TW200420352A - Internally-mixed two-stage atomizer - Google Patents

Abstract

This invention provides a kind of internally-mixed two-stage atomizer, especially the atomizer design which can achieve low gas-liquid mass ratio, high spraying conical angle and reduced metal particle size after being atomized. The atomizer has a airtight mechanism, in which there is a central main flow duct for supplying liquid metal into the atomizer disposed at the top surface, there are gas side flow ducts for supplying gas (such as nitrogen, hydrogen, argon, etc.) disposed at its left and right sides of the atomizer, there is a separator disposed below the exit opening of the central main flow duct in a mixing chamber of the atomizer, and there is a nozzle structure disposed at the corresponding surface of the central main flow duct of the atomizer. The nozzle structure is located at the same axial line with the separator and the central main flow duct so that the metal particle size can be reduced down to around 10 μm or even below 5 μm to satisfy the requirements of wafer package process and micro nano technology in high technology industry.