SU1647698A1 - Device for catting of electron beam - Google Patents

Abstract

The invention relates to microprobe technology and is intended for electron beam gating in electron-optical systems in the study of dynamic processes. The aim of the invention is to increase the sensitivity of the device while maintaining its dimensions. The device contains a cutting diaphragm 1 and a homogeneous coaxial line formed by an external hollow conductor 2 with openings and an internal conductor 3 with a transverse rupture playing the role of an interelectrode gap. The geometrical dimensions of the outer and inner conductors of a uniform coaxial line are determined by the selected characteristic impedance of the line. Making the inner conductor in the form of a tape, the cross section of which is stretched along the optical axis of the device, allows, by reducing the capacitance of the gap, to increase the intensity of the field in the gap and, consequently, increase the sensitivity of the system with the same voltage the length at which the electron beam interacts with the field of the deflecting electrodes. 1 il. g ё ON VJ O O 00

Description

The invention relates to microprobe technology and is intended for gating of an electron beam in electron-optical systems in the study of dynamic processes. 5

The aim of the invention is to increase the sensitivity of the device while maintaining its dimensions.

The drawing shows a device for strobing an electron beam in a section.

A device for strobing an electron beam contains a cutting diaphragm 1 and a uniform coaxial line formed by an external hollow conductor 2 with holes and an internal conductor 3 with a transverse gap playing the role of an electron gap. The proposed device for gating the electron beam can be performed as follows: the outer hollow conductor 2 is made of a thin-walled copper tube with two transverse holes, inside which the inner conductor 3 is inserted with a gap, the ends 25 of which, located along the electron-optical axis of the device, are deflecting surfaces electrodes. The geometric dimensions of the external and internal conductors of a homogeneous coaxial 30 line are determined by the selected line impedance.

An example of a specific implementation of the device for strobing an electron beam. With a wave impedance of a homogeneous coaxial transmission line of 50 Ω and an accelerating voltage of up to 15 kV, the height of the end face (b) of the inner tape conductor 3 is 10 mm, the width of the end <1 mm, the inner diameter (D) of the outer tubular conductor 2 must be equal to 11.5 mm. The ends of the inner tape conductor 3 inserted into the outer tubular conductor 2 are arranged so that their cross section is elongated along the electron-optical axis of the device and form an interelectrode gap.

A device for gating an electron beam operates as follows.

The electron beam 4 passes between the ends of the inner conductor 3, when an alternating voltage 10 is applied to it from the control unit, an electric field is created between the deflecting electrodes, under the influence of which the electron beam 4, passing through the interelectrode gap, is displaced and interrupted by the diaphragm15 my 1.

The implementation of the inner conductor of a homogeneous coaxial line in the form of a tape, the cross section of which is elongated along the electron-optical axis of the device, 20 allows compared with the prototype device by reducing the gap capacity at the same voltage between the deflecting electrodes, the same gap width and the same length on which the electronic the beam interacts with deflecting electrodes, increase the electric field strength in the gap and, therefore, increase the sensitivity of the system.

Claims (1)

Claim A device for strobing an electron beam containing a cutting diaphragm and a uniform coaxial line connected to the control unit, with an internal conductor divided by a transverse gap into deflecting electrodes, characterized in that, in order to increase the sensitivity of the device while maintaining its dimensions , the inner conductor with the maximum and minimum transverse dimensions is oriented by the maximum size along the axis of the electron beam. Compiled by E. Baryshevsky Editor T. Yurchikova Tehred M. Morgenthal Corrector I. Muska Order 1650 Circulation 328 Subscribed VNIIIPI of the State Committee for Inventions and Discoveries under the State Committee for Science and Technology of the USSR 113035, Moscow, Zh-35, Raushskaya nab., 4/5 Production and Publishing Combine Patent, Uzhgorod, 101 Gagarin St.