TH45861B - Methods and systems for laminating materials onto supports - Google Patents

Abstract

DC60 (12/07/49) Method and film coating device onto the support. Which consists of bringing materials and Carrier gas into the hot room The material may be a semiconductor such as cadmium, calcoogenide, a mixture of vapor and carrier gases without any non-vaporizing material. A mixture of vapor and carrier gas is then re-mixed together. In order to obtain a mixture of vapor / carrier gas with The features are always the same. Where it is directed towards the surface of the support such as a glass support where the vapor is coated in the form of a uniform film. Method and device for laminating film onto supports Which consists of bringing materials and Carrier gas into the hot room The material may be a semiconductor such as cadmium, calcoogenide, a mixture of vapor and carrier gases without any non-vaporizing material. A mixture of vapor and carrier gas is then re-mixed together. In order to obtain a mixture of vapor / carrier gas with The features are always the same. Where it is directed towards the surface of the support such as a glass support where the vapor is coated in the form of a uniform film.

Claims (8)

A method of coating material onto a support, comprising: introducing the material and a carrier gas into a first chamber; heating the material such that at least a portion of the material is vaporized; passing the mixture of vapor and carrier gas through a second chamber so as to form a uniform vapor/carrier gas mixture throughout; and passing the uniform vapor/carrier gas mixture throughout to a surface of the support having a temperature lower than the vapor. 2. The method as stated in claim 1, wherein heating the material comprises passing an electric current to various parts of chamber 1. 3. The method as stated in claim 1, wherein the material is cadmium chalcogenide. 4. The method as stated in claim 3, wherein the material is cadmium telluride or cadmium sulfide. 5. The method as stated in claim 1, wherein heating includes heating The temperature of the first chamber is maintained at at least 500°C. 6. The method as stated in claim 5, wherein the material is cadmium chalcogenide, and the heating includes maintaining the temperature of the first chamber at at least 700°C. 7. The method as stated in claim 1, wherein the first chamber also comprises a diffuser hole. 8. The method as stated in claim 7, wherein the first chamber also comprises a plurality of diffuser holes. 9. The method as stated in claim 1, wherein the second chamber also comprises a plurality of diffuser holes. 1 0. The method as stated in claim 1, further comprising providing a mixture of vapor and gas containing no solid material after the step of heating the material, such that a portion of the material vaporizes. 1 1. The diffuser assembly comprising a first chamber into which the solid material and a carrier gas are introduced; a heater placed within the first chamber and providing a temperature sufficient to vaporize at least a portion of the solid material; The second chamber is placed adjacent to the first chamber and provides a flow of material sufficient to mix the vapor and carrier gas to form a uniform vapor/carrier gas mixture throughout; and the outlet is adjacent to the second chamber and is positioned such that it will convey the uniform vapor/carrier gas mixture to the surface of the adjacent support 1 . 2. The diffuser assembly as described in claim 11, wherein the first and second chambers are tubular, and the first tubular chamber is placed within the second tubular chamber such that the second tubular chamber encloses the first tubular chamber 1 . 3. The diffuser assembly as described in claim 11, wherein the first chamber comprises a heater and is heated by means of an electrical resistance 1 . 4. The diffuser assembly as described in claim 11, wherein the heater is capable of maintaining the first chamber at a temperature of at least 500°C 1 . 5. The diffuser assembly as described in claim 14, wherein the heater is capable of maintaining The temperature of the first chamber is maintained at least 700°C. 1 6. The diffuser assembly as described in claim 11, wherein the first chamber has a diffuser hole. 1 7. The diffuser assembly as described in claim 16, wherein the first chamber comprises a plurality of diffuser holes. 1 8. The diffuser assembly as described in claim 11, wherein the second chamber comprises a plurality of diffuser holes. 1 9. The diffuser assembly as described in claim 11, wherein the first chamber is arranged such that no solid material is supplied to the second chamber. 2 0. The film coating system on a support, comprising a material source connected to the diffuser assembly such that the solid material and carrier gas delivered by the material source are supplied to the diffuser assembly, wherein the diffuser assembly comprises a first chamber such that the solid material and carrier gas delivered to the diffuser assembly are supplied to the first chamber; a heater placed within the first chamber and provided with a temperature sufficient to The second chamber is adjacent to the first chamber and provides sufficient material flow to mix the vapor and carrier gas to form a uniform vapor/carrier gas mixture throughout; and the outlet is adjacent to the second chamber and is positioned such that the uniform vapor/carrier gas mixture is directed to the surface of the adjacent support; and the conveyor used to deliver the support is sufficiently adjacent to the dispersing unit such that the vapor may be deposited on the support in the form of a film. 2 1. The system as stated in claim 20, wherein the first and second chambers are tubular, and the first tubular chamber is placed within the second tubular chamber such that the second tubular chamber encloses the first tubular chamber. 2 2. The system as stated in claim 20, wherein the first chamber comprises a heater, and it is heated by electrical resistance heating. 2 3. The system as stated in claim 20, wherein the heater is capable of raising the temperature 4. The system as stated in claim 23, wherein the heater is capable of maintaining the temperature of the first chamber at least 700 degrees C. 2 5. The system as stated in claim 20, wherein the first chamber comprises 2 diffuser holes. 6. The system as stated in claim 25, wherein the first chamber comprises 2 diffuser holes. 7. The system as stated in claim 20, wherein the second chamber comprises 2 diffuser holes. 8. The system according to claim 20, wherein the first chamber is arranged such that no solid material is introduced into the second chamber. The method of coating the material onto a support, comprising: introducing the material and a carrier gas into the first chamber; heating the material such that at least a portion of the material is vaporized; passing the mixture of vapor and carrier gas through the second chamber so as to form a uniform vapor/carrier gas mixture throughout; and delivering the uniform vapor/carrier gas mixture throughout to a surface of the support having a temperature lower than the vapor. 2. 9. The method of coating the material onto a support, comprising: introducing the material and a carrier gas into the first chamber; heating the material such that at least a portion of the material is vaporized; passing the mixture of vapor and carrier gas through a filter such that no unvaporized material passes through the filter; passing the mixture of vapor and carrier gas through the second chamber so as to form a uniform vapor/carrier gas mixture throughout; and delivering the mixture of vapor/carrier gas throughout. to the surface of the support having a temperature lower than the vapor 3 0. The method as stated in claim 29, wherein the filter is placed within a first chamber 3 1. The method as stated in claim 30, wherein the filter comprises a tubular filter assembled within a first chamber 3 2. The method as stated in claim 29, wherein heating the material comprises passing an electric current to various components of the first chamber 3 3. The method as stated in claim 29, wherein the material is cadmium chalcogenide 3 4. The method as stated in claim 33, wherein the material is cadmium telluride or cadmium sulfide 3 5. The method as stated in claim 33, wherein the heating comprises heating the first chamber to at least 500°C 3 6. The method as stated in claim 35, wherein the heating comprises heating the chamber One having a temperature of at least 700°C. 3 7. The method as stated in claim 29, wherein the first chamber comprises a plurality of diffuser holes. 3 8. The method as stated in claim 31, wherein the combined tubular filters are heated by means of an electrical resistance. 3 9. The diffuser assembly comprising: a first chamber into which the solid material and carrier gas are introduced; a heater positioned within the first chamber and providing a temperature sufficient to vaporize at least a portion of the solid material; a filter positioned within the first chamber so as to permit the vapor and carrier gas to pass through it but not the solid material to pass through at all; a second chamber adjacent to the first chamber and providing a flow rate sufficient to mix the vapor and carrier gas into a uniform vapor/carrier gas mixture throughout; and an outlet adjacent to the second chamber and positioned so as to vaporize at least a portion of the solid material. 1. The diffuser assembly as described in claim 40, wherein the filter comprises a tubular filter integrated within a first chamber 4. 2. The diffuser assembly as described in claim 39, wherein the first chamber comprises a heater and it is heated by means of an electrical resistance 4. 3. The diffuser assembly as described in claim 39, wherein the heater is capable of bringing the first chamber to a temperature of at least 500 degrees C 4. 4. The diffuser assembly as described in claim 39, wherein the heater is capable of bringing the first chamber to a temperature of at least 700 degrees C 4. 5. The diffuser assembly as described in claim 39, wherein the first chamber comprises a delivery hole. 4. A diffuser assembly as described in claim 39, wherein the first and second chambers are tubular, and the first chamber is located within the second chamber, with the second tubular chamber enclosing the first tubular chamber. 4. 7. A diffuser assembly as described in claim 41, wherein the tubular filters incorporated include a heater, and it is heated by means of electrical resistance heating. 4. 8. A film coating system on a support comprising a material source connected to the diffuser assembly such that the solid material and carrier gas delivered to the material source are fed into the diffuser assembly, wherein the diffuser assembly comprises a chamber wherein the solid material and carrier gas delivered to the diffuser assembly are fed into the first chamber; a heater located within the first chamber and maintained at a temperature sufficient to vaporize at least a portion of the solid material; a filter located within the first chamber and serving as a passageway for the vapor and carrier gas, without which the solid material is completely free from flow; a second chamber adjacent to the first chamber. and provide a flow of material sufficient to mix the vapor and carrier gas into a uniform vapor/carrier gas mixture throughout; and the outlet is adjacent to the second chamber and is positioned such that the uniform vapor/carrier gas mixture is delivered to the surface of the adjacent support; and the conveyor used to deliver the support is sufficiently close to the diffuser assembly such that ions are coated on the support in the form of a film. 4 9. The system as stated in claim 48, wherein the filter is located within the first chamber. 5 0. The system as stated in claim 49, wherein the filter comprises a tubular filter assembled within the first chamber. 1. The system as stated in claim 48, wherein the first chamber comprises a heater and it is heated by means of electrical resistance heating. 5 2. The system as stated in claim 48, wherein the heater is capable of bringing the temperature in the first chamber to at least 500°C. 5 3. The system according to claim 48, wherein the heater is capable of raising the temperature in the first chamber to at least 700°C. 5 4. The system according to claim 48, wherein the first chamber comprises a plurality of diffuser holes. 5 5. The system according to claim 48, wherein the first and second chambers are tubular, and the first chamber is located within the second chamber, with the second tubular chamber enclosing the first tubular chamber. 5 6. The system according to claim 50, wherein the combined tubular filter comprises a heater, and it is heated by means of electrical resistance heating. 5 7. A method for coating material onto a support, comprising: introducing the material and a carrier gas into the first chamber; heating the material such that at least a portion of the material vaporizes; passing the mixture of vapor and carrier gas through a first flow path so as to form a vapor/carrier gas mixture having uniform characteristics throughout. Delivery of the vapor and carrier gas mixture through a second flow path so as to maintain the uniform characteristics of the vapor/carrier gas mixture throughout; and delivery of the uniform vapor/carrier gas mixture throughout to the surface of the support having a temperature lower than the vapor 5 8. The method as stated in claim 57, wherein the first chamber is a tube, and wherein the flow path is determined by the first chamber and a second tubular chamber 5 9. The method as stated in claim 57, wherein the flow path is determined by a non-tubular chamber 6 0. The method as stated in claim 57, wherein heating the material comprises passing an electric current to the components of the first chamber 6 1. The method as stated in claim 60, wherein the material is cadmium chalcogenide 6 2. The method as stated in claim 61, wherein the cadmium chalcogenide is Cadmium telluride or cadmium sulfide 6 3. The method according to claim 57, wherein heating the material comprises maintaining a temperature of at least 500°C. 6 4. The method according to claim 63, wherein heating the material comprises maintaining a temperature of about 500°C to about 700°C. 6 5. The method according to claim 61, wherein the first chamber includes a plurality of diffuser holes. 6 6. The method according to claim 57, further comprising providing a mixture of vapor and carrier gas that does not contain any solid material after the material is heated, such that a portion of the material is vaporized. 6 7. The diffuser assembly comprising a first chamber, wherein the solid material and carrier gas are introduced into the chamber; a heater positioned within the first chamber and provided with a temperature sufficient to vaporize at least a portion of the solid material; The first flow path is adjacent to the first chamber and provides sufficient material flow to mix the vapor and carrier gas to form a uniform vapor/carrier gas mixture throughout; the second flow path is adjacent to the first flow path and provides sufficient material flow to maintain a uniform vapor/carrier gas mixture throughout; and the outlet is adjacent to the second flow path and is positioned so as to deliver the uniform vapor/carrier gas mixture throughout to the surface of the adjacent support. 6 8. The dispersing unit as described in claim 67, wherein the first chamber is a pipe, and wherein the flow path is determined by the first chamber and a second tubular chamber. 6 9. The dispersing unit as described in claim 67, wherein the first flow path and at least one of the second flow paths is shall be established from a non-tubular chamber 7 0. The emitter assembly as described in claim 67, wherein the first chamber comprises a heating element to be heated by means of electrical resistance heating 7 1. The emitter assembly as described in claim 67, wherein the heating element is capable of maintaining a constant temperature in the first chamber at least 500°C 7 2. The emitter assembly as described in claim 71, wherein the heating element is capable of maintaining a constant temperature in the first chamber at approximately 500°C to approximately 700°C continuously 7 3. The emitter assembly as described in claim 67, wherein the first chamber comprises a plurality of emitter holes 7 4. The emitter assembly as described in claim 67, further comprising a second chamber 7. A diffuser assembly as described in claim 67, wherein the first chamber is arranged such that no solid material is delivered to the second chamber. 7. A film coating system on a support comprising a material source connected to the diffuser assembly such that the solid material and carrier gas delivered by the material source are delivered into the diffuser assembly, wherein the diffuser assembly comprises a first chamber such that the solid material and carrier gas delivered to the diffuser assembly are delivered into the first chamber; a heater positioned within the first chamber and providing a temperature sufficient to vaporize at least a portion of the solid material; a first flow path adjacent to the first chamber and providing a material flow sufficient to mix the vapor and carrier gas into a uniform vapor/carrier gas mixture throughout; a second flow path adjacent to the first flow path and providing a material flow sufficient to maintain a uniform vapor/carrier gas mixture throughout; and an outlet adjacent to the second flow path. and positioned such that the vapor/carrier gas mixture having the same characteristics is directed to the surface of the adjacent support; and the carrier used to deliver the support is sufficiently close to the diffuser assembly such that the vapor may be deposited on the support in the form of a film 7 7. The system as stated in claim 76, wherein the first chamber is a tube and wherein the flow path is determined by the first chamber and a second tubular chamber 7 8. The system according to claim 76, wherein the first flow path and at least one of the second flow paths is defined by a non-tubular chamber 7 9. The system according to claim 76, wherein the first chamber includes a heater and it is heated by means of electric resistance heating 8 0. The system according to claim 76, wherein the heater is capable of maintaining the first chamber at a constant temperature of at least 500°C 8 1. The system according to claim 81, wherein the heater is capable of maintaining the first chamber at a constant temperature of about 500°C to about 700°C continuously 8 2. The system according to claim 76, wherein the first chamber comprises a plurality of distribution holes 8 3. The system according to claim 76, further comprising a second chamber having distribution holes 8 4. The system as stated in claim 76, wherein the first chamber is arranged such that no solid material is introduced into the second chamber. 8 2. A method for coating material onto a support, comprising introducing the material and a carrier gas into the first chamber; heating the material such that at least a portion of the material vaporizes; introducing the mixture of vapor and carrier gas through the second chamber to form a uniform vapor/carrier gas mixture throughout; and introducing the uniform vapor/carrier gas mixture into the external heating element and toward a surface of the support having a temperature lower than the vapor. 8 6. A method as stated in claim 85, wherein heating the material comprises applying an electric current to the various components. of the first chamber. 8 7. The method as stated in claim 85, wherein the material is cadmium chalcogenide and the heating includes maintaining a constant temperature of the first chamber at least 500°C. 8 8. The method as stated in claim 87, wherein the heating includes maintaining a constant temperature of the first chamber at least 700°C. 8 9. The method as stated in claim 85, wherein the outer heating element is heated by passing an electric current through the outer heating element. 9 0. The method as stated in claim 85, wherein the material is cadmium chalcogenide and the outer heating element is maintained at a constant temperature of at least 500°C. 9 1. The method as stated in claim 85, wherein a vapor/carrier gas mixture having identical characteristics is brought directly adjacent to the two outer heating elements. 9 2. The method as stated in claim 91, wherein the outer heating element is the generator. A path for delivering a uniform vapor/carrier gas mixture to the surface of the carrier 9. 3. The method as stated in claim 85, wherein the first chamber includes a plurality of diffusion holes 9. 4. The method as stated in claim 85, wherein said first chamber includes a plurality of diffusion holes 9. 5. A diffusion assembly comprising a first chamber containing a solid material and a carrier gas; a heater positioned within the first chamber and providing a temperature sufficient to vaporize at least part of the solid material; a second chamber adjacent to the first chamber and providing a flow of material sufficient to mix the vapor and carrier gas into a uniform vapor/carrier gas mixture; an outlet adjacent to the second chamber and positioned so as to deliver the uniform vapor/carrier gas mixture to the surface of the adjacent carrier; 9. The external heating element proximate to the outlet. 9. 6. The radiant unit as described in claim 95, wherein the first chamber comprises a heating element and it is heated by means of electric resistance heating. 9. 7. The radiant unit as described in claim 95, wherein the heating element is capable of maintaining a constant temperature of at least 500°C in the first chamber. 9. 8. The radiant unit as described in claim 95, wherein the heating element is capable of maintaining a constant temperature of at least 700°C in the first chamber. 9. 9. The radiant unit as described in claim 95, wherein the external heating element is heated by means of electric resistance heating. 10. 0. The radiant unit as described in claim 95, wherein the external heating element is capable of maintaining a temperature of at least 500°C. 10. 1. The radiant unit as described in claim 95, comprising a heating element. Two outer heating elements are positioned adjacent to the outlet 10. 2. The diffuser assembly as described in claim 101, wherein the outer heating element forms a path for delivering the uniform vapor/carrier gas mixture throughout to the surface of the support 10. 3. The diffuser assembly as described in claim 102, wherein the path formed by the outer heating element is a straight path that maintains the flow direction of the uniform vapor/carrier gas mixture throughout out of the outlet 10. 4. The diffuser assembly as described in claim 102, wherein the path formed by the outer heating element is a curved path that adjusts the flow direction of the uniform vapor/carrier gas mixture throughout out of the outlet 10. 5. The diffuser assembly as described in claim 95, wherein the first chamber comprises a plurality of diffuser holes 10. 6. The diffuser assembly as described in claim 95, wherein the second chamber comprises a plurality of diffuser holes 10. 7. A support film deposition system comprising a material source connected to a diffuser assembly such that the solid material and carrier gas delivered by the material source are delivered into the diffuser assembly, wherein the diffuser assembly comprises a first chamber into which the solid material and carrier gas delivered to the diffuser assembly are delivered into the first chamber; a heater positioned within the first chamber and providing a temperature sufficient to vaporize at least a portion of the solid material; a second chamber adjacent to the first chamber and providing a material flow curve sufficient to mix the vapor and carrier gas to form a uniform vapor/carrier gas mixture; an outlet adjacent to the second chamber and positioned such that the uniform vapor/carrier gas mixture is delivered to the adjacent substrate surface; and an external heater positioned adjacent to the outlet; and the conveyor used to deliver the support is sufficiently close to the diffuser assembly such that the vapor may be coated on the support as a film 10 8. The system as described in claim 107, wherein the first chamber comprises a heater and it is heated by means of electric resistance heating 10 9. The system as described in claim 107, wherein the heater is capable of maintaining the temperature of the first chamber at least 500°C 11 0. The system as described in claim 107, wherein the heater is capable of maintaining the temperature of the first chamber at least 700°C 11 1. The system as described in claim 107, wherein the external heating element is heated by means of an electrical resistance heating method 11. 2. The system as described in claim 107, wherein the external heating element is capable of maintaining a temperature of at least 500°C.11 3. The system as described in claim 107, comprising two external heating elements positioned adjacent to the outlet 11. 4. The system as described in claim 113, wherein the external heating element provides a path for the uniform vapor/carrier gas mixture to be delivered to the surface of the carrier 11. 5. The system as described in claim 114, wherein the path formed by the external heating element is a straight path that maintains the flow direction of the vapor/carrier gas mixture having the same characteristics throughout out of the outlet 11. 6. The system as described in claim 114, wherein the path formed by the external heating element is a curved path that adjusts the direction of flow of the vapor/carrier gas mixture having the same characteristics throughout out of the outlet 11. 7. The system as described in claim 107, wherein the first chamber comprises 11 distribution holes. 8. The system as described in claim 107, wherein the second chamber comprises a plurality of distribution holes.