SU480040A1 - Apparatus for applying photoresist films - Google Patents

Apparatus for applying photoresist films

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Publication number
SU480040A1
SU480040A1 SU1905640A SU1905640A SU480040A1 SU 480040 A1 SU480040 A1 SU 480040A1 SU 1905640 A SU1905640 A SU 1905640A SU 1905640 A SU1905640 A SU 1905640A SU 480040 A1 SU480040 A1 SU 480040A1
Authority
SU
USSR - Soviet Union
Prior art keywords
photoresist films
applying photoresist
films
shelves
substrates
Prior art date
Application number
SU1905640A
Other languages
Russian (ru)
Inventor
Вильям Лазаревич Сандеров
Виктор Николаевич Царев
Вячеслав Владимирович Ануфриенко
Владимир Александрович Перемыщев
Петр Станиславович Кутко
Аркадий Степанович Уксусов
Игорь Алексеевич Стременов
Василий Иванович Онсин
Original Assignee
Предприятие П/Я В-8495
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Предприятие П/Я В-8495 filed Critical Предприятие П/Я В-8495
Priority to SU1905640A priority Critical patent/SU480040A1/en
Application granted granted Critical
Publication of SU480040A1 publication Critical patent/SU480040A1/en

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Description

Изобретение относитс  к устройствам дл  наа1есе;ни  тонки,х лленок из жидких материалов , лреимущественно фоторезисти;вных пленок , на плоские .подложки при изготовлении полущроводнпковых и гибридных ИНтегральных Схем, фотошаблонощ, .масок и других изделий микроэлектрон1 ки.The invention relates to devices for drawing; neither thin, thin films made of liquid materials, especially photoresist; obvious films, on flat substrates in the manufacture of semi-conductive and hybrid integrated circuits, photomask, mask, and other microelectronic products.

Известны устройства дл  нанесени  фоторези стив;ных пленок, содержащие установленный ;н,а шпинделе :патрои дл  .подложек, вакуумную систему дл  отсоса воздуха и приводной механизм .врандени  шпиндел .There are known devices for applying photoresistive films containing an installed; and, on the spindle, patrons for substrates, a vacuum system for air suction and a drive mechanism for spindle sleeves.

Цель и.зоб,ретеии  - повышение пролзводительности устройства и качества пленок - достигаетс  тем, что патрон предлагаемого устройства выполнен в -виде установленных одна над другой полок, скре.пле;нных верти«альными штанга.ми, причем в штантах и лолках Быполне«ы калалы, соединенные : .вакуумной сЕстемой.The goal of the idiom, retei is to increase the device's productivity and the quality of the films - is achieved by the fact that the cartridge of the proposed device is made in the form of shelves installed one above the other, hidden in the vertical bar, and s kalals connected: .vacuum system.

На фиг. 1 изображено описываемое устройство , вид .опереди; ;на фиг. 2 - сечение по Л-Л.FIG. 1 shows the described device, front view; in fig. 2 - section on L-L.

Патрон дл  ладложек / представл ет собой установленные одна над другой полки 2, на которых закреплены столики 3. Полки скреплены через кольца 4 вертикальными штангами 5 с помощью гаек 6 с нп.ж.ней полкой 7 и верхней полкой 8. Дл  фиксации подложек У в щтангах 5 и .полках 2 илшютс  каналы , соединенные через центральный канал шлиндел  9 с вакуумной системой. Верхн   лолка содержит зонт W и гнездо дл  установки свободно вращающегос  -центра // приводного механизма шпиндел  9.Chuck for ladders / is mounted one above the other shelves 2, on which tables 3 are fixed. The shelves are fastened through rings 4 by vertical rods 5 with nuts 6 with the lower shelf 7 and upper shelf 8. To fix the substrates The strings 5 and the regiments 2 have channels connected through the central channel of Schlindel 9 to the vacuum system. The upper lolka contains an umbrella W and a socket for mounting a freely rotating-center // drive mechanism of the spindle 9.

Устройство работает следующим образом.The device works as follows.

По.длож,ки / укладывают на столики 3 п фиксируют на них с .помощью вакуумного присоса. После одновременной выдачи дозы раствора фоторезиста на верхние поверхности всех обрабатываемых .подложек щпннаел 9 Првдводитс  ,во вращение с помощью приводного механизма, и фоторезистивна  пленка наноситс  на подложки. После остаио.зки щпиидел  вакуумный Присос отключают, и о.бр аботан.ные по.дложки снимают со столиков .патрона.After the deposit, the keys / are placed on the tables. 3 p are fixed on them with the aid of a vacuum suction cup. After a simultaneous delivery of a dose of photoresist solution to the upper surfaces of all the processed substrates, the material 9 is driven into rotation by means of a drive mechanism, and the photoresistive film is applied onto the substrates. After ostaio.zki shpidel vacuum suction cut off, and o.br abotan.nye on.dlozhki removed from the tables. Cartridge.

Предмет и з о б ip е т е н и  Subject and use of ip et te

Устройство дл  нанесени  фоторезистивных нленОК, содержащее установленный .наA device for applying photoresistive nlenOK containing the installed.

щлинделе патрон, служащий дл  размещени  по.дложек, вакуумную систему дл  отсоса воздуха и приводной механизм вращени  шпи.ндел , отличающеес  тем, что, с целью повыщеии  его производительности и качестваThe cartridge is used for placing the sleeves, a vacuum system for air suction and a drive mechanism for rotating the spi.del, characterized in that, in order to increase its productivity and quality

нленок, патроп выполнен в виде установлен34nlenok, chap made in the form set34

ных одна иад другой :полок, скрепленных чем в штангах и полках выполнены каиалы, |между собой вертикальными штангами, при- сое.диненные с вакуумной Системой.One iad of the other: shelves fastened than in bars and shelves are made of metal, with vertical bars between them, attached to the vacuum system.

480040 480040

Фиг fFig f

Фиг.22

SU1905640A 1973-04-04 1973-04-04 Apparatus for applying photoresist films SU480040A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SU1905640A SU480040A1 (en) 1973-04-04 1973-04-04 Apparatus for applying photoresist films

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU1905640A SU480040A1 (en) 1973-04-04 1973-04-04 Apparatus for applying photoresist films

Publications (1)

Publication Number Publication Date
SU480040A1 true SU480040A1 (en) 1975-08-05

Family

ID=20548922

Family Applications (1)

Application Number Title Priority Date Filing Date
SU1905640A SU480040A1 (en) 1973-04-04 1973-04-04 Apparatus for applying photoresist films

Country Status (1)

Country Link
SU (1) SU480040A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4263872A (en) * 1980-01-31 1981-04-28 Rca Corporation Radiation heated reactor for chemical vapor deposition on substrates
US4401689A (en) * 1980-01-31 1983-08-30 Rca Corporation Radiation heated reactor process for chemical vapor deposition on substrates

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4263872A (en) * 1980-01-31 1981-04-28 Rca Corporation Radiation heated reactor for chemical vapor deposition on substrates
US4401689A (en) * 1980-01-31 1983-08-30 Rca Corporation Radiation heated reactor process for chemical vapor deposition on substrates

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