SU951436A1 - Device for application of semiconductor layer to capacitor anodes - Google Patents

Description

This invention relates to a technology for the production of radio elements, in particular, equipment for the production of oxide-semiconductor capacitors.

A device for deposition of a semiconductor layer on anodes of capacitors is known, which contains a transport mechanism, a vapp with a working solution, a mechanism for removing mortars from the surface of the anodes and a pyrolysis furnace I.

The drawback of the device is the unevenness of the applied layer along the height of the anode due to the impregnating solution flowing to the lower end of the anode, which degrades the quality of the products. The performance of the device 1 is also insufficient, since only one layer is applied in one processing cycle.

Closest to the proposed technical essence, the technical solution is a device for applying a semiconductor layer to the anodes of capacitors, which contains a transporting mechanism in the form of a vertically closed conveyor, a bath with working solution and a pyrolysis furnace, located on the upper branch of the conveyor 2.

The disadvantages of this device are also the low quality of the products, due to the unevenness of the applied layer, and the insufficient performance of the device, due to the fact that

5 cycle of operation of the device is applied one layer. The purpose of the invention is to increase product quality and work performance. This goal is achieved by the fact that the device for applying a semiconductor

10 layers of capacitor anodes containing a transporting mechanism and a vertically closed conveyor, a bath for the working solution and a pyrolysis furnace, located on the upper branch of the conveyor, provided with an additional bath for the working solution installed on the upper branch of the conveyor and an additional pyrolysis furnace installed on the lower branch conveyor, while each bath for the working solution is equipped with a mechanism for removing excess solution, made in the form of an elastic scraper, hinged under the bath axis on which end the counterweight is installed.

FIG. 1 shows a kinematic diagram of the device; in fig. 2 - mechanism

remove excess solution; in fig. 3 shows section A-A in FIG. 2

The device contains a transporting mechanism in the form of a vertically closed conveyor 1 with cassettes 2 fixed on it, on which products 3 are installed - anodes of capacitors. On the upper branch of the conveyor 1 there is a main bath 4, a pyrolysis furnace 5 and an additional bath 6, and on the lower branch there is an additional pyrolysis furnace 7. Each bath 4 and 6 is equipped with pipes 8 for supplying water and a counter current solution connected to the baths by nozzles 9, holes 10.

Each bath 4 and 6 mounted a mechanism for removing excess solution, made in the form of an elastic scraper 11 pivotally mounted above the bath by means of an axis 12, in supports 13. A counterweight 14 is mounted on the free end of an axis 12.

The device works as follows.

The cassettes 2 with the anodes 3 installed upward are fastened to the upper branch of the conveyor 1, which moves them into the bath 4. At the outlet of the bath 4, the anodes 3 come into contact with the elastic scraper 11 of the solution removal mechanism. In this case, the scraper 11 is deflected by an angle, the larger of which is the larger the dimensions of the anode 3. The clamping of the scraper 11 to the anodes 3 is provided with a counterweight 14. Then the cassettes 2 with the anodes 3 are fed into the pyrolysis furnace 5, in which the impregnating solution decomposes and a first semiconductor layer is formed on the anodes 3, while due to the impregnating solution draining, this layer becomes thickened in the lower part of the anodes 3. Then the cassettes 2 enter the bath 6, where the anodes 3 are soaked again. At the exit of the bath 6 with the anode are removed

OUTLETS of the solution, after which the cassette 2 goes to the lower branch of the conveyor 1 and enters the pyrolysis furnace 7. In this case, the anodes 3 are already located downward and when the impregnating solution flows down, the impregnation occurs at the other end of the anode and the unevenness of the applied layer decreases, which improves the quality of the products . The application of two layers per cycle and the ability to work without readjustment of the mechanism for removing the solution leaks increases the performance of the device.

Claims (2)

1. A device for applying a semiconductor layer to anodes of capacitors, containing a transporting mechanism in the form of a vertically closed conveyor, a bath for the working solution and a pyrolysis furnace, located on the upper branch of the conveyor, characterized in that, in order to improve the quality of products and increase productivity, it is equipped an additional bath for the working solution installed on the upper branch of the conveyor and an additional pyrolysis furnace installed on the lower branch of the conveyor. 2. A device according to claim 1, characterized in that each bath of the working solution is equipped with a mechanism for removing excess solution, made in the form of an elastic scraper, hinged under the bath by means of an axis, at the end of which a counterweight is installed. Sources of information taken into account in the examination 1. USSR author's certificate No. 711641, cl. H 01 G 13/00, 01/09/76. 2. USSR author's certificate No. 452044, cl. H 01 G 13/00, 03.07.72 (prototype).