TW200518180A - Photomask - Google Patents

Photomask

Info

Publication number
TW200518180A
TW200518180A TW092132866A TW92132866A TW200518180A TW 200518180 A TW200518180 A TW 200518180A TW 092132866 A TW092132866 A TW 092132866A TW 92132866 A TW92132866 A TW 92132866A TW 200518180 A TW200518180 A TW 200518180A
Authority
TW
Taiwan
Prior art keywords
photomask
sidewalls
openings
substrate
pattern layer
Prior art date
Application number
TW092132866A
Other languages
Chinese (zh)
Other versions
TWI270117B (en
Inventor
Wen-Tien Hung
Chin-Lung Lin
Chuen-Huei Yang
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW92132866A priority Critical patent/TWI270117B/en
Publication of TW200518180A publication Critical patent/TW200518180A/en
Application granted granted Critical
Publication of TWI270117B publication Critical patent/TWI270117B/en

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The present invention provides a photomask comprising a substrate having a plurality of depressions and a pattern layer disposed on the substrate. The pattern layer includes a plurality of patterns and a plurality of openings. The depressions correspond to the openings, and the sidewalls of each depression are aligned with the sidewalls of each opening.
TW92132866A 2003-11-24 2003-11-24 Photomask TWI270117B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW92132866A TWI270117B (en) 2003-11-24 2003-11-24 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW92132866A TWI270117B (en) 2003-11-24 2003-11-24 Photomask

Publications (2)

Publication Number Publication Date
TW200518180A true TW200518180A (en) 2005-06-01
TWI270117B TWI270117B (en) 2007-01-01

Family

ID=38318557

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92132866A TWI270117B (en) 2003-11-24 2003-11-24 Photomask

Country Status (1)

Country Link
TW (1) TWI270117B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI681251B (en) * 2014-02-10 2020-01-01 南韓商愛思開海力士有限公司 Photomask blank and photomask for suppressing heat absorption

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI681251B (en) * 2014-02-10 2020-01-01 南韓商愛思開海力士有限公司 Photomask blank and photomask for suppressing heat absorption

Also Published As

Publication number Publication date
TWI270117B (en) 2007-01-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees