TW200527453A - Symmetrical inductor - Google Patents

Symmetrical inductor Download PDF

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Publication number
TW200527453A
TW200527453A TW93102697A TW93102697A TW200527453A TW 200527453 A TW200527453 A TW 200527453A TW 93102697 A TW93102697 A TW 93102697A TW 93102697 A TW93102697 A TW 93102697A TW 200527453 A TW200527453 A TW 200527453A
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Taiwan
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segment
metal layer
wire segment
symmetrical
contact plug
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TW93102697A
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Chinese (zh)
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TWI249752B (en
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Jing-Horng Gau
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United Microelectronics Corp
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Publication of TWI249752B publication Critical patent/TWI249752B/en

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Abstract

A symmetrical inductor includes a first metal layer, the first metal layer having a first conductive segment disposed on a first side of a line, and a second conductive segment disposed on a second side of the line, the second conductive segment and the first conductive segment being symmetrical to the line; a second metal layer, the second metal layer having a third conductive segment disposed on the first side of the line, and a fourth conductive segment disposed on the second side of the line, the fourth conductive segment and the third conductive segment being symmetrical to the line; a first contact plug for connecting the first conductive segment with a first end of the third conductive segment; a second contact plug for connecting the first conductive segment with a second end of the third conductive segment; a third contact plug for connecting the second conductive segment with a first end of the fourth conductive segment, the third contact plug and the first contact plug being symmetrical to the line; and a fourth contact plug for connecting the second conductive segment with a second end of the fourth conductive segment, the fourth contact plug and the second contact plug being symmetrical to the line.

Description

200527453200527453

【發明所屬之技術領域】 本發明係概括關於一 感結構。 種電感結構,尤指 一種對稱型電 【先前技術】 電感是一種利用磁場型式夾曰 具有抗拒流經電流大小產生改㈣f犯罝之被動元件,其 互搭配應用於各式盔線通^ φ< 寺性,常見與電容器相 流、相位匹配、濾波以及諸振等功能!電感 由一導線迴圈或線圈構成,苴雷片 1 : 、'、口構疋 數、?細、長^、半徑以及圈内填充物種類等因素。: 1體,程中’為了將電感結構整合至積體電路晶片上, 前多是利用二層金屬之佈局圖案設計以及連接於二金 之間之接觸插塞來形成導線迴圈。 g 凊參考圖一’圖一為習知一電感結構示意圖。如圖 所示,習知之電感10係為一差動電感(differential inductor),其包含有一第一金屬層,第一金屬層係由_ 交錯纏繞之第一導線段12與第二導線段14構成一近似圓形 圖案,且第一導線段12與第二導線段14包含有二重疊區域 A與B。電感10另包含有一第二金屬層’且第一金屬層至少 包含有一第三導線段20設於第一導線段12與第二導線段14 200527453 五、發明說明(2) 之重疊區域A下方,以及一第四導線段24設於第一導線段 12與第二導線段14之重疊區域B下方。第二金屬層與第一 金屬層之間另設有一介電層(未顯示)以及複數個接觸插塞 16, 18, 22,26貫穿於介電層之間,以用來連接第一金屬層 與第二金屬層。舉例而言,第二導線段1 4、第三導線段2 〇 於重疊區域A處係利用接觸插塞1 6、1 8相連接,而第一導 線段1 2、第四導線段24於重疊區域B處則係利用接觸插塞 2 2、2 6相連接。 ^ 習知之 區域並無法 處,第二導 段20,而第 金屬層,以 插塞22、26 要利用接觸 動訊號(V +, 導致訊號不 (phase no i 【發明内容 電感10於第 提供一完全 線段1 4需利 一導線段1 2 及於重疊區 連接至第四 插塞連接至 V -)將因此 對稱,並且 s e)專情形 一導線段12與第二導線段14之重疊 對稱之結構,例如於重疊區域A 用接觸插塞16、18連接至第=導唆 則不需要利用接觸插塞連以; iBA,〇第—導線段12需利用接觸 ί線ί2居4 ’而第二導線段14則不需[Technical Field to which the Invention belongs] The present invention relates generally to a sense structure. An inductive structure, especially a symmetrical type of electricity [Prior technology] An inductor is a passive component that uses a magnetic field type to resist changes in the magnitude of the current flowing through it. It is used in conjunction with various types of helmets ^ φ < Temple, common with capacitor phase flow, phase matching, filtering and various functions! Inductance consists of a wire loop or coil. The thunder plate 1:, ', the number of openings,? Factors such as thinness, length ^, radius, and kind of packing in the circle. : 1 body, Cheng Zhong ’In order to integrate the inductor structure on the integrated circuit chip, the former mostly uses a two-layer metal layout pattern design and a contact plug connected between the two gold to form a wire loop. g 凊 Refer to Figure 1 'Figure 1 is a schematic diagram of a conventional inductor structure. As shown in the figure, the conventional inductor 10 is a differential inductor, which includes a first metal layer. The first metal layer is composed of a first wire segment 12 and a second wire segment 14 that are intertwined. An approximately circular pattern, and the first lead segment 12 and the second lead segment 14 include two overlapping regions A and B. The inductor 10 further includes a second metal layer ′ and the first metal layer includes at least a third wire segment 20 provided below the overlapped area A of the first wire segment 12 and the second wire segment 14 200527453 5. Description of the invention (2), And a fourth wire segment 24 is disposed below the overlapping area B of the first wire segment 12 and the second wire segment 14. A dielectric layer (not shown) and a plurality of contact plugs 16, 18, 22, and 26 are interposed between the second metal layer and the first metal layer to connect the first metal layer. With a second metal layer. For example, the second wire segment 14 and the third wire segment 20 are connected at the overlapping area A by using contact plugs 16 and 18, and the first wire segment 12 and the fourth wire segment 24 overlap each other. Area B is connected by contact plugs 2 2, 2 6. ^ The known area is not available, the second guide section 20, and the second metal layer to plugs 22, 26 must use the contact signal (V +, resulting in a signal no (phase no i [Content of the invention] The complete line segment 14 needs a lead segment 12 and a fourth plug connected to V in the overlapping area.-) Will therefore be symmetrical, and se) in a special case the overlapping and symmetrical structure of the lead segment 12 and the second lead segment 14. For example, in the overlapping area A, the contact plugs 16 and 18 are used to connect to the third lead, and the contact plugs do not need to be connected; iBA, the first-conductor segment 12 needs to use the contact line 2 to 4 'and the second lead Segment 14 is not required

Sift,因此電感10兩端之差 it π 1 構衍生寄生電阻差異, 進而造成相位莫 ,ψ ^ 差/、以及相位雜訊 厫重影響電路特性。 因此,本發明之目的即在提 以解決上述問題。 供 種對稱型電感結構Sift, so the difference between the two ends of the inductor 10 it π 1 structure causes a difference in parasitic resistance, which in turn causes phase errors, ψ ^ difference /, and phase noise to heavily affect the circuit characteristics. Therefore, the object of the present invention is to solve the above problems. For a symmetrical inductor structure

$ 9頁 200527453 五、發明說明(3) 在本發明之較佳實施例 一金屬層,第一金屬層包含 之第一側,以及一第二導線 導線段與第一導線段係對稱 二金屬層包含有一第三導線 一第四導線段設於對稱線之 導線段係對稱於對稱線;一 導線段至第三導線段之一端 第一導線段至第三導線段之 對稱於對稱線之第三接觸插 四導線段之一端;以及一與 之第四接觸插塞,用來連& 一端。 中’該對稱型電感包含有一第 有一第一導線段設於一對稱線 段設於對稱線之第二側,第二 於對稱線;一第二金屬層,第 段設於對稱線之第一侧,以及 第二側,且第四導線段與第三 第一接觸插塞,用來連接第一 ;一第二接觸插塞,用來連接 另一端;一與第一接觸插塞相 塞,用來連接第二導線段至第 第二接觸插塞相對稱於對稱線 第一導線段至第四導線段之另 由於本發明是利用佈局圖案之設計來形成對稱〗 感莫::利用第一金屬層於直線之兩側形成相互 =導線段、第二導線段,利用第二金屬層於直2 =第 複數個斟ί Ϊ 導線段、第四導線段,並且進一步利用 1 Ϊ Γ ί稱於直、線兩側之接觸插S來連接$ —金屬層^笛 :收屬s ,因此本發明可以有效利用完全對稱之^二 ::低寄生電阻差* ’改善訊號不對稱、相】J j 位雜訊等問題。 尽共以及相$ 9 页 200527453 V. Description of the invention (3) In the preferred embodiment of the present invention, a metal layer, the first metal layer includes a first side, and a second wire segment and the first wire segment are symmetrical two metal layers. A wire segment including a third wire and a fourth wire segment disposed on the symmetry line is symmetrical to the symmetry line; one wire segment to one end of the third wire segment is symmetrical to the third wire segment to the third symmetry line One end of the four-wire section of the contact plug; and a fourth contact plug for connecting to the & end. "The symmetrical inductor includes a first first lead segment provided on a symmetrical line segment provided on the second side of the symmetrical line, and a second portion on the symmetrical line; a second metal layer, and the second segment provided on the first side of the symmetrical line , And the second side, and the fourth wire segment and the third first contact plug are used to connect the first; a second contact plug is used to connect the other end; To connect the second lead segment to the second contact plug is symmetrical to the first lead segment to the fourth lead segment of the symmetry line. The present invention uses a layout pattern design to form symmetry. The layers are formed on both sides of the straight line = the wire segment and the second wire segment, and the second metal layer is used for the straight 2 = the plurality of pours Ϊ the wire segment and the fourth wire segment, and 1 Ϊ Γ is also called the straight The contact between the two sides of the wire is inserted by S to connect $ — metal layer ^ flute: it belongs to s, so the present invention can effectively use the full symmetry ^ 2: low parasitic resistance difference * 'improve signal asymmetry, phase] J j bit Noise and other issues. Share everything

第10頁 200527453 五、發明說明(4) 【實施方式】Page 10 200527453 V. Description of the invention (4) [Embodiment]

請參考圖二,圖 示意圖。如圖二所示 第一金屬層,第一 導線 32與 32與 為該 且第 段44 設置 四導 段34對稱 第二導線 第二導線 圓形圖案 二金屬層 對稱設置 於第三導 線段44上 設置於 段34均 段34約 之一直 至少包 於對稱 線段3 8 方。此 一為本發明第一實施例之一電感結構 ’電感30係為一差動電感,其包含有 金屬層係由一第一導線段3 2與一第二 一對稱線L兩側所形成,第一導線段 包含至少一螺旋圖形,且第一導線段 略幵> 成至少一圓形圖案,對稱線L則 徑。電感30另包含有一第二金屬層, 含有一第三導線段3 8以及一第四導線 線L兩側,其中第一導線段32係部分 上方’第二導線段3 4係部分設置於第 外,在本發明之其他實施例中,第二 金屬層亦可設置於第一金屬層上方,使得第一導線段3 2係 部分設置於第三導線段38下方,而第二導線段34係部分設 置於第四導線段44下方。第二金屬層與第一金屬層之間另 設有至少一介電層(未顯示)以及複數個接觸插塞 36, 40, 42, 46貫穿於介電層之間,以用來連接第一金屬層 與第二金屬層。舉例而言,第一導線段32至少包含有一第 一接觸點、一第二接觸接觸點分別與第二導線段3 4之一第 三接觸點、一第四接觸點相對稱於對稱線L,且第一導線 段3 2係分別利用接觸插塞3 6使其第一接觸點連接至第三導 線段3 8之一端’以及利用接觸插塞4 0使其第二接觸點連接 至第三導線段之另一端,至於第二導線段3 4則係分別利用Please refer to Figure 2. As shown in FIG. 2, the first metal layer 32 and 32 are symmetrically provided with a four-conductor segment 34 for the first segment 44, the second conductor is a second conductor circular pattern, and the second metal layer is symmetrically disposed on the third conductor segment 44. It is set at about the average of the segment 34 and at least the symmetrical line segment 3 8. This is an inductive structure of the first embodiment of the present invention. The inductor 30 is a differential inductor, which includes a metal layer formed by a first wire segment 32 and two sides of a second-symmetric line L. The first wire segment includes at least one spiral pattern, and the first wire segment is slightly > formed into at least a circular pattern, and the symmetry line L has a diameter. The inductor 30 further includes a second metal layer, including a third wire segment 38 and a fourth wire L on both sides, wherein the first wire segment 32 is above the second line segment, and the second wire segment 34 is located outside the second line segment. In other embodiments of the present invention, the second metal layer may also be disposed above the first metal layer, so that the first lead segment 32 and the second lead segment are disposed under the third lead segment 38 and the second lead segment and the 34 lead segment are provided. It is disposed below the fourth lead segment 44. At least one dielectric layer (not shown) and a plurality of contact plugs 36, 40, 42, 46 are interposed between the second metal layer and the first metal layer to connect the first layer. A metal layer and a second metal layer. For example, the first lead segment 32 includes at least a first contact point, a second contact contact point and a third contact point and a fourth contact point of the second lead segment 34, respectively. And the first wire segment 32 is connected to the first contact point of one of the third wire segments 38 using the contact plug 36 and the second contact point is connected to the third wire using the contact plug 40. The other end of the segment, as for the second conductor segment 3 4 are used separately

200527453 五、發明說明(5) 接觸插塞42使其第二接觸點連接至第四導線段44之一端, 以及利用接觸插塞46使其第四接觸點連接至第四導線段之 另一端。 由於本發明之第一金屬層、第二金屬層以及連接其間 ^接觸插塞等圖案均係對稱於對稱線兩側而設置,因此^ 發明電感可以提供兩端之差動訊號(v +, v_) 一完全對稱妹 ,^以有效改善電感品質,避免相位雜訊等問題。此外,° i 11ΐ ΐ型ϊ感結構可以進一步於設計佈局圖案時’使 化韓角(4層n 一導線段與第二導線段之轉角處形成圓形 化轉角(rounded corner),以避免電流轉生 成局部之電阻值增加,降低雷g ^200527453 V. Description of the invention (5) The contact plug 42 connects its second contact point to one end of the fourth wire segment 44 and the contact plug 46 connects its fourth contact point to the other end of the fourth wire segment. Because the patterns of the first metal layer, the second metal layer, and the contact plugs of the present invention are arranged symmetrically on both sides of the symmetrical line, the invention inductor can provide a differential signal (v +, v_ ) A completely symmetrical girl, to effectively improve the quality of the inductor and avoid problems such as phase noise. In addition, the ° i 11ΐ ΐ-shaped ϊ-shaped structure can further 'turn the corners of the Korean corners (the corners of the four-layer n-conductor segment and the second-conductor segment to form a rounded corner) when designing the layout pattern to avoid current The local resistance value increases to reduce the lightning g ^

-t〇r)。值得注意的= W 定具有圓形圖案之電感結構月他冉田型^電感結構亚不限 而設置之複數層金屬層、導線^^ ^對稱於對稱線兩側 等結構所形成之各式電感;、C”之接觸插塞 u ^ 勺適用於本發明。 請參考圖三,圖三為本發明 示意圖。如圖三所示,電感 =—^靶例之一電感結構 -第-金屬層,第一金一差動電感,其包含有 導線段54對稱設1於一對由—第一導線段5 2與一第二 5 2 與第二導、二置4:包:;; 52與第二導線段54約略形成i少螺2形,且第-導線段 為該圓形圖案之一直徑。電感 案第對=則 有一第一金屬層-tor). It is worth noting that = W must have a circular pattern of inductor structure. ^ Inductor structure is not limited to a plurality of layers of metal layers, wires ^^ ^ various types of inductors formed symmetrically on both sides of the symmetrical line The contact plug u ^ of C ”is suitable for the present invention. Please refer to FIG. 3, which is a schematic diagram of the present invention. As shown in FIG. The first gold-differential inductor includes a wire segment 54 symmetrically provided in a pair of first wire segments—the first wire segment 5 2 and the second 5 2 and the second conductor 4 and the second set 4: package :; 52 and the first The two lead segments 54 are approximately formed in the shape of i-snail 2 and the-lead segment is one of the diameters of the circular pattern. The inductance pair = a first metal layer

200527453 五、發明說明(6) 58,以及至少一介電層(未顯示)設置於第一金眉層52、54 與第二金屬層58之間,其中第一導線段52與第二導線段54 係部分覆蓋於第二金屬5 8上方,此外,在本發明之其他實 施例中,第二金屬層58亦可設置於第一金屬層52、54上 方,使得第一導線段52與第二導線段54係部分設置於第二 金屬層58下方。第一金屬層52、54與第二金屬層58係利用 複數個貫穿於介電層間之接觸插塞56, 60來進行連接。舉 例而言,第一導線段5 2至少包含有一第一接觸點與第二導 線段5 4之一第二接觸點相對稱於對稱線[,且第一導線段 5 2係利用接觸插塞5 6使其第一接觸點連接至第二金屬層5 8 之一端,而第二導線段54則係利用接觸插塞6〇使其第二接 觸點連接至第二金屬層58之另—端。 由於本發明之弟一金屬層 之接觸插塞等圖案均係對稱於 發明電感可以提供兩端之差動 構,以有效改善電感品質,避 本發明對稱型電感結構可以進 第一金屬層之第一導線段與第 化轉角,以避免電流集中於轉 加,降低電感之品質因數。值 電感結構並不限定具有圓形圖 稱於對稱線兩側而設置之複數 其間之接觸插塞等結構所形成 、第二金屬層以及連接其間 對稱線兩側而設置’因此本 訊號(V +,V_) 一完全對稱結 免相位雜訊等問題。此外, —步於設計佈局圖案時,使 二導線段之轉角處形成圓形 角處,造成局部之電阻值增 得注意的是,本發明對稱型 案之電感結構,其他利用對 層金屬層、導線段以及連接 之各式電感圖案,均適用於200527453 V. Description of the invention (6) 58, and at least one dielectric layer (not shown) is disposed between the first gold eyebrow layers 52, 54 and the second metal layer 58, wherein the first lead segment 52 and the second lead segment The 54 series is partially covered above the second metal 58. In addition, in other embodiments of the present invention, the second metal layer 58 may also be disposed above the first metal layers 52 and 54 so that the first lead segment 52 and the second The lead segment 54 is partially disposed below the second metal layer 58. The first metal layers 52, 54 and the second metal layer 58 are connected by a plurality of contact plugs 56, 60 which penetrate through the dielectric layers. For example, the first wire segment 5 2 includes at least a first contact point and a second contact point of the second wire segment 54. The second contact point is symmetrical to the symmetry line [, and the first wire segment 5 2 is a contact plug 5 6 makes its first contact point connected to one end of the second metal layer 5 8, and the second wire segment 54 uses the contact plug 60 to connect its second contact point to the other end of the second metal layer 58. Since the patterns of the contact plugs of the metal layer of the present invention are symmetrical to the inductor of the invention, a differential structure at both ends can be provided to effectively improve the quality of the inductor and avoid the symmetrical inductor structure of the present invention to enter the first metal layer. One wire segment and the first turning angle to avoid the current from being concentrated in the turning and reducing the quality factor of the inductance. The value of the inductance structure is not limited to the formation of a structure with a circular diagram called a plurality of contact plugs arranged on both sides of the symmetry line, a second metal layer, and a connection between the two sides of the symmetry line. Therefore, this signal (V + , V_) A completely symmetrical junction free of phase noise and other problems. In addition,-when designing the layout pattern, the corners of the two wire segments are formed into rounded corners, causing local resistance values to increase. It should be noted that the symmetrical structure of the inductor structure of the present invention uses other metal layers, Wire segments and various inductance patterns connected are suitable for

第13 I13th I

200527453 五、發明說明(7) 本發明。 請參 不意圖。 一第一金 導線段74 72與第二 72與第二 為該圓形 78,以及 與第二金 係部分覆 施例中, 方,使得 金屬層78 複數個貫 例而言, 線段74之 7 2係利用 之一端, 觸點連接 考圖四,圖四為本發明第三實施例之一電感結構 如圖四所示,電感70係為一差動電感,其包含有 屬層,第一金屬層係由一第一導線段72盥一第二 對稱設置於一對稱線L兩側所形成,第一/導線段 導線段74均包含複數圈螺旋圖形,且第一導線段 導線段74約略形成至少一圓形圖案,對稱線匕則 圖案之一直仕。電感70另包含有一第二金屬層 至少一介電層(未顯示)設置於第—金^層72 : 74 !層78 U中第一導線段72與第二i線段74 ί於:上#,此外,在本發明之其他實 第二金屬層78亦可設置於第—金屬層72、以上 第一導線段72與第二導線段74係 下方。第=屬層72、74與第二金;;=用 穿於介電層間之接觸插塞76,8〇來進 。舉 第一導線段7 2至少包含有一第一接觸點與第二導 一第二接觸點相對稱於對稱線L,且第一導線段 接觸插塞7 6使其第一接觸點連接至第二金屬層78 而第二導線段7 4則係利用接觸插塞8 〇使其第二接 至第二金屬層78之另一端。 、200527453 V. Description of the invention (7) The present invention. Please see no intention. A first gold wire segment 74 72, a second 72 and a second are the circular 78, and in the embodiment of the second gold system, the metal layer 78 makes the metal layer 78 a plurality of segments. The second series uses one end and the contact connection is shown in Figure 4. Figure 4 is a third embodiment of the present invention. The inductor structure is shown in Figure 4. The inductor 70 is a differential inductor, which includes a metal layer and a first metal. The layer is formed by a first conductor segment 72 and a second symmetrical arrangement on both sides of a symmetrical line L. The first / conductor segment conductor segment 74 includes a plurality of spiral patterns, and the first conductor segment conductor segment 74 is approximately formed. At least one circular pattern, the symmetrical line dagger is always the pattern. The inductor 70 further includes a second metal layer and at least one dielectric layer (not shown) disposed on the first gold layer 72: 74! Layer 78 U. The first wire segment 72 and the second i-line segment 74 ί 于: 上 #, In addition, in other embodiments of the present invention, the second metal layer 78 may also be disposed under the first metal layer 72, the first wire segment 72 and the second wire segment 74 above. The first = metal layers 72, 74 and the second gold;; = using contact plugs 76,80 which penetrate between the dielectric layers. For example, the first lead segment 72 includes at least a first contact point and a second lead-second contact point symmetrical to the line of symmetry L, and the first lead segment contacts the plug 76 to connect the first contact point to the second The metal layer 78 and the second wire segment 74 are connected to the other end of the second metal layer 78 by using the contact plug 80. ,

第14頁 200527453 五、發明說明(8) 發明電感可以提供兩端之差動訊號(V +, V -) —完全對稱結 構’以有效改善電感品質,避免相位雜訊等問題。此外, 本發明對稱型電感結構可以進一步於設計佈局圖案時,使 第一金屬層之苐一導線段與第二導線段之轉角處形成圓形 化轉角’以避免電流集中於轉角處,造成局部之電阻值增 加’降低電感之品質因數。值得注意的是,本發明對稱型 電感結f並不限定具有圓形圖案之電感結構,其他利用對 稱於對稱線兩匈而設置之複數層金屬層、導線段以及連接 其間之接觸插塞等結構所形成之各式電感圖案,均適用於 本發明。 相較於習 案之設計來形 之兩側形成相 二金屬層於直 導線段,並且 塞來連接第一 利用完全對稱 不對稱、相位 以上所述 專利範圍所做 農範圍。 成對稱 1對稱 線之兩 進〜步 金屬層 之電感 差異以 僅為本 之岣等 對稱電感結構,本發明是利 型電感,亦即利用第一金屬 之第一導線段、第二導線段 側形成相互對稱之第三導線 利用複數個對稱於直線兩側 與弟一金屬層,因此本發明 結構來降低寄生電阻差異, 及相位雜訊等問題。 發明之較佳實施例,凡依本 變化與修飾,皆應屬本發明 用佈局圖 層於直線 ,利用第 段、第四 之接觸插 可以有效 改善訊號 發明申請 專利之涵Page 14 200527453 V. Description of the invention (8) The inventive inductor can provide differential signals (V +, V-) at both ends-a completely symmetrical structure 'to effectively improve the quality of the inductor and avoid problems such as phase noise. In addition, the symmetrical inductance structure of the present invention can further form a rounded corner at the corner of the first wire segment of the first metal layer and the second wire segment when designing the layout pattern, so as to prevent the current from being concentrated at the corner, causing localization. Increasing the resistance value reduces the quality factor of the inductor. It is worth noting that the symmetric inductor junction f of the present invention is not limited to an inductor structure having a circular pattern, and other structures using a plurality of metal layers, wire segments, and contact plugs connected between the two symmetrically arranged symmetrical lines. All kinds of formed inductor patterns are suitable for the present invention. Compared to the conventional design, two sides of the shape are formed, two metal layers are formed on the straight wire segment, and the plug is connected to the first using a completely symmetrical, asymmetric, and phased agricultural range. The difference in inductance between the two steps of the symmetrical 1 symmetrical line to the metal layer is only a symmetrical inductor structure such as the original one. The present invention is a profitable inductor, that is, the first wire segment and the second wire segment side of the first metal are used. The third conductive line forming a mutual symmetry uses a plurality of metal layers that are symmetrical on both sides of the straight line and the first metal layer. Therefore, the structure of the present invention can reduce the problems of parasitic resistance differences and phase noise. The preferred embodiment of the invention, all changes and modifications according to the present invention should belong to the present invention. The layout drawing is used to layer on a straight line, and the use of the contact plugs of the first and fourth paragraphs can effectively improve the meaning of the invention.

200527453 圖式簡單說明 圖式之簡單說明 圖一為習知一電感結構示意圖。 圖二為本發明第一實施例之一電感結構示意圖。 圖三為本發明第二實施例之一電感結構示意圖。 圖四為本發明第三實施例之一電感結構示意圖。 圖式之符號說明200527453 Brief description of the diagram Brief description of the diagram Figure 1 is a schematic diagram of a conventional inductor structure. FIG. 2 is a schematic diagram of an inductor structure according to a first embodiment of the present invention. FIG. 3 is a schematic diagram of an inductor structure according to a second embodiment of the present invention. FIG. 4 is a schematic diagram of an inductor structure according to a third embodiment of the present invention. Schematic symbol description

第16頁 10 30〜 50 ^ 70 電 感 12 14、 32 > 34 > 52 54、Ί2 > 74 第 一金屬層 16 18、 22 > 26 ^ 36 40、42 、46 、56 ' 60 >76 '80 接 觸 插塞 20 Λ 24、 38 '44 ^ 58 λ 78 第 二金屬層 A、 Β 重 疊 區域 L 對 稱 線Page 16 10 30 ~ 50 ^ 70 Inductance 12 14, 32 > 34 > 52 54, Ί2 > 74 First metal layer 16 18, 22 > 26 ^ 36 40, 42, 46, 56 '60 > 76 '80 Contact plug 20 Λ 24, 38 '44 ^ 58 λ 78 Second metal layer A, Β overlap area L symmetry line

Claims (1)

200527453 六、申請專利範圍 1. 一種對稱型電感,其包含有: 一第一金屬層,該第一金屬層包含有一第一導線段設 於一直線之第一側,以及一第二導線段設於該直線之第二 側,該第二導線段與該第一導線段係對稱於該直線; 一第二金屬層,該第二金屬層包含有一第三導線段設 於該直線之該第一側,以及一第四導線段設於該直線之該 第二側,且該第四導線段與該第三導線段係對稱於該直 線; 一第一接觸插塞,用來連接該第一導線段至該第三導 線段之一端; 一第二接觸插塞,用來連接該第一導線段至該第三導 線段之另一端; 一與該第一接觸插塞相對稱於該直線之第三接觸插 塞,用來連接該第二導線段至該第四導線段之一端;以及 一與該第二接觸插塞相對稱於該直線之第四接觸插 塞,用來連接該第二導線段至該第四導線段之另一端。 2. 如申請專利範圍第1項之對稱型電感,其中該第一導線 段與該第二導線段係約略形成至少一圓形圖案。 3. 如申請專利範圍第2項之對稱型電感,其中該直線係為 該圓形圖案之一直徑。200527453 6. Scope of patent application 1. A symmetrical inductor, comprising: a first metal layer, the first metal layer includes a first lead segment provided on a first side of a straight line, and a second lead segment provided on The second side of the straight line, the second wire segment and the first wire segment are symmetrical to the straight line; a second metal layer, the second metal layer includes a third wire segment provided on the first side of the straight line And a fourth wire segment is provided on the second side of the straight line, and the fourth wire segment and the third wire segment are symmetrical to the straight line; a first contact plug is used to connect the first wire segment To one end of the third wire segment; a second contact plug for connecting the first wire segment to the other end of the third wire segment; a third third of the line that is symmetric with the first contact plug A contact plug for connecting the second lead segment to one end of the fourth lead segment; and a fourth contact plug that is symmetric with the straight line for the second contact plug and is used for connecting the second lead segment To the other end of the fourth wire segment. 2. For the symmetric inductor according to item 1 of the patent application, wherein the first lead segment and the second lead segment approximately form at least a circular pattern. 3. For the symmetrical inductor of item 2 of the patent application, wherein the straight line is a diameter of the circular pattern. 第17頁 200527453 六、申請專利範圍 4. 如申請專利範圍第1項之對稱型電感另包含有至少一介 電層設置於該第一金屬層與該第二金屬層之間,且該第一 接觸插塞、該第二接觸插塞、該第三接觸插塞以及該第四 接觸插塞係貫穿該介電層。 5. 如申請專利範圍第1項之對稱型電感,其中該第一導線 段係部分設置於該第二金屬層之該第三導線段上方。 6. 如申請專利範圍第1項之對稱型電感,其中該第二導線 段係部分設置於該第二金屬層之該第四導線段上方。 7. 如申請專利範圍第1項之對稱型電感,其中該第一導線 段包含有至少一圓形化轉角(rounded corner)。 8. 如申請專利範圍第1項之對稱型電感,其中該第二導線 段包含有至少一圓形化轉角。 9. 一種對稱型電感,其包含有: 一第一金屬層,該第一金屬層包含有一第一導線段設 於一直線之第一側,以及一第二導線段設於該直線之第二 側,該第二導線段與該第一導線段係對稱於該直線,且該 第一導線段包含有一第一接觸點與該第二導線段之一第二 接觸點相對稱於該直線;以及 一介電層,該介電層中包含有至少一第一接觸插塞以Page 17 200527453 VI. Application for patent scope 4. The symmetrical inductor according to item 1 of the patent application scope further includes at least one dielectric layer disposed between the first metal layer and the second metal layer, and the first The contact plug, the second contact plug, the third contact plug, and the fourth contact plug pass through the dielectric layer. 5. The symmetrical inductor according to item 1 of the patent application, wherein the first wire segment is partially disposed above the third wire segment of the second metal layer. 6. The symmetrical inductor according to item 1 of the patent application, wherein the second wire segment is partially disposed above the fourth wire segment of the second metal layer. 7. The symmetrical inductor according to item 1 of the patent application, wherein the first wire segment includes at least one rounded corner. 8. The symmetrical inductor according to item 1 of the patent application, wherein the second wire segment includes at least one rounded corner. 9. A symmetrical type inductor comprising: a first metal layer, the first metal layer including a first wire segment provided on a first side of a straight line, and a second wire segment provided on a second side of the straight line The second wire segment and the first wire segment are symmetrical to the line, and the first wire segment includes a first contact point and a second contact point of the second wire segment symmetric to the line; and A dielectric layer including at least one first contact plug to 第18頁 200527453 六、申請專利範圍 及一第二接觸插塞,該第一接觸插塞係用來連接該第一接 觸點至一第二金屬層,且該第二接觸插塞係用來連接該第 二接觸點至該第二金屬層。 10. 如申請專利範圍第9項之對稱型電感,其中該第一導 線段與該第二導線段係約略形成至少一圓形圖案。 11. 如申請專利範圍第1 0項之對稱型電感,其中該直線係 為該圓形圖案之一直徑。 12. 如申請專利範圍第9項之對稱型電感,其中該第一導 線段係部分與該第二金屬層相堆疊。 13. 如申請專利範圍第9項之對稱型電感,其中該第二導 線段係部分與該第二金屬層相堆疊。 14. 如申請專利範圍第9項之對稱型電感,其中該第一導 線段包含有至少一圓形化轉角。 15. 如申請專利範圍第9項之對稱型電感,其中該第二導 線段包含有至少一圓形化轉角。Page 18, 200527453 6. Scope of patent application and a second contact plug, the first contact plug is used to connect the first contact point to a second metal layer, and the second contact plug is used to connect The second contact point is to the second metal layer. 10. The symmetrical inductor according to item 9 of the application, wherein the first lead segment and the second lead segment approximately form at least a circular pattern. 11. The symmetrical inductor according to item 10 of the patent application, wherein the straight line is a diameter of the circular pattern. 12. The symmetrical inductor according to item 9 of the application, wherein the first lead segment is partially stacked with the second metal layer. 13. The symmetrical inductor according to item 9 of the application, wherein the second lead segment is partially stacked with the second metal layer. 14. The symmetrical inductor according to item 9 of the patent application, wherein the first lead segment includes at least one rounded corner. 15. The symmetrical inductor according to item 9 of the patent application, wherein the second lead segment includes at least one rounded corner. 第19頁Page 19
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