TW200520333A - Laser device and processing apparatus utilizing the same - Google Patents
Laser device and processing apparatus utilizing the sameInfo
- Publication number
- TW200520333A TW200520333A TW093130356A TW93130356A TW200520333A TW 200520333 A TW200520333 A TW 200520333A TW 093130356 A TW093130356 A TW 093130356A TW 93130356 A TW93130356 A TW 93130356A TW 200520333 A TW200520333 A TW 200520333A
- Authority
- TW
- Taiwan
- Prior art keywords
- laser light
- aperture
- laser device
- same
- processing apparatus
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08054—Passive cavity elements acting on the polarization, e.g. a polarizer for branching or walk-off compensation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08018—Mode suppression
- H01S3/0804—Transverse or lateral modes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1123—Q-switching
- H01S3/1127—Q-switching using pulse transmission mode [PTM]
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
- Lasers (AREA)
Abstract
A laser device easily obtaining a laser light with a single transverse mode. The laser device includes an aperture 7 and an adjustment mechanism 8. The aperture 7 includes a hole 7a for obtaining a laser light with a single transverse mode. The adjustment mechanism 8 moves the aperture 7 in a plane perpendicular to a proceeding direction of the laser light to adjust the position of the hole 7a with respect to the laser light 4. Thus, the aperture 7 may be adjusted to an optimal position based on environmental changes, such as temperature or mounting errors. As a result, optimal laser light with a single transverse mode may be obtained.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003414295A JP2005175245A (en) | 2003-12-12 | 2003-12-12 | Laser beam system and laser beam machining system using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200520333A true TW200520333A (en) | 2005-06-16 |
Family
ID=34734134
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093130356A TW200520333A (en) | 2003-12-12 | 2004-10-07 | Laser device and processing apparatus utilizing the same |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2005175245A (en) |
KR (1) | KR20050059410A (en) |
TW (1) | TW200520333A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8461470B2 (en) | 2007-11-20 | 2013-06-11 | Mitsubishi Electric Corporation | Method of measuring degradation condition of output mirror in laser oscillator and laser machining apparatus |
US8908739B2 (en) | 2011-12-23 | 2014-12-09 | Alcon Lensx, Inc. | Transverse adjustable laser beam restrictor |
-
2003
- 2003-12-12 JP JP2003414295A patent/JP2005175245A/en not_active Withdrawn
-
2004
- 2004-10-07 TW TW093130356A patent/TW200520333A/en unknown
- 2004-11-02 KR KR1020040088151A patent/KR20050059410A/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
JP2005175245A (en) | 2005-06-30 |
KR20050059410A (en) | 2005-06-20 |
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