SU1408315A1 - Method of determining the reflection index of scattering medium - Google Patents

Description

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I The invention relates to optics 1 dispersible in two media and can be used to measure optical permanent suspensions of powder materials, pigments, substances, dispersed state, determining the reflectivity of a layer of scattering medium. j The aim of the invention is to improve the accuracy of determining the reflection coefficient of the scattering medium.

The essence of the method is that a collimated flux of light is directed to a cell with a scattering medium, the intensity of the incident and reflected fluxes is measured and, by their ratio, the reflectance is judged; after measuring the intensities of the fluxes, a specular substrate is applied to at least one of side edges of the cuvette and repeat the measurement of the intensity of the reflected flow, compare the obtained values of the intensities of the reflected fluxes and, if they are unequal, the number of mirror mirrors nuts, mounted on perimet) in a cuvette to obtain a maximum value otrazhenno- intensity) -o stream is used to determine the ratio of the intensity of the reflected intensity of the incident flow and

Example, Determining the reflection coefficient of a suspension layer of polystyrene latex particles. Diameter of polystyrene particles is 0.44 µm. A standard measurement scheme is used: source of collimated heat radiation, translucent grain, rectangular cross section cuvette,: Mirror substrates, interference filter with bandwidth () nm. Intensity (; vetov fluxes are measured using a PMT-79; Reflectance coefficients of the layers, which are characterized by 1 | 1 longitudinal optical density fy 6,10 and 20, are measured, with transverse optical density and Inten (the flux of the incident flux keeps ft constant). In this case, it is not possible to characterize the layer by its optical dimensions (itHMH).

on equivalent geometric dimensions (50X50X50 mm), Concentration of particles 1 / cm, The magnitude of reflected from the luminous flux without substrates

240 TKA, Install the mirror substrate on the side face of the cuvette and again measure the reflected luminous flux, which is equal to 300 TKA, Third

0, the substrate mounted on the side of the cuvette changes the reflected flux, which is equal to 350 mA, the second and third values of the reflected flux are quite close in value,

5 Therefore, install another substrate. The magnitude of the reflected light flux is 290 TCA. This is due to the intense quanta moving away in the direction of the transmitted light flux, since t y is small. The reflection coefficient is calculated from the third maximum stream value. Its value is 0.35. Similarly, measurements are made for a cuvette.

5 other sizes - 50 50X50 and 50 X X50X25 mm,

Claims (1)

Invention Formula 0 A method for determining the reflectance of a scattering medium, consisting in a tone, that a collimated flux of light is directed to a cell with a scattering medium, The intensity of the incident and reflected fluxes is measured and judged by their ratio on the reflection coefficient, characterized in that, with a chain that increases the accuracy of the reflection coefficient, after measuring the intensity of the fluxes, a mirror substrate is applied to at least one of the lateral faces of the cuvette. and repeat the measurements of the intensity of the reflected flux intensity, compare the obtained values of the intensities of the reflected fluxes and in case of their inequality increase the number of mirror substrates set along the perimeter of the cuvette, to obtain -: the maximum value of the intensity of the reflected flux, which is used by determining the ratio of the intensity of the reflected flux to the intensity of the incident flux