TW200412819A - Active matrix organic lightly emitting diode and fabricating method thereof - Google Patents
Active matrix organic lightly emitting diode and fabricating method thereof Download PDFInfo
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發光顯示元 上定義出第 之閘極以及 後,形成薄 層之後,再 以及薄膜電 ^有機發光 種主動式有 是一種可將 件’常見的 光元件等等 如無視角、 圍廣泛與全 近年來已成 機發光顯示 電晶體陣列 而構成一主 光顯示元件 成光能 示燈、 機發光 、低成 符合多 熱潮。 積極的 上形成 發光顯 膜電晶 且具有 顯示面 顯示元 本、高 媒體時 發展 一有機 示元 體以驅 成氮化矽保護層,其中保 五、發明說明(1) 發明所屬之技 本發明是有關於一 法,且特別是有關於一 造方法。 立前技衡 有機發光顯示元ο 高轉換效率的半導體元 板以及光學讀寫頭之發 件元件具備一些特性, 應答速度、使用溫度範 代顯示器特性之要求, 現今一種主動式有 中,其係於形成有薄獏 發光層以及一陰極層, 件。因此主動式有機發 動發光顯示元件。 一中,主動式有機 製造方法,是先在基板 掃描配線、薄膜電晶體 板上形成閘介電層。之 於閘介電層上形成陽極 (M2),以形成資料配線 而構成薄膜電晶體陣列 之後,於基板上形 顯示元件及其製造方 機發光顯示元件及其製 電能轉換 用途為指 。由於有 製程簡易 彩化等, 為研究之 元件已在 之一基板 動式有機 係利用薄 件之薄膜電晶體陣列的 一金屬層(Ml),以形成 金屬配線。接著,於基 膜電晶體之通道層,並 定義出第二金屬層 晶體之源極/汲極等, 後續,再依序於基板之上方形成 以形成主動式有機發光顯示元件。,x曰 上述主動式有機發光顯示元件中I复有機發 低起伏的溥膜電晶體陣列結構的上 二 發光層覆蓋不完全之情开彡 广凡王之陳形,而影響 於習知薄膜電晶體陣列之第二陪 有機發先層以及保護層,倘若所形 糙(例如於賤鑛過程有電孤產生或是紹金屬一 ,),則後續於沈積氮化矽保護層以及有機 容易於其中產生缺陷,而導致陰極層以及第 短路。此外,倘若陽極層之表面過於粗糙, 其上方之有機發光層表面不平坦, 極層之間短路。 犯1^ 明的目的就是在提供一種主 造方法,以解決因上述原因 層、一有機發 係配置於一基 晶體、數條掃 係配置在基板 資料配線,其 200412819 五、發明說明(2) 硌出極層。 以及陰極層, 然而,在 光層係鍍在高 容易產生有機 性。而且,由 層之間僅隔著 金屬層過於粗 加熱後產生突 發光層時,便 二金屬層之間 也會使形成在 成陽極層與陰 發明内袞 因此本發 示元件及其製 之問題。 雙眩2:提出一種主動式有機發光顯示 薄膜電曰曰體陣列、-平坦化絕緣層、數個 光層以及一陰極層。其中, 板上,且薄膜電晶體陣列係 描配線以及數條資料配線。 之上方,覆蓋住薄膜電晶體 中平坦化絕緣層材質可以是 動式有機發光顯 而造成短路缺陷 元件’其包括一 接觸窗、—陽極 薄膜電晶體陣列 包括數個薄膜電 而平坦化絕緣層 、掃描配線以及 光阻材質或是介The light-emitting display element defines a gate electrode, and after forming a thin layer, and then a thin-film electric light-emitting organic light emitting active type is a kind of common light element that can be used, such as no viewing angle, wide range and full range in recent years. The organic light-emitting display transistor array has been formed into a main light display element to form a light energy indicator lamp, and the organic light-emitting device is low-powered to meet the multi-boom trend. Actively form a light-emitting display film transistor with a display surface display element, and develop an organic element to drive the silicon nitride protective layer when high-media is used. The fifth aspect of the invention is described in the invention. (1) The invention belongs to the present invention. It's about a law, and especially about a method of making. The front-end technology balance organic light-emitting display element. The high conversion efficiency semiconductor element board and the optical pickup head have some characteristics, such as the response speed, the use of temperature, and the characteristics of the display requirements of the current generation of active, which is based on A thin chirped light emitting layer and a cathode layer are formed. Therefore, an active organic light-emitting display element is used. In one, the active organic manufacturing method is to first form a gate dielectric layer on a substrate scanning wiring and a thin film transistor plate. After forming an anode (M2) on the gate dielectric layer to form a data wiring to form a thin-film transistor array, a display element and a manufacturing device, a light-emitting display element, and an electric power conversion application thereof are formed on a substrate. Due to the simple process and colorization, the components for research have been used on a substrate. The mobile organic system uses a metal layer (Ml) of a thin film transistor array to form metal wiring. Next, the source / drain of the second metal layer crystal is defined on the channel layer of the base film transistor, and then, it is sequentially formed over the substrate to form an active organic light emitting display element. , X said that in the above active organic light-emitting display element, the upper two light-emitting layers of the I organic film array structure with low undulations are not completely covered, and the appearance of Guangfan Wang is affected, which affects the conventional thin film electronics. The second organic first layer and the protective layer of the crystal array, if the shape is rough (such as the electric isolation or the metal one in the base ore process), the subsequent deposition of the silicon nitride protective layer and the organic layer is easier. Defects are generated, which cause the cathode layer and the first short circuit. In addition, if the surface of the anode layer is too rough, the surface of the organic light-emitting layer above it is uneven, and short circuits between the electrode layers occur. The purpose of the crime is to provide a main manufacturing method to solve the above-mentioned reasons, an organic hair system is arranged on a base crystal, and several scanning systems are arranged on the substrate data wiring. 200412819 V. Description of the invention (2) Push out the polar layer. As well as the cathode layer, however, the organic layer is liable to be generated when the photo layer is plated. In addition, when only a metal layer is used to generate a sudden light layer after the metal layer is excessively heated, the two metal layers will also be formed between the anode layer and the cathode. Therefore, the present invention and its components problem. Double glare 2: Propose an active organic light-emitting display thin-film electrical array, a planarization insulating layer, several light layers, and a cathode layer. Among them, on-board, and thin film transistor array system wiring and several data wiring. Above, the material of the planarization insulating layer covering the thin-film transistor may be a dynamic organic light-emitting display which causes a short-circuit defect element. It includes a contact window, the anode thin-film transistor array includes several thin-film electrical planarization insulating layers, Scanning wiring and photoresist material or dielectric
200412819 五、發明說明(3) 層係配置在平坦担化絕,層’,且陽極 3窗而與,膜電晶體電‘連接。在本極 層係配·置在陽極層_L,而目:。再者’有機發光 ,^ ^極層係配置在有機發# Μ μ200412819 V. Description of the invention (3) The layer system is arranged on a flat insulating layer, and the anode is connected with 3 windows, and the film transistor is electrically connected. It is arranged in the anode layer and placed in the anode layer_L. Furthermore, organic light emitting, ^ ^ polar layers are arranged in organic hair # Μ μ
毛明提出一種主動式有機發光顯示 制S f,此方法係首先在一基板上形成—薄膜 二;二方 以及數條資料配線。之後,在基板;:成數,描配線 層,覆蓋住舊膜雷曰贼反上方形成一平坦化絕緣 平扫仆“ /4、電曰曰體、知描配線以及資料配線。1中, 法所形成,且平坦2緣 底供相當平坦之表面’而能有效阻= i=rL中形成數個開口,並且在平坦化絕i層之 連接,或是先於開口中填入-金屬層以形= 與薄膜i f ί:再形成陽極詹,藉由金屬插塞以使陽極層 ^» 電性連接。隨後,在陽極層上形成一有機發 :,並且在有機發光層上形成一陰極 式有機發光顯示元件。 形成一主動 ΚΙ l〇4l9twf •Ptd 第7頁 200412819 五、發明說明(4) 由於本發明於望 具有一平坦之表面,因奸曰,曰$ ^列之上方所形成之絕緣層 機發光層以及陰極展 < ’於其上方形成陽極層、有 此,習知因膜層都能有較佳的覆蓋均勾性。因 為讓本發明之上導致短路之問題便能獲改善。 顯易懂,下文特舉—口二他目的:特徵、和優點能更明 細說明如下: 乂 土貝也歹丨’並配合所附圖式,作詳 實施方式 第1圖所* ’其綠示依照本發一 ^ 式有機發光顯示元件的卜、目-立θ ·較佳貫施例之主動 之剖面示意圖。本笋明 圖為第1圖由I - I, :列排:之畫素結構所構成,i以下 其中一畫素結構為例以詳細說明之。 /、θ ’、以 清參照第1圖與第2 ,舌杰/贫1 Λ 線SL、今厲?砼1η9 土板上形成掃描配 線SL金屬配線1〇2、閘極104以及儲存電 1。6,以構成第一金屬層⑷)。 子“器之下電極 接著,在基板100上形成閘介電層12〇, _ 層’問介電層120之材質例如是氮化矽或氧化矽。隨後, 在閘介電層120中形成開口112、114 ’開口U2、114係分 別暴露出閘極1 0 4以及金屬配線1 〇 2。之後,在閘介電層 120上形成通道層1〇9、m,其中通道層1〇9係形成在^分 掃描配線SL(預定作為閘極之用)之上方,通道層丨u係形 成在閘極1 〇 4之上方。 ” 之後’在通道層1 0 9、111上形成一源極/汲極Mao Ming proposed an active organic light-emitting display system S f. This method was first formed on a substrate—thin film two; two sides and several data wirings. After that, on the substrate, the wiring layer is covered, covering the old film and the thief is formed on top of it to form a flat insulation and sweeping layer. "/ 4, electrical wiring, wiring and data wiring. 1. In the law office Formed, and a flat 2 edge bottom provides a fairly flat surface ', which can effectively resist = i = rL to form several openings, and fill the connection of the planarized insulation layer i, or fill in the openings before-the metal layer is shaped = And thin film if ί: form anode anode again, and make anode layer ^ »electrically connected by metal plug. Subsequently, an organic light emitting layer is formed on the anode layer: and a cathode organic light emitting layer is formed on the organic light emitting layer. Display element. Forming an active K1 104l9twf • Ptd Page 7 200412819 V. Description of the invention (4) Since the invention is intended to have a flat surface, it is said that the insulating layer machine is formed above the $ ^ column. The light-emitting layer and the cathode show < 'the anode layer is formed thereon, and it is known that the film layer can have better coverage and uniformity. Because the problem of short circuit caused by the invention can be improved. Easy to understand, the following special mention-mouth two his purpose: special , And advantages can be explained in more detail as follows: 乂 土 贝 也 歹 丨 'and in conjunction with the attached drawings, detailed implementation of Figure 1 *' The green display is in accordance with the ^ type of the organic light-emitting display element of this invention -立 θ · The active cross-section schematic diagram of the preferred embodiment. The first picture is composed of I-I,: rows: the pixel structure, i. One of the following pixel structures is taken as an example to detail /, Θ ', Yi Qing referring to Figure 1 and Figure 2, Tongjie / Poor 1 Λ line SL, Jin Li? Η1η9 Scanning wiring SL metal wiring 102, gate 104, and storage formed on the soil plate 1. 6 to form the first metal layer ⑷). Sub-electrodes Next, a gate dielectric layer 12 is formed on the substrate 100, and the material of the layer '? Dielectric layer 120 is, for example, silicon nitride or Silicon oxide. Subsequently, openings 112, 114 'are formed in the gate dielectric layer 120. The openings U2, 114 respectively expose the gate electrode 104 and the metal wiring 102. After that, a channel layer 109, m is formed on the gate dielectric layer 120. The channel layer 109 is formed above the sub-scanning wiring SL (predetermined as a gate electrode), and the channel layer is formed on Above the gate electrode 104. "After that, a source / drain is formed on the channel layers 10, 111.
l〇419twf.ptd 200412819 五、發明說明(5) 10 8a/l〇8b、1 i〇a/i10b,並且在閘介電層12()上形成與源 極108a電性連接之資料配線DL,以構成第二金屬層(^)。 其中,汲極1 〇 8 b係藉由開口 1 1 2而與閘極1 〇 4電性連接,而 源極110a係藉由開口 114而與金屬配線1〇2電性連接。另 外,汲極108b係形成在下電極106之上方,因此汲極1〇讣 同時又作為儲存電容器之上電極,而上電極1〇81)與下電極 1 0 6之間之閘介電層1 2 〇則作為一電容介電層。 、在本實施例中,在源極/汲極1〇8a/1〇8b、n〇a/11()b ”通道層109、111之間更包括形成有一歐姆接觸層ns, 用以改善源極/汲極108a/1〇8b、u〇a/u〇b與通道層1〇9、 :11之間的電性接觸。因此,作為閉極用之部分掃描配線 極1極i〇8a/i〇8b、通道層109以及歐姆接觸 :113係構成一薄膜電晶體13〇,其係作為一開關元件之 :觸I fr1〇2、源極/汲極U〇a/U〇b通道層111以及歐姆 係構成另一薄膜電晶體14〇,其係作為一驅動元 1 22之其後“在#上工述所形&之結構上形成-平坦化絕緣層 法…it ^ 絕緣層122之方法例如是一旋轉塗佈 二二平坦化絕緣㈣^ 厚度:二旋如轉塗佈法形成,因此其 ^ 止膜層之間因表面粗糙度過大而造成 10419twf.ptd 第9頁 200412819〇419twf.ptd 200412819 V. Description of the invention (5) 10 8a / 108b, 1 〇a / i10b, and a data wiring DL electrically connected to the source 108a is formed on the gate dielectric layer 12 (), To form a second metal layer (^). Among them, the drain electrode 108b is electrically connected to the gate electrode 104 through the opening 112, and the source electrode 110a is electrically connected to the metal wiring 104 through the opening 114. In addition, the drain electrode 108b is formed above the lower electrode 106, so the drain electrode 10 讣 also serves as the upper electrode of the storage capacitor, and the gate dielectric layer 12 between the upper electrode 1081) and the lower electrode 106. 〇 is used as a capacitor dielectric layer. In this embodiment, an ohmic contact layer ns is formed between the source / drain channels 108a / 1108b and noaa / 11 () b "channel layers 109 and 111 to improve the source. Electrode / drain 108a / 1〇8b, u〇a / u〇b and the channel layer 109,: 11 electrical contact. Therefore, as a part of the closed electrode scanning wiring electrode 1 〇 8a / 〇8b, channel layer 109, and ohmic contact: 113 constitutes a thin film transistor 13, which serves as a switching element: contact I fr102, source / drain U〇a / U〇b channel layer 111 And the ohmic system constitutes another thin-film transistor 14o, which is used as a driving element 1 22 and then "formed on the structure described in the work described above-flattening the insulating layer method ... it ^ of the insulating layer 122 The method is, for example, one spin coating, two flat planar insulation, and thickness. The thickness is formed by the spin coating method, so the surface roughness between the ^ stopper layers is caused by excessive surface roughness. 10419twf.ptd Page 9 200412819
的短路現象。 、及桎坦=緣層122中形成-開口118,暴露出 f層m、其中所形成之陽極層124更同時填人:上广 中,因此陽極層124能與汲極11〇1)電性連接。Short circuit phenomenon. , And 桎 tan = the opening 118 in the edge layer 122, exposing the f layer m, and the anode layer 124 formed therein is also filled in: Shangguangzhong, so the anode layer 124 can be electrically connected to the drain electrode 1101) connection.
在本發明另-實施例中,如第3圖所示 層m與汲極110b電性連接之方式,亦可以先〜 形成金屬插塞,之後再於平坦化絕緣層122之 陽極層m,藉由金屬插塞而使陽極層124與及極⑽开電成性 連接。在此,於開口118中形成金屬插塞之方法 於平坦化絕緣層122上形成一金屬層,之後利用一化學機 械研磨法移除開口 118以外之金屬層即可形成。特別值得 一提是,由於金屬插塞之導電性較陽極層材質高,因此能 有較佳的電性接觸,而且為了形成金屬插塞而進行的化學 機械研磨製程更可以同時研磨平坦化絕緣層122之表面, 而使平坦化絕緣層1 2 2之表面更加的平坦化。In another embodiment of the present invention, as shown in FIG. 3, the method of electrically connecting the layer m and the drain electrode 110b may also first form a metal plug, and then planarize the anode layer m of the insulating layer 122. The anode layer 124 and the electrode are electrically connected to each other by a metal plug. Here, a method of forming a metal plug in the opening 118 is to form a metal layer on the planarization insulating layer 122, and then to remove the metal layer outside the opening 118 by a chemical mechanical polishing method. It is particularly worth mentioning that because the metal plug has higher conductivity than the anode layer material, it can have better electrical contact, and the chemical mechanical polishing process for forming the metal plug can also grind the planarized insulating layer at the same time. The surface of 122 makes the surface of the planarized insulating layer 1 2 2 more planar.
另外,由於所形成之平坦化絕緣層122之厚度足夠 厚,而能有效減少上、下兩導電層可能產生的寄生電容, 因此於平坦化絕緣層1 2 2上所形成的陽極層1 2 4面積可以定 義得較大’而覆蓋在開關元件1 3 0以及驅動元件1 4 〇之上 方’甚至覆蓋在部分掃描配線SL與資料配線dl的上方,藉 以增加每一晝素結構之發光面積。 之後’在陽極層124上形成有機發光層126,並且於有 機發光層126上形成陰極層128,以構成有機發光顯示元件In addition, since the thickness of the formed planarizing insulating layer 122 is sufficiently thick, it can effectively reduce the parasitic capacitance that may be generated by the upper and lower conductive layers. Therefore, the anode layer 1 2 4 formed on the planarizing insulating layer 1 2 2 The area can be defined to be larger 'over the switching element 130 and the driving element 140' or even over a part of the scanning wiring SL and the data wiring d1, thereby increasing the light emitting area of each daylight structure. After that, an organic light emitting layer 126 is formed on the anode layer 124 and a cathode layer 128 is formed on the organic light emitting layer 126 to constitute an organic light emitting display element.
第10頁 200412819 五、發明說曰^ (7) " " " '"""""""""' ------ 之畫素結構。 因此,本發明之主動式有機發光顯示元件,係 ' 晝素結構所構成,其中每一晝素結構包括一掃描配線sl、. 一貧料配線DL、一開關元件130、一驅動元件14〇、一配線 102、」平坦化絕緣層122、一接觸窗118、—陽極層124、 一有機發光層126以及一陰極層128。 曰 資料配線DL 向係與掃描 其中,掃描配線SL係配置在基板1 〇〇上。 係配置在基板上1 〇 〇,且資料配線DL之延伸方 配線SL之延伸方向不同。 另外,開關元件1 3 0係配置在基板1 〇 〇上,其中開關元 件1 30係與掃描配線SL以及資料配線dl電性連接。在本實 施例中,開關元件1 30係為一薄膜電晶體,其包括閘極、 通道層109以及源極/沒極l〇8a/108b,閘極係為掃描配線 SL之一部分,而源極l〇8a係與資料配線sl連接。 驅動元件1 4 0係配置在基板1 〇 〇上,並對應開關元件 1 3 0配置’其中驅動元件1 4 0係與開關元件1 3 〇電性連接。 在本實施例中,驅動元件140係為一薄膜電晶體,其包括 閘極1 04、通道層1 11以及源極/汲極1丨0a/1 j 〇b,閘極丨〇4 與開關元件130之汲極108b係藉由接觸窗112而彼此電性連 接。 此外,配線102係配置在基板1〇〇上,其中配線1〇2之 延伸方向係與掃描配線SL相同,且配線1 〇 2與驅動元件i 4 〇 之源極11 〇 a之間係藉由接觸窗丨丨4而彼此電性連接。 平坦化絕緣層122係配置在基板1〇〇之上方,覆蓋住掃Page 10 200412819 Five, the invention said ^ (7) " " " '" " " " " " " " "' ------ pixel structure. Therefore, the active organic light-emitting display element of the present invention is composed of a daylight structure, wherein each daylight structure includes a scanning wiring sl, a lean wiring DL, a switching element 130, a driving element 14, A wiring 102, a planarization insulating layer 122, a contact window 118, an anode layer 124, an organic light emitting layer 126, and a cathode layer 128. The data wiring DL direction and scanning Among them, the scanning wiring SL is arranged on the substrate 100. It is arranged on the substrate 100, and the extending direction of the data wiring DL is different from that of the wiring SL. In addition, the switching element 130 is disposed on the substrate 100, and the switching element 130 is electrically connected to the scanning wiring SL and the data wiring d1. In this embodiment, the switching element 130 is a thin film transistor, which includes a gate, a channel layer 109, and a source / inverter 108a / 108b. The gate is a part of the scan wiring SL, and the source 108a is connected to the data wiring sl. The driving element 140 is arranged on the substrate 100, and corresponds to the switching element 130 configuration. The driving element 140 is electrically connected to the switching element 130. In this embodiment, the driving element 140 is a thin film transistor, which includes a gate 104, a channel layer 11, and a source / drain 1 丨 0a / 1 j 〇b, the gate 丨 〇4, and the switching element. The drain electrodes 108 b of 130 are electrically connected to each other through the contact window 112. In addition, the wiring 102 is arranged on the substrate 100. The extension direction of the wiring 102 is the same as that of the scanning wiring SL. The wiring 102 is connected to the source 11 oa of the driving element i 4 〇. The contact windows 4 are electrically connected to each other. The planarization insulating layer 122 is disposed above the substrate 100 and covers the scan.
200412819 五、發明說明(8) 描配線SL、資料配線DL、開關元件1 30、驅動元件1 40以及 配線1 0 2。其中,平坦化絕緣層1 2 2之材質例如是光阻材質 或是介電材質。 而接觸窗1 1 8係配置在平坦化絕緣層1 2 2中,陽極層 1 2 4係配置在平坦化絕緣層之表面上,其中陽極層1 2 4係藉 由接觸窗1 18而與驅動元件140之汲極1 l〇b電性連接。在本 發明中,接觸窗11 8之材質可以是與陽極層丨24相同之材 質,接觸.窗1 18之材質亦可以是與陽極層124不相同之導電 材質。 有機 則是配置 由於 具有一平 機發光層 此,習知 雖然 以限定本 神和範圍 護範圍當 發光層 在有機 本發明 坦之表 以及陰 因膜層 本發明 發明,内,當 視後附 1 2 6係配置在陽極層1 2 4上 發光層1 2 6上。 於薄膜電晶體陣列之上方 面,因此,後續於其上方 極層時,都能有較佳的覆 覆蓋不佳而導致短路之問 已以一較佳實施例揭露如 任何熟習此技藝者,在不 可作些許之更動與潤飾, 之申請專利範圍所界定者 ’而陰極層1 2 8 所形成之絕緣層 形成陽極層、有 盖均勻性。因 題便能獲改善。 上’然其並非用 脫離本發明之精 因此本發明之保 為準。 i200412819 V. Description of the invention (8) Trace wiring SL, data wiring DL, switching element 1 30, driving element 1 40, and wiring 102. The material of the planarization insulating layer 1 2 2 is, for example, a photoresist material or a dielectric material. The contact window 1 1 8 is disposed in the planarized insulating layer 1 2 2, and the anode layer 1 2 4 is disposed on the surface of the planarized insulating layer. The anode layer 1 2 4 is driven by the contact window 1 18 The drain 110 b of the element 140 is electrically connected. In the present invention, the material of the contact window 118 may be the same material as that of the anode layer 24, and the material of the contact 1118 may also be a conductive material different from that of the anode layer 124. Organic is configured because it has a flat light-emitting layer. Although it is known to limit the scope and scope of protection, when the light-emitting layer is in the organic form of the invention and the anion film layer, the present invention includes 1 2 The 6 series is disposed on the light emitting layer 1 2 6 on the anode layer 1 2 4. In terms of the thin film transistor array, it is possible to have better coverage and subsequent short circuit on the upper electrode layer. The short circuit problem has been disclosed in a preferred embodiment. No slight modification or retouching is allowed, as defined by the scope of the patent application, and the insulating layer formed by the cathode layer 1 2 8 forms the anode layer and has uniformity. The problem can be improved. The above is not intended to deviate from the essence of the present invention, so the warranty of the present invention shall prevail. i
200412819 圖式簡單說明 -- 第1圖是依照本發明一較佳實施例之主動式女 顯示元件之上視圖; 飞有機發光 第2圖是依照本發明一較佳實施例之主動式有機發光 顯示元件之剖面圖,其係為第1圖中由I - I,之剖面圖;"以 及 " 口回, 第3圖是依照本發明另一較佳實施例之主動式有機發 光顯示元件之剖面圖,其係為第1圖中由卜j,之别面圖。 圖式標示説明 口 100 基板 102 金屬配線 104 閘極 106 下電極200412819 Brief description of the drawings-Figure 1 is a top view of an active female display element according to a preferred embodiment of the present invention; flying organic light emitting Figure 2 is an active organic light emitting display according to a preferred embodiment of the present invention A cross-sectional view of the element is a cross-sectional view from I to I in FIG. 1; " and " Oral reply, and Fig. 3 is an active organic light-emitting display element according to another preferred embodiment of the present invention. The cross-sectional view is the other view from Bu j in Figure 1. Schematic description of port 100 substrate 102 metal wiring 104 gate 106 lower electrode
108a/108b、110a/110b :源極/;及極 1 0 9、111 :通道層 112、114、118 :接觸窗 113 :歐姆接觸層 120 :閘介電層 122 :平坦化絕緣層 124 :陽極層108a / 108b, 110a / 110b: source electrode; and electrode 10, 111: channel layer 112, 114, 118: contact window 113: ohmic contact layer 120: gate dielectric layer 122: planarization insulating layer 124: anode Floor
1 2 6 :有機發光層 128 :陰極層 SL :掃描配線 DL ··資料配線1 2 6: Organic light-emitting layer 128: Cathode layer SL: Scan wiring DL ·· Data wiring
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