SU1379769A1 - Method of exposing light-sensitive material through a transparent medium with phase microimage - Google Patents

Abstract

The invention relates to a method of exposing a receiving light-sensitive material through a transparent medium with a phase micro image. Media with phase microimage is combined with an additional carrier substrate. And the photosensitive layer of the additional carrier is brought into contact with the photosensitive layer of the receiving material. Then, exposure of the photosensitive layer of the receiving material is carried out through the carrier with the phase image. Vesicular and diazographic materials of the same composition are used as photosensitive layers of the main and additional carriers. 1 hp f-ly, 2 ill.

Description

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FIELD: microfilming.

The purpose of the invention is to improve the quality of the exposure and by increasing the exposure contrast.

FIG. a diagram illustrating the method of exposure is presented; Fig. 2 shows the characteristic curves for a vesicular material and for a method of exposing the same material when used as a ppet-sensitive layer that changes the transparency of the vesicular material.

An additional carrier 3 with a photosensitive layer is placed between the receiving photosensitive material and the transparent carrier 2 with the phase microimage. The transparency of the latter is changed by the action of light. The substrate A of the additional carrier is placed in contact with the carrier layer of the phase image, and layer 5, which changes the transparency under the action of light, with the photosensitive layer of the receiving material. The phase microimage is transformed in the process of exposure when a light flux passes through it into an amplitude one, which is localized in the plane of the photosensitive layer of the receiving material. The contrast of the rendered image does not exceed 0.5-0.7, therefore, to obtain a contrast image on the receiving material, the nonlinear properties of high-contrast photosensitive materials are used, consisting in the fact that due to the small fho then low-contrast images can be registered on them.

 In the initial stages of exposure, the additional carrier weakens the light note, but as the color fades, the transparency of the photosensitive carrier layer for actinic light flux increases, thereby gradually increasing the proportion of the light flux reaching the photosensitive layer of the receiving material. As a result, the contrast ratio of the image on the receiving material is increased in comparison with the contrast of the most photosensitive layer of the receiving material.

Example. The phase microimage is recorded on a photothermoplastic layer (FTP-M1) with a thickness of 6 μm. The layer is deposited on a metallized lavsan substrate with a thickness of 175 microns. The photothermoplastic layer is a composition of PVC and copolymer with divinyl. With a decrease of 21, typographical text is recorded on it with the width of the elements in signs П, 1-0.4 mm. The depth of the phase relief in the image recorded on the photothermoplastic layer is 0.5-1 µm. A VZ-2 format (A6) vesicular film is used as the receiving photosensitive material and as a layer that changes the transparency.

The thickness of the transparent lavsan substrate is 175 µm, the refractive index is n 1.6, the exposure is carried out on a standard apparatus. The photographic width of the image on the vesicular film is 0.2 B, i.e., the contrast ratio increases from 2 to 5,

Claims (1)

Invention Formula 1, A method of exposing a receiving photosensitive material through a transparent carrier with a phase microimage, including mechanical pressing of a carrier with a phase microimage and a receiving photosensitive material consisting of a substrate coated with a photosensitive layer, and illuminating the latter through a carrier with a phase microimage, differing from that, in order to improve the quality of exposure by increasing the exposure contrast, between the receiving material and the carrier phase images place an additional carrier with a photosensitive layer that changes the transparency under the action of light, while the substrate of the additional carrier is placed in contact with the phase layer of the carrier of the phase image, and the layer that changes the transparency under the action of light - with the photosensitive layer of the receiving material. 2, the method according to claim 1, about u and with the fact that tl and h and y - as light-sensitive layers of the main and additional carriers are used vesicular and bottomographic materials of the same composition. W //// 7/7 //// 7/7 / //////// 1.2 FIG. 1