TW200403200A - Support for sintering ceramic electronic components - Google Patents

Support for sintering ceramic electronic components Download PDF

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Publication number
TW200403200A
TW200403200A TW092119534A TW92119534A TW200403200A TW 200403200 A TW200403200 A TW 200403200A TW 092119534 A TW092119534 A TW 092119534A TW 92119534 A TW92119534 A TW 92119534A TW 200403200 A TW200403200 A TW 200403200A
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TW
Taiwan
Prior art keywords
coating layer
mounting surface
bending
coating
opposite
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TW092119534A
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Chinese (zh)
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TWI240715B (en
Inventor
Hiroshi Mori
Hiroaki Nihonmatu
Masashi Morisasa
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Ngk Insulators Ltd
Ngk Adrec Co Ltd
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Publication of TW200403200A publication Critical patent/TW200403200A/en
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    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81Coating or impregnation
    • C04B41/85Coating or impregnation with inorganic materials
    • C04B41/88Metals
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/4505Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application
    • C04B41/4535Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application applied as a solution, emulsion, dispersion or suspension
    • C04B41/4543Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application applied as a solution, emulsion, dispersion or suspension by spraying, e.g. by atomising
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/51Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
    • C04B41/515Other specific metals

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Furnace Charging Or Discharging (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Coating By Spraying Or Casting (AREA)

Abstract

A support for sintering ceramic electronic components is characterized is that the support is formed of a thick substrate material, and is resistant to bending after repetitive use in situations where a thin wall is used, thereby providing a long period of use. The invented support is made by using a ceramic substrate material, and coating a covering having ZrO2 as the main ingredient to form a support for sintering ceramic electronic components, where the residual expansion for the support face and the reverse face of the substrate material is different.

Description

欢、發明說明: 【發明所屬之技術領域】 熱敏電阻等陶瓷電子零件 本發明涉及在燒成陶瓷電容器、壓電元件、 時所使用的載置器。 【先前技術】 陶瓷電子零件燒成用載置器(以下簡稱爲“载 燒;:托盤,在製作陶刪電子部件;,=衣置= 應性要低、耐熱性和耐急冷急齡要強。絲,廣泛朗的ς晋哭, 性!I:急冷急熱性大的則3.Si〇2作爲基體材料,在該基體材‘ 反應。,6又心〇2爲主要成分的被覆層’以防止被燒成體成分和基體材料 存在树樣的減層喊置11,因制·的反復加熱和冷卻, 能的問題,從提高耐久性峨點出發,迫切需求這方面 體材’現有的考慮了這—關載置器’都是通過在高溫下燒成基 體材枓以增加硬度來提高對抗彎曲的抵抗力。 =是’由於這樣_置!!在該高溫下燒成時要消耗大量的燃料 =仔=的載置ϋ的成本升高的問題。另外,用高溫燒成時,因燒成收縮 = 得到的載置器容易發生變形、尺寸波解,原材料利用率低的 相反’提出了在基歸料上时鍵設被覆層、製作相對於薄的被 ',内厚度的厚的被覆層的载置器(例如曰本特許公開_-146456 么、。、讀載置器著眼點在於,因各被覆層的厚度不同載置器會發生彎 曲’通,使各被覆層的厚度大體相同,來防止彎曲的發生。 雜但疋,、這種載置器一點也沒有考慮載置被燒成體的面的被覆層受到由 ?、兀成體成分對其餘留膨脹特性的影響、和構成被覆層❺z池的穩定化 率、使用雜定化_麵及被覆層贱孔 大地干預。另外,根據所用基體材料的材質及登铫㈢的餘留膨脹特性較 薄壁化的載置器有時會發生基體材料本2 ^的燒成溫度,基體材料 置器對這一點也絲毫沒有考慮。 ^下方、考曲的情況,但是這種載 其結果大多數的現狀是,實際上在這種 置被燒成體的面和其相反面上設相同厚度的被覆層的=使,載 生彎曲,燒成次數都不可能使用10次。 3、琢口下,载置态也發 【發明内容】 鑒於上述問題,本發明的目的在於,提供 曰 :=當地防止—起的載置器的彎 迕成人進仃了狀之研究魏,考紐燒成體成分 Ϊ =: 曲量之後’控制構成被覆層的_的穩定化 相及,孔率及ZrG2敏化_種類等,在載置被燒成體的面及其 才目反面上絲設殘餘雜量獨幢覆層,就可以使上觸 直至完成本發明。 即,本發日月提供-種載置器,其特徵在於,在由陶賴成的基體材料 ,具有以Zr〇2駐要成分的霞層賴£電子零件燒顧載置器,在基 體材料的載置©及其相反面上,具有殘餘舰量不_被覆層。 在本發明卡,該載置面的被覆層由下述式⑴中表示的穩定化率爲3〇 〜100%的Zr〇2層構成,並且優選構成載置面及其相反面的各被覆層的Zr〇2 層的穩定化率有1〜60%的差(絕對值)。 穩定化率(%)=(立方晶/(立方晶+單斜晶))xl〇〇 (1) [式(1)中穩定化率是在使用前的狀態中的值。] 另外’在本發明中,優選載置面及其相反面的各被覆層由含有不同種 類的穩定化劑的Zr〇2層構成。 另外,在本發明中,優選該載置面及其相反面的各被覆層有不同的氣 孔率’此時,載置面的被覆層優選用喷鍍或喷塗的任一種方法形成,且載 200403200 置面的相反_被覆層優·與形成載置面的被覆層的方 喷鍍的任一種方法形成。 」叼貢垩a 【實施方式】 以下,具體地說明本發明的實施方式。 本發明的載置器是在_麟成的基體材料上、在基體材料的載置面 及/、相反面上,具有以Zr〇2作爲主要成分、殘餘膨脹量相互不同的被覆声 的載置器。 曰 藉此,因被燒成體成分等的影響,載置面的被覆層發生由Zr〇2結晶相 轉移引起的殘餘膨脹量的增大,但是,即使在被燒成體燒成時基體材料彎 曲的%e下根據預先设的各被覆層間的殘餘膨脹量的差,也可以使與這 些彎曲有關的主要因素相抵消,即使反復使用,載置器也不發生彎曲以至 於能夠長期使用。 、這裏,所谓殘餘膨脹量”是指燒成後的被覆層在長度方向上的長度 減去燒成鈾的被覆層在長度方向上的長度所得的,這裏,各被覆層在長度 方向上的長度是指基體材料在不受約束的狀態下的長度。 本發明中,在因與被燒成體反應及基體材料彎曲量的影響,載置器整 體發生向載置面方向的彎曲(以下稱爲“上彎曲,,)或者向其相反面方向 的彎曲(以下稱爲“下彎曲,,)的場合下,必須將載置面及其相反面的被 覆層間的殘餘膨脹量的差設定在向相反方向發生彎曲的範圍内,在被燒成 體燒成時的載置器的彎曲量才可以降低至2· 〇腿以下的範圍内。 具體地說’由於在載置面的被覆層中,其殘餘膨脹量根據被燒成體的 成分及燒成條件而變化,另外,基體材料的彎曲量根據基體材料的厚度及 材質和被燒成體的燒成溫度等而不同,所以有必要綜合考慮這些要素來決 定兩被覆層間的殘餘膨脹量的差。 另外’如圖1所示,載置器的彎曲量是指,在將載置器水平地靜置時, 燒成前後的載置器1及2中在厚度方向上最上位點移動的長度(X)。另外, 适裏’燒成時用1〜n (n=l〇以上的整數)次時,在相對於使用前的載置 器的各次燒成後的載置器中的各彎曲量都差不多。因而,本發明的載置器, 200403200 相對於使用前的載置器其彎曲 在使用至少10次以上的場合,無論哪一次, 都差不多都不在2· 0麵以上。 穩定化率(%) = (立方晶/(立方晶+單斜晶))χ1〇〇 (ι: [式(1)中穩疋化率是在使用前的狀態中的值。] 這裏,根據圖2說明穩定化率與由殘餘膨脹量的燒成次數引起的變化 之間的關係。 如圖2所7F ’在以Zr〇2爲主要成分的被覆層中,穩定化率越接近臓 或0%,由於燒成時引起祕層的結晶相的轉移越困難,所以進出窠中次數 爲15次以内時殘餘膨脹量也越小。另一方面,穩定化率越接近5〇%,燒成 時引起Zr〇2層的結晶相的轉移越容易,即使進出寞中次數爲15次以内,餘 留膨脹的發生量隨使用次數大致成比例地變大。 一另外,載置面上設的被覆層(圖中在穩定化率爲1〇〇%的被覆層用虛線 ,示)與相反面上設的相同的穩定化率的被覆層顯示不同的行爲。也就是 垅,在進出窯中次數爲15次以内時,因與燒成時的被燒成體的反應,高頻 度引起結晶相轉移,殘餘膨脹量變大。因此,假若在載置面和與其;相反面 設相同穩定化率的被覆層的場合,在使用次數比較少的時期内,兩者的殘 餘膨脹量的差變大,容易發生不能作爲載置器而使用的彎曲。 與此相反,如圖1所示,例如,如果載置面設穩定化率1〇〇%的被覆層 的場合其相反面設穩定化率90%的被覆層,那麽兩被覆層顯示殘餘膨脹量 的變化大體相同的行爲,假如除去基體材料的彎曲來考慮,就可以防止載 置器的彎曲。 在本發明中,優選構成各被覆層的各Zr〇2的穩定化率有1〜60%的差(絕 對值)’更優選有2〜50%的差(絕對值),特優選有5〜35%的差(絕對值)。 構成各被覆層的各Zr〇2層的穩定化率有比60%大的差(絕對值)時, 不但通過載置面及其相反面上所設的兩被覆層間殘餘膨脹量的差準確地抵 消被燒成體燒成時的基體材料的彎曲及載置面上所設的被覆層的由被燒成 體産生的影響,以防止載置器的彎曲容易變得困難,而且含未穩定化Zr〇2 粒子多的穩定化率低的被覆層因粉末化容易發生損耗。 另外’在本發明中’優選喊基體材料的«面上所設的被覆層由上 述⑴式中所示的穩定化率爲30〜100%的祕層構成。在由穩定化率不 足30%的Zr〇2層構成被覆層時,因粉末化容易發生損耗。 可疋,如圖1所不,被燒成體成分引起的殘餘膨脹量的變動量因穩定 化率、被燒成體的燒成條件而異,例如,穩定化率越小,殘餘膨脹量變動 越大。因而,必嫌據載置面上所·敎化轉選擇減關被覆層的 穩定化率等在適當的範圍内。 另外,載置面及其相反面的任一被覆層,例如,若是穩定化率在左 f的被覆層’燒成引起的殘餘膨脹量越㈣大,精密地控制載置器的彎曲 就越困難。因而,在本發明中,更優選將載置面及/或其相反面的被覆層取 爲上述(1)式所示的穩定化率爲65〜100%的Zr〇2層,特優選爲7〇〜 %的Zr〇2層。 在本發明中,穩定化率有差異的各被覆層,例如,可以 原料中含有獨量敎_補_彡成。 # ,外,作爲穩定劑,例如有氧化紀⑽3)、氧化約(Ca〇)、氧化鎮(_) f二氧化# (Ce〇)等。另外,例如,通過含有氧化釔(m) 8質量%以上, =化約(CaO) 5質量%以上,就可以形成穩定化率的被覆層,對於穩 =匕^足100%的被覆層,只要按照所希望的穩定化率成比例地減少上^ 含有量就行。 撼二抑制Zr〇2層穩定化率崎低使結晶相的轉移變小的效果根 據Zr〇2中含有的穩定劑的種類而異。 因而,作爲本發明_的殘餘膨脹量不同的被覆層,也可以 種類的穩定劑的Zr〇2構成各被覆層。 有冋 二η1單地設定殘餘膨脹量不同的被覆層,即使 2疋化革相_被覆層中,在各被覆層間,也可以對殘餘膨脹量設定差Description of the invention: [Technical field to which the invention belongs] Ceramic electronic parts such as thermistors The present invention relates to a carrier used for firing ceramic capacitors, piezoelectric elements, and the like. [Prior technology] Placer for firing ceramic electronic parts (hereinafter referred to as "loading burner ;: trays, ceramic parts are being produced; = clothing set = low suitability, heat resistance and resistance to rapid cooling and rapid ageing .Silk, wide-ranging, crying, sex! I: 3.Si〇2 as the base material for rapid cooling and heat resistance, the substrate 'reacts.', And 6 coatings as the main component of the coating layer to To prevent the firing of the body composition and the base material, there is a tree-like delamination. 11 Due to the repeated heating and cooling of the system, there is a problem of performance. From the perspective of improving the durability, the body material is urgently needed. Existing considerations In order to increase the resistance of the carrier, the base material is fired at a high temperature to increase the hardness to improve the resistance to bending. = Yes, because of this, it will consume a lot of energy when fired at this high temperature. The problem of increasing the cost of placing ϋ of fuel = berth = In addition, when sintering at high temperature, shrinkage due to firing = the resulting susceptor is prone to deformation and dimensional wave decomposition, and the opposite is the low utilization rate of raw materials. When covering the base material, the cover layer is keyed, and a thin quilt is made. ' The thickness of the coating device of the thick coating layer (for example, Japanese Patent Publication _-146456). The focus of the reading device is that the mounting device will be bent because the thickness of each coating layer is different, so that each coating The thickness of the layer is substantially the same to prevent the occurrence of bending. However, this kind of mounting device does not consider the coating layer on the surface on which the fired body is placed. Influence, and the stabilization rate of the ❺z pool constituting the coating layer, the use of hybridization surfaces and the ground hole of the coating layer to intervene. In addition, according to the material of the base material used and the remaining expansion characteristics of the coating, the thickness is thinner. The substrate may sometimes have a firing temperature of the substrate, and the substrate does not even take this into consideration. ^ Below, the case of Ququ, but most of the results of this loading is the actual situation. The coating layer with the same thickness is placed on the surface of the fired body and the opposite surface of the fired body. It is impossible to use the firing times 10 times. 3. Under the cut, the loading state is also [Summary of the Invention] In view of the above problems The object of the present invention is to provide a study of the following: the local prevention of the bender of the mounting device, and the study of the body composition of burned adults. =: After the amount of curvature, control of the _ Stabilizing phase, porosity, ZrG2 sensitization type, etc., by placing a single layer of residual impurities on the surface on which the fired body is placed and the reverse side of the surface, it is possible to make contact until the present invention is completed. In other words, this sun and the moon provide a kind of mounter, which is characterized in that the base material made of Tao Lai has a layer consisting of ZrO2 resident components. The electronic component burns the mounter and the base material On the mounting surface © and its opposite surface, there is a residual coating layer. On the card of the present invention, the coating layer on the mounting surface is stabilized by a Zr of 30 to 100% as shown in the following formula (1). It is preferable that there is a difference (absolute value) of 1 to 60% in the stabilization ratio of the ZrO2 layer constituting each of the coating layers on the mounting surface and the opposite surface thereof. Stability ratio (%) = (cubic crystal / (cubic crystal + monoclinic crystal)) x 100 (1) [The stabilization ratio in the formula (1) is a value in a state before use. In addition, in the present invention, each of the coating layers on the mounting surface and the opposite surface thereof is preferably composed of a ZrO2 layer containing a different type of stabilizer. In addition, in the present invention, it is preferable that the coating layers on the mounting surface and the opposite surfaces thereof have different porosities. At this time, the coating layer on the mounting surface is preferably formed by any method of thermal spraying or spray coating, and 200403200 Opposite to the mounting surface _ The coating layer is excellent. It is formed by either of the methods of square spray coating for forming the coating layer on the mounting surface.叼 contribute to a chalk [Embodiment] Hereinafter, an embodiment of the present invention will be specifically described. The mounting device of the present invention is a mounting device having a covering sound with ZrO2 as a main component and different residual expansion amounts on the base material, the mounting surface and / or the opposite surface of the base material. Device. In this way, due to the influence of the composition of the fired body, the coating layer on the mounting surface has an increase in the amount of residual expansion caused by the ZrO2 crystal phase transfer. However, even when the fired body is fired, the base material is In% e of bending, the main factors related to these bendings can be offset based on the difference in the residual expansion between the coating layers. Even if it is repeatedly used, the carrier does not bend and can be used for a long time. Here, the so-called "residual expansion" refers to the length of the coating layer after firing minus the length of the coating layer of fired uranium in the length direction. Here, the length of each coating layer in the length direction It means the length of the base material in an unconstrained state. In the present invention, due to the reaction with the fired body and the influence of the amount of bending of the base material, the entire mount is bent in the direction of the mounting surface (hereinafter referred to as In the case of "upward bending," or bending in the opposite direction (hereinafter referred to as "downward bending ,,"), it is necessary to set the difference in the residual expansion between the mounting surface and the coating on the opposite surface to the opposite direction. In the range where the direction is bent, the amount of bending of the carrier during firing of the fired body can be reduced to a range of less than 2.0 legs. Specifically, because of the coating on the mounting surface, The amount of residual expansion varies depending on the composition and firing conditions of the fired body, and the amount of bending of the base material varies depending on the thickness and material of the base material and the firing temperature of the fired body, so it is necessary to integrate These factors are taken into consideration to determine the difference in the amount of residual expansion between the two coating layers. In addition, as shown in Fig. 1, the amount of bending of the mounting means refers to the mounting means before and after firing when the mounting means is left to stand horizontally. The length (X) at which the topmost point moves in the thickness direction of 1 and 2. In addition, when using 1 ~ n (integer of n = l0 or more) times at the time of firing, it is relative to the placement before use. The bending amount of the holder after each firing of the holder is similar. Therefore, the holder of the present invention, 200403200, is bent at least 10 times compared to the holder before use, no matter which Once, almost all of them are not above the 2.0 plane. Stabilization rate (%) = (cubic crystal / (cubic crystal + monoclinic crystal)) χ1〇〇 (ι: [Equation (1) The stabilization ratio is in The value in the state before use.] Here, the relationship between the stabilization rate and the change caused by the number of firings of the residual expansion amount will be described with reference to FIG. 2. As shown in FIG. 2, 7F 'is based on ZrO2 as the main component. In the coating layer, the closer the stabilization rate is to 臓 or 0%, the more difficult it is to transfer the crystal phase of the secret layer during firing, so When the number of times of entering and exiting is less than 15 times, the residual expansion is also smaller. On the other hand, the closer the stabilization rate is to 50%, the easier it is to cause the crystalline phase of the ZrO2 layer to be transferred during firing, even if the number of times of entering and leaving is lonely. Within 15 times, the amount of residual swelling will increase approximately proportionally with the number of uses. In addition, the coating layer provided on the mounting surface (the coating layer with a stabilization rate of 100% in the figure is a dotted line, (Shown) The coating with the same stabilization rate as that provided on the opposite surface shows a different behavior. That is, when the number of times of entering and exiting the kiln is within 15 times, the reaction with the fired body during firing is high. The frequency of crystalline phase transfer causes the residual expansion to increase. Therefore, if a coating layer with the same stabilization rate is placed on the mounting surface and the opposite surface, the residual expansion of the two will be reduced during a period of relatively few uses. The difference becomes large, and bending which cannot be used as a mounter easily occurs. In contrast, as shown in FIG. 1, for example, if a covering layer with a stabilization rate of 100% is provided on the mounting surface, and a covering layer with a stabilization rate of 90% is provided on the opposite side, the two coating layers exhibit a residual expansion amount. The behavior of the change is substantially the same. If the bending of the base material is considered, the bending of the carrier can be prevented. In the present invention, it is preferable that the stabilization ratio of each ZrO2 constituting each coating layer has a difference (absolute value) of 1 to 60%. More preferably, a difference (absolute value) of 2 to 50%, and particularly preferably 5 to 50%. 35% difference (absolute). When the stabilization ratio of each ZrO2 layer constituting each coating layer is greater than 60% (absolute value), not only the difference in residual expansion between the two coating layers provided on the mounting surface and its opposite surface is accurately determined. The effect of the fired body on the base material during the firing of the fired body and the coating layer on the mounting surface is offset to prevent the bending of the mounting device. A coating layer with a small amount of Zr02 particles and a low stabilization rate is liable to be lost due to powdering. In the present invention, it is preferable that the coating layer provided on the surface of the base material is composed of a secret layer having a stabilization rate of 30 to 100% as shown in the above formula. When the coating layer is composed of a ZrO2 layer having a stabilization rate of less than 30%, loss is liable to occur due to powdering. However, as shown in Fig. 1, the amount of change in the residual expansion amount due to the components of the fired body varies depending on the stabilization rate and the firing conditions of the body to be fired. For example, the smaller the stabilization rate, the residual expansion amount changes. Bigger. Therefore, it may be suspected that the stabilization rate of the reduction coating layer selected on the surface of the mounting surface is within an appropriate range. In addition, for any coating layer on the mounting surface and its opposite surface, for example, the larger the residual expansion caused by firing of the coating layer with a stabilization rate on the left f, the more difficult it is to precisely control the bending of the mounting device. . Therefore, in the present invention, it is more preferable that the coating layer on the mounting surface and / or the opposite surface thereof is a ZrO2 layer having a stabilization rate of 65 to 100% as shown in the above formula (1), and particularly preferably 7 〇 ~% Zr〇2 layer. In the present invention, each coating layer having a different stabilization rate may, for example, contain a single amount of 敎 _ 补 _ 彡 成 in the raw material. In addition, as a stabilizer, for example, there are oxidation period ⑽3), oxidation about (Ca〇), oxidation town (_) f dioxide # (Ce〇), and the like. In addition, for example, by containing yttrium oxide (m) at 8 mass% or more and reducing the amount (CaO) to 5 mass% or more, a coating layer having a stabilization rate can be formed. It is sufficient to reduce the content of ^ in proportion to the desired stabilization rate. The effect of suppressing the stabilization rate of the ZrO2 layer to be low and reducing the transition of the crystal phase varies depending on the type of stabilizer contained in ZrO2. Therefore, as coating layers having different residual expansion amounts according to the present invention, each coating layer may be composed of ZrO2 as a stabilizer. There are two coating layers with different residual expansions separately set at η1. Even in the two leather coatings, the difference in residual expansion can be set between the coatings.

/7 J 在本發明中,考慮上述各穩定化劑的效果的差異,可以 ^的早獨-種或二種社的混合物,各被覆層可以分別使用不化 200403200 /另外,在本發明中,各被覆層由含有不同種類的穩定化劑並且具有不 同穩定化率的Zr〇2層構成,優選被設定的殘餘膨脹量的差別的範圍寬、可 以恰當地與被燒成體成分引起的殘餘膨脹量的增大等相對應。 另外,在本發明中,更優選殘餘膨脹量具有差別的各被覆層由載置面 及其相反面的被覆層且其分別具有不同的氣孔率的⑽層構成。 在k樣的被覆層中,由於氣孔率越大的被覆層,各粒子間間隔越大, 所以燒成時的膨脹量自身減少,殘餘膨脹量也就越小。減,氣孔率 的被覆層i燒成時的各粒子的膨脹可作爲自身被覆層的膨脹量反應出來,、 殘餘膨脹量就越大。因而,此特性,通過各被覆層分別具有不 氣孔率的ZrQ2層辭段,就可以在各被覆層間恰當地設定殘餘膨脹· a:的差別。 在本發明中,無需說,優選載置面及其相反面上設右霧恳沾“/ 7 J In the present invention, in consideration of the difference in the effects of the above-mentioned stabilizers, it is possible to use a mixture of early alone-type or two-type companies, and each coating layer can be used separately. 200403200 / In addition, in the present invention, Each coating layer is composed of a ZrO2 layer containing different kinds of stabilizers and different stabilizing ratios. It is preferable to set a wide range of the difference in the residual expansion amount, which can appropriately correspond to the residual expansion caused by the components of the fired body. Corresponding to the increase. In addition, in the present invention, it is more preferable that each coating layer having a difference in the amount of residual expansion is composed of a coating layer on the mounting surface and the opposite surface thereof, each of which has a different porosity. In the k-like coating layer, since the coating layer having a larger porosity has a larger interval between particles, the expansion amount at the time of firing itself decreases, and the residual expansion amount becomes smaller. When the coating layer i with porosity decreases, the expansion of each particle can be reflected as the expansion amount of the coating layer itself, and the residual expansion amount becomes larger. Therefore, with this feature, the ZrQ2 layer segments with non-porosity in each coating layer can appropriately set the difference in residual expansion a: between the coating layers. In the present invention, it is needless to say that it is preferable to set a right mist on the mounting surface and its opposite surface.

〜一々/^开夕驭合孤復層而得到。~ 一 々 / ^ Kai Xi Yu He solitary layer to get.

=3〜15%)’優選喷鍍的方法。 優選載置面的被覆層用喷鍍或 另外’爲了能夠精密地控制被覆層的厚度, 噴塗的任一種方法形成,而載置面的相反运 種的任一種方法形成。 而載置面的相反面的被覆層”塗或喷鑛的另一 11 200403200 -二U破覆層的氣孔率的控制無需說可以由施工方法的選擇來決 $产絲:嘴塗、喷锻等的任—種的場合,通過使原料的粒度、料f 的條件等在所希望的範圍内,也可以在-定的範圍内 電孤室例如有利用加熱方法産生的燃燒焰的氣體噴錄、用 作爲等離子噴^有^=的=點出發,優選等離子嘴錢。另外, 盎士㈣人s、有料化雜子喷鍍、氣體等離子嗔鑛等,要求惫孔 的場人二二ίίί定化等離子喷鍍(氣孔率7〜則,要求氣孔率小 的场口下優選乳體等離子喷鍍(氣孔率3〜1〇%)。 定差二:Ϊ發:殘餘膨脹量也可以根據被覆層的厚 方面出,,優選被覆層的厚度在2()〜4()()_範_,更優^的 卵的粑圍内,特優選在⑽〜2G0_的範圍内。 另外,從被覆層的内部不産生組織破 別可以在較廣的範_進行設定這⑽餘膨脹1的差 __的範_,更優J 發^選各被覆層厚度的差在5〇〜 •π的範圍内。更優選在⑽的細内,特優選在⑽〜2_ =外:本發财的基體材料對其材f不作特 石反化石夕、氧脑、氧化紹—二氧化石夕、堇青石等構成。〇如了以用 μΪΪμH職麟,由錄斷卿^ 將賦予影響,所以優選考岸儐用溫声笠 熱性、耐衝擊性等要優===的質。另外,從财 二氧化何。 冊心曲里要〜點出發,優選氧化紹· A Jr在本發种,對基體材料的厚度也不作特别的限制,使A體;屋辟 化也可以使载置器對彎曲的抵抗增大。另外 材枓“ ’更 體燒成時_置||_岭容純大,_ $,由於被燒成 及其相反㈣設具有規定的殘餘膨脹量在基體材料的載置面 12 200403200 以下,根據實施例,更具體地說明本發明。但是,本發明並不限於這 些實施方式。 ' (評價方法) (1) 載置器的彎曲量 將在各實施例及各比較例中得到的載置器切斷成15〇mmx2〇mmx4臟的大 小,製成試樣。在各試樣的相當於載置面的面上塗布含有1〇%的陶瓷電容 器的主要成分的鈦_的溶液後,反復1()次·。C、2小時的燒成,對各 次燒成後的雜,求出如@ i所示的械於燒成前的試樣的彎曲量X。 按以下進行砰價:載置器各次的彎曲量在L 〇刪以下時評價爲◎,不 足2. Omm時評價爲〇,2· 〇刪以上時評價爲χ。 (2) 基體材料的彎曲量 將在各實施例及各比較例中製作的基體材料切斷成15〇mmx2〇mmx4mm的 大小’按照原樣製成試樣。將各試樣反復進行1〇二欠13〇(rc、2小時的燒成, 對10 -人燒成後的試樣,與圖1所示的基準相同,求出彎曲量。 (3) 殘餘膨脹量的差別 八對於各實_和各比__喊,通過研躲去基體材料部 分,取出載置面的被覆層和其相反面的被覆層,製成試樣。 一传到的各試樣,對於由概s的被覆層取㈣試樣,塗布含有職的 陶变電容器的主要成分的鈦_的溶液,對於由與載置面相反的面取出的 f,不作任何塗布,分別反復進行10次·。c、2小時的燒成後,測定 各自長度方向的長度,求出兩者的差。 (4) 載置面的被覆層中的殘餘膨脹量的變動量 八對於各實施例和各比較例得到的载置器,通過研躲去基體材料部 ^取域置面的被㈣。織’對於得觸各被覆層,製作塗布含有 j的喊f容⑽主要成分的銳_溶液的概和什麼μ塗布的試 2各離,進行反復Π)次議。C燒紐,㈣測定長度 度,求出塗布鈦酸鋇溶液的試樣相對 餘勝脹量的變動量。 〃八 13 200403200 (5)被覆層的強度 士按下則賈··不發生被覆層的粉末化時評價爲⑬ w價為〇,因粉末化被覆層損耗時評價爲X。 生如末化 (實施例1) ' ^ 首先,將粒徑1· 5〜〇· 5刪的氧化链(遍) ;:;^r°·5fflm 貝里% Ho鄉以下的粘土 15質量%和粒徑 25質繼合,調製基體材料用混合原料。接 === 質量份添加作聽接綱甲基纖_. 5 f量份、 ί == Γ150—的成麵’使軸型體在8(rc下乾燥8小時 ί量Ϊ: 時,製作基體材料。另外,得到的基體材料的彎 然後,在該基體材料喊置面上,綠徑⑽〜施_的8質量%的 祕穩定化氧化锆粒子(穩定化率100%),進行水等離子喷鑛,形成厚产 ⑽卵的被覆層。另外,在與基體材料載置面相反的面上,用粒徑1〇〇^ 2〇〇扉的8質量%的γ2〇3穩定化氧化鍅粒子99質量%和未穩定化氧化錐粒 子^量%混合的混合原料(穩定化率99%),進行水等離子嗔鍍形成同 樣厚度的被覆層,製造陶变電子零件燒成用载置器。詳細結果匯總示於表丄。 (實施例2〜4及比較例1〜3 ) 除了分別使用將粒徑100〜200 Am的8質量%的Υ2〇3穩定化氧化锆粒 子和未穩疋化氧化錯粒子以表1所示的比率混合的混合原料、在基體材料 的载置面及其相反面上形成被覆層以外,與實施例i同樣地進行,製造陶 兗電子零件燒成用載置器。詳細結果匯總示於表1。 基體材料 |^面0^覆 層 面輸覆區 的麵显 度(。0 缸方法 謝混 合比*1 Ste(键 (%) Μτ方法 騎斗混合 比*1 穩定僻 (0Ζ\ J^lll 1550 嘯 100:0 100 麵 100:0 \/0 ) 100 1550 嘯 1⑴:〇 100 —麵 99:1 x\J\J 99 14 200403200 mmn 1550 _度 100:0 100 麵 90 :10 90 實跡!13 1550 麵 1⑴:0 100 麵 65 :35 65 實方麵4 1550 麵 100:0 100 麵 40 :60 40 t酬2 1550 嘯 100 = 0 100 麵 39 :61 39 t酬3 1550 嘯 100:0 100 讎 20 :80 20 *1 :粒徑100〜測/zm的8質量%的¥2〇3穩定化氧化锆粒子(穩定化 率100%)和未穩定化氧化鍅粒子的質量比 (評價) 任一實施例及比較例都使載置面的被覆層的穩定化率爲100%。使與載 置面相反的面的被覆層的穩定化率爲65〜90%(穩定化率的差爲10〜35%) 的實施例2、3的載置器,彎曲量在1· 〇刪以下,大體不發生彎曲。另外, 使與載置面相反的面的被覆層的穩定化率分別爲99% (穩定化率的差爲1 %)、40% (穩定化率的差爲60%)的實施例1、4的載置器,發生彎曲量 不足2· 0腿的較小的彎曲,但大體在實用上沒有問題。 與此相反’使與載置面相反的面的被覆層的穩定化率爲1〇〇% (穩定化 率的差爲0%)、與載置面的被覆層相同的比較例1的載置器,彎曲量在 2· (tom以上,發生大的彎曲。另外,使與載置面相反的面的被覆層的穩定化 率爲較小的39% (穩定化率的差爲61%)的比較例2的載置器,彎曲量在 2· 0mm以上,發生大的彎曲。另外,使與載置面相反的面的被覆層的穩定化 率爲20% (穩定化率的差爲8〇%)的比較例3的載置器,彎曲量在較小的 1.0mm以下,但與基體材料的載置面相反的面上設的被覆層因粉末化而損 耗。評價結果匯總示於表2。 表2 基體材料 嶋曲暈 (mm) 嘯覆 神纖顧長 麵es (mm) 嫌10次中 mmm mm (mm) 驗化 mm (%) 載置器 晴曲 量 (mm) 彎曲 方向 WSM 搬 0.3 0.84 0.80 0 X 上 ◎ nwu 0.3 0.84 0.43 1 〇 上 ◎ mwn 0.3 0.84 0.07 10 ◎ 上 ◎ 實継丨J3 0.3 0.84 0.14 30 ◎ 下 ◎ 15 200403200 _9^4_ 0.3 0.84 0.55 60 JWU2 03 —0.84 0.60 61 t咖3 ---------:—-— 0.3 0.84 0.13 80 ◎ (實施例5〜8及比較例4、5)= 3 to 15%) 'is preferably a thermal spraying method. It is preferable that the coating layer on the mounting surface is formed by spray coating or by any method of spray coating to precisely control the thickness of the coating layer, and any method that is the opposite of the mounting surface. On the other hand, the coating on the opposite side of the mounting surface is "coated or blasted". 11 200403200-Control of the porosity of the second U broken coating Needless to say, it can be determined by the choice of the construction method. Silk production: mouth coating, spray forging In the case of any other type, the particle size of the raw material, the conditions of the material f can be within a desired range, and the electric isolation chamber can also be in a predetermined range. For example, there is a gas injection of a combustion flame generated by a heating method. Use as a plasma spray. There are ^ == starting points, and plasma nozzles are preferred. In addition, Angstrom s, sintered hybrid sputter plating, gas plasma gangue, etc., require people who are exhausted. Plasma spraying (porosity 7 ~, it is preferred to use milk plasma spraying (porosity 3 ~ 10%) under the field port with a small porosity. Pond two: bursts: the amount of residual expansion can also be based on the coating layer In terms of thickness, it is preferable that the thickness of the coating layer is within the range of 2 () ~ 4 () () _ fan_, which is more preferable, and particularly preferably within the range of ⑽ ~ 2G0_. In addition, from the coating There is no organization breakdown inside the layer. You can set the difference of the remaining expansion 1 in a wider range. The difference between the thickness of each coating layer is within the range of 50 ~ • π. It is more preferably within the range of ⑽, particularly preferably ⑽ ~ 2_ = outside: the base material of this rich fortune does not make special materials for its material f. Fossil xi, oxygen brain, oxidized sulphur dioxide-oxidized sulphur dioxide, cordierite and so on. 〇If you use μΪΪμH, the influence will be given by the recording officer ^, so it is preferred to use warm sound, heat resistance and impact resistance. The quality is better than the quality of ===. In addition, from the point of the dioxin. From the point of the book, it is preferred that the oxide A · Jr is in this hair, and the thickness of the base material is not particularly limited, so that A The body can also increase the resistance of the carrier to bending. In addition, the material "" is more sintered when it is _set || _ Ling Rongchunda, _ $, because it is fired and its opposite setting The present invention will be described in more detail based on examples with a predetermined residual expansion amount on the mounting surface of the base material 12 200403200 or less. However, the present invention is not limited to these embodiments. '(Evaluation method) (1) Mounting device The amount of bending was cut to 15 mm x 20 mm x 4 in each of the mounts obtained in the examples and the comparative examples. After preparing a titanium solution containing 10% of the main component of the ceramic capacitor on the surface corresponding to the mounting surface of each sample, the test was repeated 1 () times. C, 2 hours For each impurity after firing, calculate the bending amount X of the sample before firing, as shown by @i. The price is as follows: the bending amount of the loader at each time is L 〇 When the following is deleted, it is evaluated as ◎, when it is less than 2.0 mm, it is evaluated as 〇, and when it is more than 2.0, it is evaluated as χ. (2) The amount of bending of the base material is cut in the base materials produced in each example and each comparative example. The test piece was cut into a size of 15 mm x 20 mm x 4 mm, and samples were prepared as they are. Each sample was repeatedly subjected to 10 to 30 rc firing for 2 hours. For 10-person fired samples, The reference shown in FIG. 1 is the same, and the amount of bending is obtained. (3) Difference in residual swelling amount. For each solid _ and each ratio __, the base material portion was removed by research, and the coating layer on the mounting surface and the coating layer on the opposite surface were taken out to prepare a sample. For each of the samples that were passed, a sample was taken from the coating layer, and a solution containing titanium, which is the main component of the ceramic capacitor, was applied, and f was not taken from the surface opposite to the mounting surface. Any application was repeated 10 times each. c. After firing for 2 hours, the lengths in the respective longitudinal directions are measured, and the difference between the two is determined. (4) Variation of the residual expansion amount in the coating layer of the mounting surface. For the mounting devices obtained in each of the examples and the comparative examples, the base material portion was removed by research to obtain the quilt on the mounting surface. In order to touch each of the coating layers, an outline of the coating solution containing the main component of the compound Y and the content of the coating solution was prepared, and the test was repeated separately. The temperature was measured at C, and the length was measured to determine the variation of the relative swelling amount of the sample coated with the barium titanate solution. 〃 八 13 200403200 (5) The strength of the coating layer is evaluated when the coating layer is not pulverized. 价 w is 0, and the powder coating layer is degraded to be X. (Example 1) ^ First, the oxide chain with a particle size of 1.5 ~ 0.5 was deleted (pass): ^ r ° · 5fflm Bailey% 15% by mass of clay below Ho township and The particle size is 25 masses, and the mixed raw materials for the base material are prepared. Then add === mass parts as the connection of methyl fiber _. 5 f parts by weight, ί == Γ150— to make the surface 'dry the shaft shape at 8 (rc for 8 hours Ϊ Ϊ:), make the matrix In addition, the obtained base material was bent, and then, on the surface of the base material, 8% by mass of green stabilized zirconia particles (stabilization rate: 100%) were applied, and water plasma spraying was performed. Ore to form a coating layer with a thick spawning egg. In addition, the rubidium oxide particles 99 are stabilized with 8% by mass of γ2O3 having a particle size of 100 ^ 2200 扉 on the surface opposite to the base material mounting surface. A mixed raw material (stabilization rate: 99%) in which mass% and unstabilized oxide cone particles are mixed, is subjected to water plasma plating to form a coating layer of the same thickness, and a carrier for firing ceramic transformer electronic parts is manufactured. Detailed results A summary is shown in Table VII. (Examples 2 to 4 and Comparative Examples 1 to 3) Except the use of 8% by mass of Υ203-stabilized zirconia particles and unstabilized oxidized particles having a particle size of 100 to 200 Am, respectively. The mixed raw materials mixed at the ratio shown in Table 1 form a coating layer on the mounting surface of the base material and its opposite surface. In addition, it was carried out in the same manner as in Example i to manufacture a ceramic sintered electronic component mounter. The detailed results are summarized in Table 1. Base material | Method Thanks Mixing Ratio * 1 Ste (Key (%) Μτ Method Riding Mixing Ratio * 1 Stable and Secluded (0Z \ J ^ lll 1550 Xiao 100: 0 100 Surface 100: 0 \ / 0) 100 1550 Xiao 1⑴ : 〇100 — Surface 99: 1 x \ J \ J 99 14 200403200 mmn 1550 _degree 100: 0 100 surface 90:10 90 real track! 13 1550 surface 1⑴: 0 0 surface 65:35 65 actual aspect 4 1550 surface 100: 0 100 surface 40:60 40 t2 2 1550 Xiao 100 = 0 100 noodles 39:61 39 t 3 350 Xiao 100: 0 100 雠 20: 80 20 * 1: particle size 100 to 8% by mass / m2 ¥ 2. 3 Mass ratio (stability) of stabilized zirconia particles (stabilization rate: 100%) and unstabilized hafnium oxide particles In any of the examples and comparative examples, the stabilization rate of the coating layer on the mounting surface was 100%. The mounting layer of Examples 2 and 3 having a stabilization rate of the coating layer on the surface opposite to the mounting surface of 65 to 90% (a difference between the stabilization rates of 10 to 35%) had a bending amount of 1 or less. , Generally does not bend. In addition, The coatings of Examples 1 and 4 in which the stabilization rate of the coating layer on the surface opposite to the mounting surface was 99% (the difference in the stabilization rate was 1%) and 40% (the difference in the stabilization rate was 60%). Device, a small amount of bending of less than 2.0 legs occurred, but there is generally no practical problem. Contrary to this, the placement rate of the coating layer on the surface opposite to the placement surface is 100% (the difference in the stabilization ratio is 0%), and the placement of the comparative example 1 is the same as the coating layer on the placement surface. Device with a bending amount of 2 · or more (large torsion occurs. In addition, the stabilization rate of the coating layer on the surface opposite to the mounting surface is 39% smaller (the difference in the stabilization ratio is 61%)) The mounting device of Comparative Example 2 had a large bending amount of 2.0 mm or more, and a large bending occurred. In addition, the stabilization rate of the coating layer on the side opposite to the mounting surface was 20% (the difference in the stabilization rate was 80%). %) Of the mounting device of Comparative Example 3, the bending amount is less than 1.0 mm, but the coating layer provided on the surface opposite to the mounting surface of the base material is lost due to powdering. The evaluation results are summarized in Table 2. Table 2 Base material warp halo (mm) Xiao Shen Shen fiber care long surface es (mm) 10 times medium mm mm mm (mm) test mm (%) mount clear curvature (mm) bending direction WSM 0.3 0.84 0.80 0 X upper ◎ nwu 0.3 0.84 0.43 1 〇 upper ◎ mwn 0.3 0.84 0.07 10 ◎ upper ◎ real J 丨 0.33 0.84 0.14 30 ◎ lower ◎ 15 200403200 _9 ^ 4_ 0.3 0.84 0. 55 60 JWU2 03 —0.84 0.60 61 t coffee 3 ---------: ---— 0.3 0.84 0.13 80 ◎ (Examples 5 to 8 and Comparative Examples 4 and 5)

<除了分別使用將粒徑100〜2〇〇#m的8質量%的ία穩定化氧化錯口 未穩定化氧化鍅粒子以表3所示的比率混合的混合原料、在基體材料、=和 置面及其相反面上形成被覆層以外,與實施例1同樣地進行,製造陶奈载 子零件燒成用載置器。詳細結果匯總示於表3。 乂免電 表3 料 度rc) 賴 mmm 疆 缸方法 願混 合比*1 驗僻 (%) 缸方法 離混合 比*1 裤 (0/\ 1550 麵 80:20 80 嘯 70 : 30 7Π *5^(16 1550 麵 50:50 50 纖 40 : 60 /U 1550 麵 40:60 40 嚇 30 : 70 4U JW!i4 1550 嘯 30: 70 30 麵 20 : 80 20 *MI8 1550 麵 31 : 69 31 麵 30 : 70 1550 麵 30:70 30 麵 29 :71 J\J 29< In addition to using a mixed raw material in which 8% by mass of ία-stabilized oxidized unstabilized osmium oxide particles having a particle size of 100 to 200 # m were mixed at a ratio shown in Table 3, the base material, The same procedure as in Example 1 was carried out except that a coating layer was formed on the placement surface and the opposite surface thereof, and a holder for firing a Tonai carrier part was produced. The detailed results are summarized in Table 3.乂 Meter-free meter 3 rc) Lai mmm The tank method is willing to mix ratio * 1 Examination (%) The tank method is away from the mix ratio * 1 Pants (0 / \ 1550 surface 80:20 80 Xiao 70: 30 7Π * 5 ^ ( 16 1550 surface 50:50 50 fiber 40: 60 / U 1550 surface 40:60 40 scar 30: 70 4U JW! I4 1550 howl 30: 70 30 surface 20: 80 20 * MI8 1550 surface 31: 69 31 surface 30: 70 1550 surface 30:70 30 surface 29: 71 J \ J 29

~~^__L H繼 | w · /u l w 響 π *1 :粒徑100〜200,的8質量%的m穩定化氧化錘粒子(穩定化 率100%)和未穩定化氧化锆粒子的質量比 〜 (評價)~~ ^ __ L H Following | w · / ulw π * 1: Mass ratio of 8 mass% m stabilized hammer oxide particles (stabilization rate 100%) and unstabilized zirconia particles with a particle size of 100 to 200 ~ (Evaluation)

(實施例5〜7及比較例4) 實施例5〜7及比較例4的載置器,在各面的被覆層間對於構成該被覆 層的氧化鍅,其穩定化率的差是10%。 使與載置面相反的面的被覆層的穩定化率爲4〇〜70%的實施例5〜7 的載置器’發生彎曲量不足2· 0mm的較小的彎曲,但在實用上沒有問題。 與此相反,使與載置面相反的面的被覆層的穩定化率爲2〇%的比較例 4的載置器,彎曲量不足2. 0刪,但與基體材料的載置面相反的面上設的被 覆層因粉末化而損耗。評價結果匯總示於表4。 (實施例8及比較例5) 實施例8及比較例5的載置器,在各面的被覆層間對於構成該被覆層 16 200403200 的氧化懿’其穩定化率的差是1%。 使與載置面相反的面的被覆層的穩定化率爲30%的實施例8的載置 器,發生彎曲量不足2· 〇刪的較小的彎曲,但在實用上沒有問題。 與此相反,使與載置面相反的面的被覆層的穩定化率爲29%的比較例 5的載置器,彎曲量不足2· 〇刪,但與載置面相反側的被覆層因脆性破壞而 剝落。評價結果匯總示於表4。 另外’這些結果表明,構成載置器的表層的Zr〇2層的穩定化率不必一 定將單面的穩定化率取爲1〇〇%,並且即使可以控制由殘餘膨脹量的差別引 起的彎曲,在穩定化率不足時,在使用上也會發生問題。 表4(Examples 5 to 7 and Comparative Example 4) In the mounters of Examples 5 to 7 and Comparative Example 4, the difference between the stabilization rates of the erbium oxide constituting the coating layer between the coating layers on each side was 10%. The placement device of Examples 5 to 7 in which the stabilization rate of the coating layer on the surface opposite to the placement surface was 40 to 70% resulted in a small bend with a bending amount of less than 2.0 mm, but it was not practical. problem. In contrast, in the mounting device of Comparative Example 4 that stabilized the coating layer on the surface opposite to the mounting surface by 20%, the amount of deflection was less than 2.0, but the mounting surface was opposite to the mounting surface of the base material. The coating layer provided on the surface is lost due to powdering. The evaluation results are summarized in Table 4. (Example 8 and Comparative Example 5) In the mounts of Example 8 and Comparative Example 5, the difference in the stabilization ratio between the coating layers on each side with respect to the hafnium oxide 'constituting the coating layer 16 200403200 was 1%. The mounting device of Example 8 in which the stabilization rate of the coating layer on the surface opposite to the mounting surface was 30% resulted in a small bending with a bending amount of less than 2.0, but there was no practical problem. In contrast, in the placement device of Comparative Example 5 which stabilized the coating layer on the surface opposite to the placement surface at 29%, the bending amount was less than 2.0, but the coating layer on the opposite side to the placement surface was caused by Brittle failure and flaking. The evaluation results are summarized in Table 4. In addition, these results show that the stabilization rate of the ZrO2 layer constituting the surface layer of the mounter need not necessarily be set to 100% on one side, and the bending caused by the difference in the residual expansion amount can be controlled. , When the stabilization rate is insufficient, problems will also occur in use. Table 4

基體材料 嶋曲量 (mm) 纖爾 (mm) 燒成10次中 SS^(mm) 穩定化 mm (%) 繼器 晴曲 量 (mm) 彎曲 方向 被羅 鑛 0.3 0.64 0.35 10 〇 上 ◎ 03 0.18 0.50 10 〇 上 ◎ *^!17 03 0.12 038 10 〇 上 〇 t\M^U 0.3 0.19 0.50 10 〇 上 X wmn 0.3 0.18 0.16 1 〇 上 Ο t圓5 0.3 0.19 0.22 1 〇 h X (實施例9〜12及比較例6、7) 除了在1400 C下燒成2小時而製作基體材料,並且分別使用將粒徑1〇〇 200=的8貝篁%的Υ2〇3穩定化氧化錯和未穩定化氧化錯粒子以表5所Base material warpage amount (mm) Fiber (mm) 10 firing times SS ^ (mm) Stabilization mm (%) Relay clear curvature (mm) Bending direction 0.3 0.64 0.35 10 〇 上 ◎ 03 0.18 0.50 10 〇 above ◎ * ^! 17 03 0.12 038 10 〇 above 〇t \ M ^ U 0.3 0.19 0.50 10 〇 above X wmn 0.3 0.18 0.16 1 〇 above 0 t circle 5 0.3 0.19 0.22 1 〇h X (Example 9 ~ 12 and Comparative Examples 6 and 7) Except that the base material was prepared by firing at 1400 C for 2 hours, and Υ203 which was 8 粒径% by particle size of 100200 = was used to stabilize the oxidation and non-oxidation. The stabilized oxidized particles are shown in Table 5.

Hi合的混合原料、在基體材料的載置面及其相反面上形成被覆層 以二與實施例i同樣地進行,製造_電子零件 況匯總示於表5。The mixed raw materials and the coating layer formed on the mounting surface and the opposite surface of the base material were carried out in the same manner as in Example i. The manufacturing and electronic components are summarized in Table 5.

200403200 —實方_9 1400 嘯 99 : 1 99 囉 100:0 100 一*5_10 1400 麵 90: 10 90 囉 100:0 100 1400 _度 65:35 65 囉 100:0 100 —實跡!112 1400 嘯 51 :49 51 囉 100:0 100 一 1400 麵 50:50 50 囉 100:0 100 *1 :粒徑100〜200/zm的8質量%的Y2〇3穩定化氧化锆粒子(穩定化 率100%)和未穩定化氧化锆粒子的質量比 (評價) 這些實施例及比較例是涉及在基體材料彎曲量大的場合下改變載置面 被覆層的穩定化率的例子。 如表6所示,使載置面的被覆層的穩定化率爲65% (穩定化率的差爲籲 35%)的實施例11的載置器,彎曲量在1· 〇mm以下,大體不發生彎曲。另 外’使載置面的被覆層的穩定化率爲90〜99% (穩定化率的差爲〖%)的 實施例9、10的載置器,發生向下方彎曲量不足2· 〇刪的較小的彎曲,使 載置面的被覆層的穩定化率爲40%的實施例12的載置器,發生向上方彎曲 量不足2· 0mm的較小的彎曲,但在實用上沒有問題。 與此相反,使載置面的被覆層的穩定化率爲1〇〇% (穩定化率的差爲〇 %)’與載置面的相反的面的被覆層相同的比較例6的載置器,發生向下方 彎曲量在2· 0mm以上的彎曲。另外,使载置面的被覆層的穩定化&率爲 (穩定化率的差爲61%)的比較例7的载置器,也發生向上方彎曲量在 2. 0刪以上的彎曲。評價結果匯總示於表6。 · 體楙曲 量(mm)200403200 — Real side_9 1400 Xiao 99: 1 99 啰 100: 0 100 one * 5_10 1400 Surface 90: 10 90 啰 100: 0 100 1400 _degree 65:35 65 啰 100: 0 100 — Real track! 112 1400 51: 49 51 啰 100: 0 100-1400 surface 50:50 50 啰 100: 0 100 * 1: 8 mass% Y2O3 stabilized zirconia particles with a particle size of 100 to 200 / zm (stabilization rate 100% ) And mass ratio (evaluation) of unstabilized zirconia particles These examples and comparative examples are examples involving changing the stabilization rate of the mounting surface coating layer when the amount of bending of the base material is large. As shown in Table 6, the mounting device of Example 11 in which the stabilization rate of the coating layer on the mounting surface was 65% (the difference in the stabilization rate was 35%), the bending amount was approximately 1.0 mm or less, and was substantially No bending occurs. In addition, the mounting devices of Examples 9 and 10 in which the stabilization rate of the coating layer on the mounting surface was 90 to 99% (the difference in the stabilization rate was 〖%), the bending amount of the mounting devices of Examples 9 and 10 was less than 2.0. The small bending, the mounting device of Example 12 which stabilized the coating layer on the mounting surface by 40%, produced a small bending with an upward bending amount of less than 2.0 mm, but there was no practical problem. On the other hand, the stabilization rate of the coating layer on the mounting surface was 100% (the difference in the stabilization rate was 0%). The mounting of Comparative Example 6 was the same as the coating layer on the opposite surface of the mounting surface. The device bends downward by an amount of 2.0 mm or more. In addition, the placement device of Comparative Example 7 that stabilized the coating layer on the placement surface (the difference between the stabilization ratios was 61%) also had a bend with an upward bending amount of 2.0 or more. The evaluation results are summarized in Table 6. · Body curl (mm)

2.0 2.0 2.0 2.0 2.0 2.0 麵!19 _!J10 _!111 嚇m 18 200403200 (實施例13) 5除了,力成型得到的成型體在8(rc乾燥 燒成2小時以外,與實施例!同樣進行 :,在^OOC下 體材料的彎曲量是2.0刪。 土 另外,侍到的基 vn ,$該基體材料的載置面上,用將粒徑⑽〜2GG_的8質旦r的 化氧竭奸8〇質量%和未敎化祕絲子二^ :的原 =定彳_%),斯料軒倾,蛛w^r度 10/zm tflyl 60 混合原斜,i日斟括、日人広b貝里/的Y2〇3穩疋化軋化鍅40質量%混合的 乙稀醇⑽)跡输接劑的聚 搶將該料漿偷!錢:二·。其後,在空氣壓5Kg/cm2下,用喷 時燒成處理,以氧^=3^相反的面上後,在1侧。C下進行2小 成用载置器。詳細情;;匯總的被覆層,製造陶瞻零件燒 (實施例14) 與實施#丨Ρ 離子贺鑛在基體材料的載置面上形成被覆層以外, 示^=。13 地進行,製造陶魏子零件燒成賴置器。詳細情況匯卜總2.0 2.0 2.0 2.0 2.0 2.0 Face! 19 _! J10 _! 111 scarm 18 200403200 (Example 13) 5 Except that the molded body obtained by force molding is dried at 8 (rc for 2 hours and dried and fired), the same as in Example !: The deflection amount is 2.0. In addition, the served base vn and the base material are placed on the surface of the base material, and are oxidized by 80 mass% of 8 mass denier r with a particle size of 22GG_ Hua Mi Si Zi 2 ^: The original = Ding 彳 _%), Si Liu Xuan Qing, spider w ^ r degree 10 / zm tflyl 60 mixed original oblique, i-days, Japanese people 広 b Bailey / Y2〇 3 Stabilizing and rolling 鍅 40% by mass of mixed ethyl alcohol ⑽) The polymer of the trace transport agent steals the slurry! Money: two. Thereafter, it was fired at the time of spraying at an air pressure of 5 Kg / cm2, and the opposite side of oxygen ^ = 3 ^ was placed on one side. Place the loader under C for 2 minutes. Details; the summary of the coating layer, the production of Tao Zhan parts firing (Example 14) and implementation # 丨 Ρ ion He mine in addition to forming a coating layer on the substrate surface, shown ^ =. 13 places to manufacture Tao Weizi parts firing device. Detailed information

19 200403200 這些實施例是^通過用健形成载置面的被 置面相反的面的被覆層,在兩被覆層間設氣孔率的差手。艰-、戰 如矣S所:,用^因66絲丁古、土、# a,L _ /入…叫」日间扠氣孔率的差別的例子。 別的;== 小的彎曲,但在實用上沒有問題。特別是實施例心二儘:= 置器的彎曲。另外,實施例13的例子也顯示出,除& 與此相反,在載置面及其相反面上都用喷鑛 化率的差爲〇%)的被覆層的比較例6的載置器 = 的向下方彎曲。評價的結果匯總示於表8。 ㈣里在2. Grnnm上19 200403200 In these embodiments, the difference in porosity is provided between the two coating layers by forming a coating layer on the opposite side of the mounting surface from the mounting surface. Difficult-and-comfortable, as described in 矣 S :, use the example of the difference in the porosity of the daytime fork due to 66 sidings, soil, #a, L _ / into ... Other; == small bends, but practically no problem. In particular, the embodiment is exhausted: = bending of the device. In addition, the example of Example 13 also shows that, in addition to & on the other hand, the mounting device of Comparative Example 6 was coated with a coating layer having a difference of 0% on the mounting surface and its opposite surface). = Bends downward. The evaluation results are summarized in Table 8. Bali on 2. Grnnm

觀 差(%), mm (mm *5SM13 20 〇 *6SM14 0 〇 t\mu 0 X (實施例15)Viewing difference (%), mm (mm * 5SM13 20 〇 * 6SM14 0 〇 t \ mu 0 X (Example 15)

百先,除了雜力成型剌的财赃観 :燒成2小時以外,與實施例1同樣進行,製作=在= 基體材料的彎曲量是2. 〇咖。 卜件到的 接者,在該基體材料的載置面上,用將粒徑100〜細顯的旦 =CaO穩定化氧化錯粒子8〇質量%和未穩定化氧 _ = 率叫進行水等離靡,以氧崎 質量ϊΐ相反的面上,錄徑⑽L的8 、> 疋虱化錘粒子(穩定化率1〇〇%),進行水 的被覆層製槪電子零件燒成賴置器 (實施例16) 除了用粒梭⑽〜2GG//m的5質量%的CaO穩定化氧化鍅粒子1〇〇質 20 200403200 量% (穩定化率100%)在基騎料賴置面上職被黯料,與 15同樣進行,製造陶魏子零件燒_載置器。詳細結果_祕=。’Bai Xian, the same as in Example 1 except that the miscellaneous molding 剌 観: 成 was fired for 2 hours, making === the amount of bending of the base material is 2.0 coffee. For the person who arrives, the surface of the base material is placed on the surface of the substrate with a particle diameter of 100 ~ fine denier = CaO stabilized oxide particles 80% by mass and unstabilized oxygen _ = rate called water, etc. On the opposite side of Ozaki mass, record the diameter of 8 L > lice hammer particles (stabilization rate of 100%), apply water to the coating layer, and burn the electronic parts. (Example 16) In addition to 5 mass% CaO stabilized with arsenic oxide particles with a particle size of ~ 2GG // m, 100 mass 20 200403200 volume% (stabilization rate 100%) was placed on the base material. It is obscured, and it is carried out in the same way as 15 to manufacture Tao Weizi part burner. Detailed results_secret =. ’

基耐料 載 麵嘯歸 _ --—--- ___論 的mm 度(。〇 穩定傾 mm 合比*2 穩定僻 (%) 穩定倾 iW混 合hh*l 穩定i摔 實顧15 1400 CaO 80: 20 80 γ^α 1—1 X 100 :〇 \%) 1ΠΠ 實娜ί16 1400 CaO 100:0 100 Υ2〇3 100 ··〇 1UU inn ί:酬6 1400 Y£k 100:0 100 loom iUU 1/Tv 木1 :粒徑100〜 200 am的8皙暑叱沾λ.,,、— IvAJ … _ — u 只里,〇 I 2 率100%)和未穩定化氧化錯粒子的質量比 π粒徑100〜200_的5質量%的Ca0穩定化氧化錯粒子(穩 率100%)和未穩定化氧化錯粒子的質量比 ^ (評價) 這些實施例是涉及用含有不同穩定化劑的穩定化氧化錄形成載置面的 被覆層和其相反面的被覆層的例子。 t表P所示,各被覆層含有不同穩定劑的實施例15、16的载置器, ,生彎曲量不足2· Gmm的上方向或下方向的較小的彎曲,但大體在實用°上 /又有問題。侧是實施例16的載置H,儘管在各被覆層間穩定化率相同, 但也可以抑制載置器的彎曲。另外,實施例15的例子也顯示出,除了各被 覆層的穩定化率設差财卜,使各被額含有不_穩賴,就可以實現更 精密的控制。 與此,反,在載置面及其相反面上都用8質量%的m穩定化氧化錐 粒子(穩定化率100%)形成被覆層的比較例6的載置器,發生彎曲量在 2·0刪以上的下方向彎曲。評價的結果匯總示於表10。 表10 穩定(%) 載置曲量 (mm) 彎曲施 實5刪15 20 〇 上 21 200403200The base refractory load surface is called _ ------ _ The mm degree (.0 stable tilt mm ratio * 2 stable remote (%) stable tilt iW mixed hh * l stable i down to 15 1400 CaO 80: 20 80 γ ^ α 1-1 X 100: 〇 \%) 1ΠΠ Sina ί16 1400 CaO 100: 0 100 Υ2〇3 100 ·· 〇1UU inn ί: 6 1400 Y £ k 100: 0 100 loom iUU 1 / Tv Wood 1: 皙. ,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, 10 Mass ratio of 5 mass% Ca0 stabilized oxidized particles (stability rate 100%) and unstabilized oxidized particles with a particle size of 100 to 200 mm ^ (Evaluation) These examples relate to the use of stabilizers containing different stabilizers. An example of forming a coating layer on a mounting surface and a coating layer on the opposite surface thereof. As shown in Table P, the mounts of Examples 15 and 16 in which each coating layer contains different stabilizers have relatively small bends in the upward or downward direction of less than 2 · Gmm, but are generally practical. / There are problems. On the side is the mounting H of Example 16. Although the stabilization rate is the same between the coating layers, the bending of the mounting device can be suppressed. In addition, the example of Embodiment 15 also shows that in addition to setting the stabilization rate of each coating layer so that each bedding contains instability, more precise control can be achieved. On the other hand, in the mounting device of Comparative Example 6 in which the coating layer was formed with 8% by mass of m stabilized oxide cone particles (stabilization rate of 100%) on the mounting surface and the opposite surface, the amount of bending was 2 • Bend in the downward direction above 0. The evaluation results are summarized in Table 10. Table 10 Stability (%) Loading curvature (mm) Bending application 5 Delete 15 20 〇 On 21 200403200

〇 下 X 下 不僅基 的?置$,而且即使是薄化的場合’也能夠恰當地防止反復使用 引起的載置ϋ的彎曲,以至於能夠長期使用。 【圖式簡單說明】 圖1是模式地表示構成載置器的基體材料的彎曲量的測定基準的說 圖。 ° 圖2是表示在氧化籍被覆層中殘餘膨脹量和進出t中次數的關係的曲 線圖。 【元件符號說明】 載置器1 載置器2〇 Under X, not only the base mounting position, but also the case of thinning ’can properly prevent the bending of the mounting base caused by repeated use, so that it can be used for a long time. [Brief Description of the Drawings] Fig. 1 is a diagram schematically showing a measurement standard of a bending amount of a base material constituting a mounter. ° Fig. 2 is a graph showing the relationship between the amount of residual expansion in the oxide coating and the number of times of entry and exit t. [Description of component symbols] Loader 1 Loader 2

22twenty two

Claims (1)

200403200 拾、申請專利範圍: 1· -種喊電子零件燒賴載置器,該陶兗 —,7丨丨軾置斋,琢闹瓷雷;兩 由陶究«喊斷料上,具扣祕駐錢載置器在 在該基體材料的载置面及其相反面上餘不於: 的被覆層由下述式⑴中表示的穩定化率爲加〜⑽ ^的Zr〇2f構成’並且構成該载置面及其相反面的妇 穩定化率具有1〜60%的差(絕對值)· (式 1) ' 於,,二里工1 Λ項所述_究電子零件燒成用載置器,其特 ι被覆層的該Zr〇2層的 穩定化率(%)=(立方晶/(立方晶+單斜晶)χ1〇〇 ⑴ [式(1)中,穩定化率是在使用前的狀態中的值。] α 3·依據申請專利範圍第!項或第2項所述的陶变電子零件燒成用載置 器,其特«於,上賴及其城關各被襲轉林囉類 定化劑的Zr〇2層構成。 。4·依據申請專利範圍第1項或第2項所述的陶瓷電子零件燒成用载置 器,其特徵在於,上述載置面及其相反面的各被覆層具有不同的氣孔率。 5·依據申請專利範圍第4項所述的陶瓷電子零件燒成用載置器,其特 徵在於,上述載置面的被覆層用噴鍍或喷塗的任一種方法形成,而上述載 置面的相反面的被覆層用與形成上述載置面的被覆層的方法不同的噴塗或 喷鍍的任一種方法形成。 23200403200 Scope of patent application: 1 · -The kind of shouting electronic parts burns on the carrier, the pottery 兖 —, 7 丨 丨 Zhai Zhai, sculpting and making porcelain mines; two pottery wares «shouting on the material, with a secret The depositing device is left on the mounting surface of the base material and the opposite surface thereof: The coating layer is composed of Zr〇2f with a stabilization rate represented by the following formula (1) plus ⑽ ^ ′ and There is a difference (absolute value) of 1 to 60% in the women's stabilization rate on this mounting surface and its opposite surface. Device, the stabilizing rate (%) of the ZrO2 layer with a special coating layer = (cubic crystal / (cubic crystal + monoclinic crystal) χ100) [In the formula (1), the stabilization rate is in use The value in the previous state.] Α 3 · According to the scope of the patent application scope of the first or second item of the ceramic transformer electronic component firing device, which is particularly «Yu, Shanglai and its Chengguan were attacked and turned Composition of ZrO2 layer of Lin Zhi classifying agent. 4. According to the holder for firing ceramic electronic parts according to item 1 or item 2 of the scope of patent application, the above-mentioned placing surface and its Each coating layer on the opposite surface has a different porosity. 5. The holder for firing ceramic electronic components according to item 4 of the scope of the patent application, wherein the coating layer on the mounting surface is sprayed or sprayed. The coating layer is formed by any method of coating, and the coating layer on the opposite side of the mounting surface is formed by any method of spraying or spraying different from the method of forming the coating layer of the mounting surface.
TW092119534A 2002-08-12 2003-07-17 Setter for firing ceramic electronic component TWI240715B (en)

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