581 VI. Scope of patent application 1 · A method for preparing coated targets, which is characterized by, The layer is made on a substrate ~ This film layer is made of a compound, such as phosphorus or boron, by using the electroplating method. Film 2 · The coating target preparation method described in item 1 of the scope of the patent application, where the substrate is selected from the group consisting of copper, iron, diamond, crushed, chin, jealous, ruthenium, rhodium, palladium, rhenium , Button, tungsten, baht, iron, iridium, chromium, manganese, germanium platinum, silver and gold. 3. The method for preparing the mineral film dry material as described in item 1 of the scope of patent application, Molybdenum Wherein, the film layer may be one of nickel, aluminum, chromium, tungsten and combinations thereof 4. The method for preparing a coating target as described in item 1 of the scope of patent application, wherein the content of phosphorus or boron in the film layer 20 is controlled by changes in the solution or process parameters during electroplating. 5 · The method for preparing a coating target according to item 3 of the scope of the patent application, wherein the content of the phosphorus or boron is 0.5 to 25% (atomic ratio) in the film layer. 6 · The method for preparing a coating target as described in item 3 of the scope of the patent application, wherein the electroless plating (£ 4 (: 1: 1: 00-1 &1; 丨 1 ^) method can still use electroless plating ) Instead. Page 12