TW200518180A - Photomask - Google Patents
PhotomaskInfo
- Publication number
- TW200518180A TW200518180A TW092132866A TW92132866A TW200518180A TW 200518180 A TW200518180 A TW 200518180A TW 092132866 A TW092132866 A TW 092132866A TW 92132866 A TW92132866 A TW 92132866A TW 200518180 A TW200518180 A TW 200518180A
- Authority
- TW
- Taiwan
- Prior art keywords
- photomask
- sidewalls
- openings
- substrate
- pattern layer
- Prior art date
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention provides a photomask comprising a substrate having a plurality of depressions and a pattern layer disposed on the substrate. The pattern layer includes a plurality of patterns and a plurality of openings. The depressions correspond to the openings, and the sidewalls of each depression are aligned with the sidewalls of each opening.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW92132866A TWI270117B (en) | 2003-11-24 | 2003-11-24 | Photomask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW92132866A TWI270117B (en) | 2003-11-24 | 2003-11-24 | Photomask |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200518180A true TW200518180A (en) | 2005-06-01 |
TWI270117B TWI270117B (en) | 2007-01-01 |
Family
ID=38318557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW92132866A TWI270117B (en) | 2003-11-24 | 2003-11-24 | Photomask |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI270117B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI681251B (en) * | 2014-02-10 | 2020-01-01 | 南韓商愛思開海力士有限公司 | Photomask blank and photomask for suppressing heat absorption |
-
2003
- 2003-11-24 TW TW92132866A patent/TWI270117B/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI681251B (en) * | 2014-02-10 | 2020-01-01 | 南韓商愛思開海力士有限公司 | Photomask blank and photomask for suppressing heat absorption |
Also Published As
Publication number | Publication date |
---|---|
TWI270117B (en) | 2007-01-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |