TW200507053A - Exposure method and apparatus for improving defects formed by proximity print - Google Patents

Exposure method and apparatus for improving defects formed by proximity print

Info

Publication number
TW200507053A
TW200507053A TW092121311A TW92121311A TW200507053A TW 200507053 A TW200507053 A TW 200507053A TW 092121311 A TW092121311 A TW 092121311A TW 92121311 A TW92121311 A TW 92121311A TW 200507053 A TW200507053 A TW 200507053A
Authority
TW
Taiwan
Prior art keywords
exposure method
defects formed
improving defects
glass
proximity print
Prior art date
Application number
TW092121311A
Other languages
Chinese (zh)
Other versions
TWI220536B (en
Inventor
Hui-Ju Yang
Original Assignee
Chi Mei Optoelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chi Mei Optoelectronics Corp filed Critical Chi Mei Optoelectronics Corp
Priority to TW92121311A priority Critical patent/TWI220536B/en
Application granted granted Critical
Publication of TWI220536B publication Critical patent/TWI220536B/en
Publication of TW200507053A publication Critical patent/TW200507053A/en

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

An exposure method and apparatus for improving defects formed by proximity print is disclosed, in which a photo resist layer is formed on a glass, a strip pattern is formed on a photo mask and the photo mask is located on top of the glass with a specific gap. The dynamic exposure method is to make the glass and the photo mask move with respect to each other when exposing the photo resist layer.
TW92121311A 2003-08-04 2003-08-04 Exposure method and apparatus for improving defects formed by proximity print TWI220536B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW92121311A TWI220536B (en) 2003-08-04 2003-08-04 Exposure method and apparatus for improving defects formed by proximity print

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW92121311A TWI220536B (en) 2003-08-04 2003-08-04 Exposure method and apparatus for improving defects formed by proximity print

Publications (2)

Publication Number Publication Date
TWI220536B TWI220536B (en) 2004-08-21
TW200507053A true TW200507053A (en) 2005-02-16

Family

ID=34076467

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92121311A TWI220536B (en) 2003-08-04 2003-08-04 Exposure method and apparatus for improving defects formed by proximity print

Country Status (1)

Country Link
TW (1) TWI220536B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI468733B (en) * 2010-01-22 2015-01-11 Lg Chemical Ltd Pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer
US9417368B2 (en) 2010-01-22 2016-08-16 Lg Chem, Ltd. Pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7588866B2 (en) 2005-06-01 2009-09-15 Kinoptics Technologies Inc. Filter arrays for liquid crystal displays and methods of making the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI468733B (en) * 2010-01-22 2015-01-11 Lg Chemical Ltd Pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer
US9417368B2 (en) 2010-01-22 2016-08-16 Lg Chem, Ltd. Pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer
US9417367B2 (en) 2010-01-22 2016-08-16 Lg Chem, Ltd. Pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer

Also Published As

Publication number Publication date
TWI220536B (en) 2004-08-21

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees