TW200504111A - Method for making a heat resistant epoxy resin having an excellent transparency - Google Patents
Method for making a heat resistant epoxy resin having an excellent transparencyInfo
- Publication number
- TW200504111A TW200504111A TW093117455A TW93117455A TW200504111A TW 200504111 A TW200504111 A TW 200504111A TW 093117455 A TW093117455 A TW 093117455A TW 93117455 A TW93117455 A TW 93117455A TW 200504111 A TW200504111 A TW 200504111A
- Authority
- TW
- Taiwan
- Prior art keywords
- epoxy resin
- fluorene
- making
- heat resistant
- excellent transparency
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Epoxy Resins (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Epoxy Compounds (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
Abstract
This invention provides a method for making a heat resistant epoxy resin having an excellent transparency and is adapted for use in the field of display material or optical elements and optical modulation elements which require a transparency and heat resistance. The epoxy resin is made by reacting bis(hydroxy phenyl) fluorene(BHPF) represented by the following formula (1), and epichlorohydrine, wherein, as a bis(hydroxy phenyl) fluorene, a solution of (A) having 4g of bis(hydroxyphenyl) fluorene resolved in 100ml of methyl ethyl setone and having an yellow index (YI value) of less than 6, and (B) containing less than 100ppm of fluorene is used in order to obtain an epoxy resin having a Hue of less than APHA 120.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003184821A JP5009486B2 (en) | 2003-06-27 | 2003-06-27 | Manufacturing method of heat-resistant epoxy resin with excellent transparency |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200504111A true TW200504111A (en) | 2005-02-01 |
TWI341846B TWI341846B (en) | 2011-05-11 |
Family
ID=34184470
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093117455A TWI341846B (en) | 2003-06-27 | 2004-06-17 | Method for making a heat resistant epoxy resin having an excellent transpancy |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5009486B2 (en) |
KR (1) | KR100996601B1 (en) |
TW (1) | TWI341846B (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4915895B2 (en) * | 2005-07-07 | 2012-04-11 | 日本化薬株式会社 | Production method of epoxy resin |
JP4915896B2 (en) * | 2005-07-07 | 2012-04-11 | 日本化薬株式会社 | Production method of epoxy resin |
JP5062856B2 (en) * | 2009-04-17 | 2012-10-31 | 田岡化学工業株式会社 | Method for producing 9,9-biscresol fluorene |
KR101178725B1 (en) | 2010-04-05 | 2012-08-31 | 제일모직주식회사 | Transparent and highly heat resistant epoxy curing resin and preparation method thereof |
JP6508921B2 (en) * | 2014-02-27 | 2019-05-08 | 日鉄ケミカル&マテリアル株式会社 | Method for producing fluorene skeleton-containing epoxy resin, epoxy resin composition, and cured product |
JP6739136B2 (en) * | 2015-07-08 | 2020-08-12 | 田岡化学工業株式会社 | Crystal of alcohol having fluorene skeleton and method for producing the same |
KR101861917B1 (en) * | 2016-04-14 | 2018-05-28 | 삼성에스디아이 주식회사 | Epoxy compound, epoxy resin composition for encapsulating semiconductor device comprising the same, and semiconductor device encapsulated by using thereof |
WO2020213992A1 (en) * | 2019-04-19 | 2020-10-22 | 국도화학 주식회사 | Epoxy resin, preparation method thereof, and epoxy resin composition comprising same |
KR102245604B1 (en) * | 2019-10-10 | 2021-04-28 | 주식회사 케이씨씨 | Epoxy resin composition |
-
2003
- 2003-06-27 JP JP2003184821A patent/JP5009486B2/en not_active Expired - Fee Related
-
2004
- 2004-06-17 TW TW093117455A patent/TWI341846B/en active
- 2004-06-25 KR KR1020040048442A patent/KR100996601B1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR20050001477A (en) | 2005-01-06 |
TWI341846B (en) | 2011-05-11 |
JP2005015696A (en) | 2005-01-20 |
KR100996601B1 (en) | 2010-11-25 |
JP5009486B2 (en) | 2012-08-22 |
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