TW200501422A - Transistor - Google Patents

Transistor

Info

Publication number
TW200501422A
TW200501422A TW092117453A TW92117453A TW200501422A TW 200501422 A TW200501422 A TW 200501422A TW 092117453 A TW092117453 A TW 092117453A TW 92117453 A TW92117453 A TW 92117453A TW 200501422 A TW200501422 A TW 200501422A
Authority
TW
Taiwan
Prior art keywords
gate electrode
projection
transistor
gate line
substrate
Prior art date
Application number
TW092117453A
Other languages
Chinese (zh)
Other versions
TWI222749B (en
Inventor
Ming-Hsuan Chang
Original Assignee
Chunghwa Picture Tubes Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chunghwa Picture Tubes Ltd filed Critical Chunghwa Picture Tubes Ltd
Priority to TW92117453A priority Critical patent/TWI222749B/en
Application granted granted Critical
Publication of TWI222749B publication Critical patent/TWI222749B/en
Publication of TW200501422A publication Critical patent/TW200501422A/en

Links

Landscapes

  • Thin Film Transistor (AREA)
  • Solid State Image Pick-Up Elements (AREA)

Abstract

A transistor that at least has one of the following characteristics: First, the gate electrode is located outside the gate line, such that the whole transistor is located outside the gate line. Second, the projection of the semiconductor layer on the substrate is totally located inside the projection of the gate electrode on the substrate. Third, the drain cross the gate electrode, such that thee projection of the cross-section is totally located inside the projection of the gate electrode. Final, the separated distance between the gate line, the gate electrode, the drain and the source is adjusted to let the variation of each of Cgd and Cds be not obviously affected by the alignment deviation.
TW92117453A 2003-06-26 2003-06-26 Transistor TWI222749B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW92117453A TWI222749B (en) 2003-06-26 2003-06-26 Transistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW92117453A TWI222749B (en) 2003-06-26 2003-06-26 Transistor

Publications (2)

Publication Number Publication Date
TWI222749B TWI222749B (en) 2004-10-21
TW200501422A true TW200501422A (en) 2005-01-01

Family

ID=34546243

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92117453A TWI222749B (en) 2003-06-26 2003-06-26 Transistor

Country Status (1)

Country Link
TW (1) TWI222749B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI402596B (en) * 2009-10-01 2013-07-21 Chunghwa Picture Tubes Ltd Pixel structure having capacitor compensation
TWI417626B (en) * 2010-11-09 2013-12-01 Century Display Shenzhen Co Pixel structure

Also Published As

Publication number Publication date
TWI222749B (en) 2004-10-21

Similar Documents

Publication Publication Date Title
TW200633137A (en) Semiconductor constructions and transistors, and methods of forming semiconductor constructions and transistors
TW200715562A (en) Thin film transistor substrate and fabrication thereof
WO2004019384A3 (en) Semiconductor constructions with gated isolation regions having indium-doped sub-regions
WO2021076367A3 (en) Stepped field plates with proximity to conduction channel and related fabrication methods
TW200633219A (en) Device with stepped source/drain region profile
WO2005057615A3 (en) Closed cell trench metal-oxide-semiconductor field effect transistor
TW200644237A (en) High-voltage MOS device
TW200631065A (en) Strained transistor with hybrid-strain inducing layer
SG139620A1 (en) Ldmos using a combination of enhanced dielectric stress layer and dummy gates
TW200419802A (en) Structure of multiple-gate transistor and method for manufacturing the same
TW200507255A (en) Semiconductor device and method of fabricating the same
TW200711005A (en) Method of forming a semiconductor device having asymmetric dielectric regions and structure thereof
TW200625471A (en) Semiconductor device employing an extension spacer and method of forming the same
WO2007082266A3 (en) Semiconductor transistors with expanded top portions of gates
TW200500702A (en) Thin film transistor array panel and manufacturing method thereof
TW200744156A (en) Semiconductor structure, semiconductor device and the method for fabricating thereof
TW200711140A (en) Thin film transistor substrate and method for fabricating the same
WO2003015182A3 (en) Fin field effect transistor and method for producing a fin field effect transistor
TW200703666A (en) Thin film transistor
TW200723549A (en) Dual gate electrode metal oxide semiconductor transistors
TW200733386A (en) Semiconductor device
TW200719413A (en) Semiconductor device and fabricating method thereof
TW200729460A (en) Semiconductor device
TW200602774A (en) Thin-film transistor manufacture method
TW200501422A (en) Transistor

Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent