SU1272099A1

SU1272099A1 - Device for checking process of metal chemical treatment

Info

Publication number: SU1272099A1
Application number: SU853917914A
Authority: SU
Inventors: Лев Васильевич Капралов; Бронислав Матвеевич Мордухов
Original assignee: Предприятие П/Я В-2323
Priority date: 1985-06-20
Filing date: 1985-06-20
Publication date: 1986-11-23

Abstract

Изобретение относитс к измерительной технике и может быть использовано дл контрол химических и электрохимических процессов. Цель изобретени - расширение диапазона измерений контролируемого параметра путем его дискретизации. Существо изобретени заключаетс в том, что в ванну с раствором помещают обрабатываемую и эталонную детали. Процесс химической обработки контролируетс по количеству газа, выдел ющегос из эталонной детали 4. Газ накапливаетс в верхней части газосборника 5 и вытесн ет раствор из него. Изменение уровн раствора в газосборнике фиксируетс датчиком 8 нижнего уровн и датчиком верхнего уровн , выполненным в виде трубки 6, расположенной в верхней части газосборника . При вытеснении раствора газом до уровн расположени датчика 8 открываетс клапан 7 на трубке 6 и газосборник наполн етс раствором. Количество срабатываний клапана 7 с отображает процесс химической обра ботки детали и фиксируетс счетчиком 15 и индикатором 16. Периодичность работы клапана 7 и счетчика 15 определ ет дискретизацию контролируемого параметра. 5 з.п. ф-лы, I ил.The invention relates to a measurement technique and can be used to control chemical and electrochemical processes. The purpose of the invention is to expand the range of measurements of the monitored parameter by sampling it. The essence of the invention is that the treated and reference parts are placed in the solution bath. The chemical treatment process is controlled by the amount of gas released from the reference part 4. The gas accumulates in the upper part of the gas collector 5 and displaces the solution from it. The change in the level of the solution in the gas collector is detected by the sensor 8 of the lower level and the sensor of the upper level made in the form of a tube 6 located in the upper part of the gas collector. When displacing the solution with gas to the level of the sensor 8, the valve 7 opens on the tube 6 and the gas collector is filled with the solution. The number of actuations of the valve 7 s displays the process of chemical processing of the part and is fixed by the counter 15 and the indicator 16. The frequency of operation of the valve 7 and the counter 15 determines the discretization of the monitored parameter. 5 hp f-ly, I ill.

Description

Изобретение относится к измерительной технике и может быть использовано для контроля химических и электрохимических процессов„The invention relates to measuring equipment and can be used to control chemical and electrochemical processes

Цель изобретения - расширение диапазона измерений контролируемого параметра путем его дискретизации.The purpose of the invention is the expansion of the measurement range of the controlled parameter by its discretization.

На чертеже изображено устройство для контроля процесса химической обработки металла,The drawing shows a device for controlling the process of chemical processing of metal,

Устройство содержит ванну 1 с раствором 2, обрабатываемую деталь 3, эталонную деталь 4, размешенную под газосборником 5с которым в его верхней части соединена дренажная трубка'6, верхняя часть которой снабжена электроклапаном 7, а нижняя его часть выполняет функции датчика верхнего уровня раствора внутри газосборника 5. В верхнюю часть газосборника 5 вмонтирован датчик 8 нижнего уровня, выполненный в виде стержня, который, как и дренажная трубка 6, изготовлен из электропроводного материала, причем стержень и трубка электрически изолированы друг от друга.The device comprises a bath 1 with a solution 2, a workpiece 3, a reference part 4, placed under a gas collector 5 with which a drain pipe'6 is connected in its upper part, the upper part of which is equipped with an electrovalve 7, and its lower part acts as a sensor of the upper level of the solution inside the gas collector 5. In the upper part of the gas collector 5 is mounted a sensor 8 of the lower level, made in the form of a rod, which, like the drainage tube 6, is made of electrically conductive material, and the rod and the tube are electrically insulated dr g from each other.

Датчик 8 механически соединен с корпусом газосборника 5₃ а также может быть выполнен с возможностью перемещения и фиксации положения. Верхняя часть датчика 8, расположенная над газосборником 5, снабжена шкалой с делениями,The sensor 8 is mechanically connected to the body of the gas collector 5 ₃ and can also be configured to move and fix the position. The upper part of the sensor 8, located above the gas collector 5, is equipped with a scale with divisions,

Датчик 8 через первый усилитель и элемент НЕ II связан с S-входом триггера 12, а трубка 6 через второй усилитель 13 с R-входом триггераThe sensor 8 through the first amplifier and the element NOT II is connected to the S-input of the trigger 12, and the tube 6 through the second amplifier 13 with the R-input of the trigger

12, прямой выход которого через управляемый ключ 14 электрически связан с электроклапаном 1 Прямой выход триггера 12 через счетный вход счетчика 15 импульсов связан с индикатором 16.12, the direct output of which through a controlled key 14 is electrically connected to the electrovalve 1. The direct output of the trigger 12 through the counting input of the pulse counter 15 is connected to the indicator 16.

В варианте устройства прямой выход триггера 12 подключен к счетному входу счетчика 15 импульсов с переменным коэффициентом деления, управляющий вход которого соединен с выходом блока 17 задания параметра, а выход - с индикатором 16,In an embodiment of the device, the direct output of the trigger 12 is connected to the counting input of the pulse counter 15 with a variable division ratio, the control input of which is connected to the output of the parameter setting unit 17, and the output to the indicator 16,

Устройство работает следующим образом .The device operates as follows.

В исходном состоянии газосборник 5 погружен в раствор 2, электроклапан 7 закрыт и раствор внутри газосборника 5 находится на уровне: ни?:кне~ го конца трубки 6. Это состояние обеспечивается принудительным открытием э.псктроклапана 7 па время погружения газосборника 5 в раствор 2, чтобы воздух из его полости имел возможность выхода через дренажную трубку 6 (она же датчик верхнего уровня) в процессе погружения в раствор 2 ,In the initial state, the gas collector 5 is immersed in solution 2, the electrovalve 7 is closed and the solution inside the gas collector 5 is at the level: none?: At the end of the tube 6. This state is ensured by the forced opening of the electronic valve 7 during the immersion of the gas collector 5 in solution 2, so that air from its cavity has the opportunity to exit through the drainage tube 6 (it is also a top level sensor) during immersion in solution 2,

В примерах используют схемы пер10 вого 10 и второго 13 усилителей,- с прямыми выходами, триггера 12 RS-типа с инверсным управлением.In the examples, the schemes of the first 10 and the second 13 amplifiers are used, with direct outputs, RS-type flip-flop 12 with inverse control.

В исходном состоянии датчики верхнего и нижнего уровней находятся в 15 электрическом контакте с раствором внутри газосборника 5. Поэтому на R-входе триггера 12 - сигнал О, на S-входе благодаря наличию элемента НЕ 1 1 — сигнал ι состояние триг->р сера 12 таково, г.то на ого прямом выходе присутствует сигнал О«Вследствие этого управляемый ключ I -\ и электроклапан 7 находятся в,закрытом состоянии. При псмащении эталонной 25 детали 7 под газосборник 5 с ее поверхности за счет протекания химической реакции начинается бурное выделение пузырьков газа (водорода), который, накапливаясь в верхней полос,θ ти газосборника 5, вытесняет раствор из него. При отрыве датчика верхнего уровня трубки 6 от поверхности раствора на Н-вход тригт’еэа 12 через второй усилитель-13 поступает сигнал 1, который не изменяет состояние триггера 12, При дальнейшем понижении уровня раствора наступает момент отрыва датчика 8 нижнего уровня, в результате которою на 7—вход триг— гера 12 через первый усилитель 10 и элемент НЕ 11, поступает сигнал О’’„ и он .переходит в другое устойчивое состояние, при котором на его прямом выходе появляется сигнал 'Ί”, который открывает ключ J4 и далее э.гектроклапан 7,In the initial state, the sensors of the upper and lower levels are in 15 electrical contact with the solution inside the gas collector 5. Therefore, at the R-input of trigger 12 there is a signal O, at the S-input due to the presence of the element NOT 1 1 is a signal ι state trigger-> p sulfur 12 this is because there is a signal О on the direct direct output. As a result of this, the controlled key I - \ and the electrovalve 7 are in a closed state. When the reference part 25 of part 7 is annealed under the gas collector 5 from its surface, due to the chemical reaction, vigorous evolution of gas (hydrogen) bubbles begins, which, accumulating in the upper bands, θ of the gas collector 5, displaces the solution from it. When the sensor of the upper level of the tube 6 is torn off from the solution surface, the signal 1, which does not change the state of the trigger 12, is fed to the H-input of the trigger 12 via the second amplifier-13. Upon further lowering of the solution level, the moment of separation of the lower level sensor 8 occurs, as a result of which at 7 — the input of trigger 12 through the first amplifier 10 and the element NOT 11, a signal O ’” ’arrives and it goes into another stable state, in which a signal Ί появляется appears on its direct output, which opens the key J4 and then solenoid valve 7,

В результате с-равливания водорода через дренажный канал в трубке 6 уровень раствора начинает снова подниматься вверх до тех пор, пока с ним не входит в электрический контакт трубка Ь, На :?-входе триггера 12 снова появляется сигнал 0 и он возвращается в исходное состояние.As a result of hydrogen co-equalization through the drainage channel in the tube 6, the level of the solution begins to rise again until the b-tube comes into electric contact with it. At:? - the input of trigger 12 again displays signal 0 and it returns to its original state .

В дальнейшем описанный процесс периодически циклами повторяется.Further, the described process is periodically repeated in cycles.

Количество циклов регистрируется счетчиком 15 импульсов и отображается цифровым индикатором 1 6.The number of cycles is recorded by a counter of 15 pulses and is displayed by a digital indicator 1 6.

Во втором варианте количество циклов также регистрируется счетчиком 15 импульсов, но с переменным коэффициентом деления. Это позволяет вести процесс контроля обработ- 5 ки детали с заранее заданной программой, определяемой блоком 17 задания , параметра, выполнение которой фиксируется индикатором 16. Таким образом, второй вариант устройства ориентирует на использование его в автоматизированных системах контроля процесса.In the second embodiment, the number of cycles is also recorded by a counter of 15 pulses, but with a variable division ratio. This allows you to conduct the process of controlling the processing of the part with a predetermined program defined by the task unit 17, a parameter the execution of which is fixed by indicator 16. Thus, the second version of the device focuses on its use in automated process control systems.

Датчик 8 нижнего уровня выполнен а возможностью перемещения и фик-15 сации положения, его верхняя часть, расположенная над газосборником 5, снабжена шкалой 9 в связи с тем, что химической обработке подвергается значительный ассортимент деталей с различными параметрами глубины фрезерования или нанесения на них гальванических покрытий разной толщины. Вследствие этого размеры эталонной пластины также будут варьировать в широких пределах, а это значит, что количество водорода, выделяемого в ходе реакции, также будет различным, и для сохранения приемлемых метрологических характеристик устройства в широком диапазоне измерений контролируемого параметра, каковым является объем (или вес) газа, целесообразно в него ввести регулировку дискретности, В этом случае шкала 9 датчика 8 нижнего уровня может быть выполнена в единицах объема газа, заключенного между обоими уровнями.The sensor 8 of the lower level is made with the ability to move and fix the position, its upper part, located above the gas collector 5, is equipped with a scale 9 due to the fact that a significant assortment of parts with various parameters of the depth of milling or plating on them is subjected to chemical treatment different thickness. As a result, the dimensions of the reference plate will also vary within wide limits, which means that the amount of hydrogen released during the reaction will also be different, and to maintain acceptable metrological characteristics of the device in a wide measurement range of the controlled parameter, which is the volume (or weight) gas, it is advisable to introduce a discrete adjustment into it. In this case, the scale 9 of the lower level sensor 8 can be performed in units of the volume of gas enclosed between both levels.

Пример 1. При химическом фрезеровании детали из алюминия (ат.м. 27, плотность ( Р) 2,7 г/см·³), процесс фрезерования ведется в соответствии с уравнениемExample 1. When chemical milling of aluminum parts (atm. 27, density (P) 2.7 g / cm · ³ ), the milling process is carried out in accordance with the equation

2Al+6Na0H=2NaA10 +3H₂f .2Al + 6Na0H = 2NaA10 + 3H ₂ f.

Из уравнения следует, что 2 г-моль алюминия соответствует 3 г-моль водорода (ат.м. 1,008, Р 89882'10³г/см³или 89882’10⁶ г/л).From the equation it follows that 2 g mol of aluminum corresponds to 3 g mol of hydrogen (atm 1.008, P 89882'10 ³ g / cm ³ or 89882'10 ⁶ g / l).

Путем математических преобразований, вытекающих из уравнения процесса, и параметров входящих в него элементов (А1 и Н) имеют где Р_н - количество ляющееся в водорода, выдепроцессе химической реакции между металлом эталонной летали и рас.твог;By means of mathematical transformations arising from the process equation and the parameters of the elements entering into it (A1 and H), where P _n is the amount of hydrogen in the process, the chemical reaction between the reference metal was flying and the solution was released;

?т ром, г;? t rum, g;

площадь эталонной пластины, участвующая в химической реакции, см ;the area of the reference plate involved in the chemical reaction, cm;

толщина эталонной детали, см;thickness of the reference part, cm;

коэффициент пропорциональности, получаемый из уравнения химической реакции к= «,307.the proportionality coefficient obtained from the equation of the chemical reaction k = ", 307.

6’ат.м. Η Р _е 6'at.m. Η P _e

Пример Ια. Предположим, требуется произвести химическое фрезерование детали (или части ее) из алюминия на глубину 1 мм. Выбирают площадь эталонной детали, например S=Example Ια. Suppose you want to chemically mill a part (or part of it) from aluminum to a depth of 1 mm. Select the area of the reference part, for example, S =

О ' * =10 см’, а ее толщину - требуемой глубины обработки детали d =0,1 см. По приведенной формуле определяют весовое количество водорода, которое выделяется в процессе реакции, Р_я ~ 7/0,3024 мг или в ед. об. 7^3,36 л.O '* = 10 cm', and its thickness - the required depth of processing of the part d = 0.1 cm. Using the above formula, determine the weight amount of hydrogen that is released during the reaction, P _i ~ 7 / 0.3024 mg or in units. about. 7 ^ 3.36 l.

Процесс квантования контролируемого параметра характеризуется дискретностью д, которую выбирают в зависимости от требуемой точности обработки детали,The quantization process of the controlled parameter is characterized by the discreteness q, which is selected depending on the required accuracy of processing the part,

При выборе л=0,01 л первого и второго . зарегистрируют в процессе всего при д =0,1 л лWhen choosing l = 0.01 l of the first and second. register in the process at d = 0.1 l

Точность ботки различна вом случае 0.3 тьем 30%.The accuracy of the shoe is different in the case of 0.3 by 30%.

При м е р обрабатывав мую заданной толщиныExample of machining a given thickness

8,9 г/см³,) ветствии с акции8.9 g / cm ³ ,) in accordance with the action

П УЛ л с о в устройстваP UL L with about in the device

ИМ] ул ь сов контроля, а при А=1 .IM] ul st ow control, and with A = 1.

счетчики инвариантов =336 й времени импульса, - всего 3 импульса, контроля процесса обраи составляет: в перг во втором 3 и в тре2. При нанесении на деталь слоя никеля (ат.м. 5 9, Р ;’ процесс ведется в соотуравнением химической реNiFO, +2Кя.Н ГО +2Н 0=Nit+2H ГО + +H₂0C_VH₂f.invariant counters = 336th pulse time, - only 3 pulses, the process control image is: in perg in the second 3 and in tre2. When a nickel layer is applied to the part (atm 5 9, P; '), the process is carried out in accordance with the chemical equation NiFO, + 2Ka.N GO + 2N 0 = Nit + 2H GO + + H ₂ 0C _V H ₂ f.

Проведя аналогичные расчеты,по лучают где K_N.Carrying out similar calculations, we obtain where K _N.

- коэффициент пропорциональности, получаемый из уравнения химической реакции ¢13,288.is the proportionality coefficient obtained from the chemical reaction equation ¢ 13.288.

2'ат.м. Нр ^Ν ΐ s2'at.m. Nr ^Ν ΐ s

ЬB

П P и м e p 2α. Производят контроль процесса нанесения никеля толщиной 100 мкм. Выбирают площадь эталонной детали, например F_g^=l 00 см . Толщина эталонной дётали d имеет произвольное значение, поэтому в формулу для Р_н подставляют вместо d_JTтребуемое значение толщины покрытия.P P and m ep 2α. The process of applying nickel with a thickness of 100 μm is monitored. Select the area of the reference part, for example F _g ^ = l 00 cm. The thickness of the reference detail d has an arbitrary value, therefore, in the formula for P _n substitute the required value of the coating thickness instead of d _JT .

Определяют количество водорода, которое выделяется в процессе реакции Р_и£ 3,04 г. Это количество соответствует объему водорода V_H=33,8 л.Determine the amount of hydrogen that is released during the reaction P _and £ 3.04 g. This amount corresponds to the volume of hydrogen V _H = 33.8 liters.

При выборе Δ=0,01 л счетчики импульсов первого и второго вариантов устройства зарегистрируют =3380 импульсов в процессе всего времени контроля) при Д=0,1 л 338 импульсов, а при &=1 л ~ всего 33 импульса.Соответственно точность контроля процесса обработки также различна, как и в первом примере, и составляет: в первом случае 0,03, во втором 0,3 и в третьем 37«.If Δ = 0.01 l is selected, the pulse counters of the first and second versions of the device will register = 3380 pulses during the entire monitoring time) for D = 0.1 l 338 pulses, and for & = 1 l ~ 33 pulses in total. Accuracy of the process control processing is also different, as in the first example, and is: in the first case, 0.03, in the second 0.3 and in the third 37 ".

. Таким образом, предлагаемое техническое решение отвечает поставленной цели - расширение диапазона измерений контролируемого параметра путем его дискретизации.. Thus, the proposed technical solution meets the goal - expanding the measurement range of the controlled parameter by discretizing it.

Claims

The invention relates to the mercury engineering and can be used to control chemical and electrochemical processes. The purpose of the invention is to spread out the measurement range of a monitored parameter by sampling it. The drawing shows a device for controlling the process of chemical processing of metal. The device contains a bath 1 with solution 2, process part 3s of reference part 4. scrubbed under the gas collector 5; with which in its upper part a drainage tube 6 is connected, the upper part of which is equipped with an electro-valve 7, and the lower part of it performs the functions of the sensor of the upper level of the solution inside the gas collector 5. In the upper part of the gas collector 5 there is a built-in sensor 8 of the lower level, made in the form of a rod, which, like a drainage tube b, is made ovle of zlektropro-aqueous materialaS wherein the rod and tube electric cooker Others- isolated from one another, 8 are mechanically connected to the housing and the gas plenum 5z mo Jette be configured poss; knostyu n remescheni and fixing Polo: .keni. The upper part of the sensor 8, which is above the gas collector 5, is kena scale 9 with divisions ,. Sensor 8 through the first amplifier 10 and the element NOT 11 is connected to the S input of the trigger 12, and the tube 6 through; Secondly, the amplifier 13 with the R-input of the trigger 2, the direct output of which is controlled by the control key 1 i-electr-Chesky is connected to the electro-palan 7-. The direct output of the triangle 12 through the counter count input 5) is connected to the indicator 16, In the device variant the output trigger of the trigger 12 is connected to the count input of the pulse counter 15 with a variable division coefficient, the control input of which is connected to the back house of the block 17 setting the parameter, and the output with indicator 16, the device operates as follows: In the initial state, the gas collector 5 is immersed in solution 2, the solenoid 7 is closed and the solution inside the gas collector 5 is rta ypoBiie. the lower end of the tube 6, this condition is ensured by the initial opening of the electroplating pump 7 at the time of immersion of the gas sampling chamber 5 and solution 2, so that the air from its possibility of escape through the drainage tube 6 (oFia is also a Top Level sensor); to solution 2, In the examples, the first 10 and second 13 E 13 amplifiers of J- with tricks, 1 2 RS-type trigger with inverse control are used. In the initial state, the sensors of the upper and lower levels are in electrical contact with p r c; t rum inside the gas collector 5. On the; -input of the trigger 12 - cr-drove on the input due to the talichey element HE 11 - scram 1 c rTCiFHMe TRI1 eru 12 TjiKOTio of this control; he em is a switch -: and elektrok: an;: n 7 gakhod 1-s in, the lock is sh1K. When nrt-ieniernu-j zta.1ON1Yuy. Sweat f; pop, gazsePor) 5 from its surface is due to the photo; 5Ni chemical reaction and the beginning of a vigorous release of gas (hydrogen) 5 gas bubbles, which, in turn, flow from the gas-discharge chamber cavity 5) displaces the solution out of it, ilpp; The olpfciiie of the sensor of the upper level of the tube b from riciBCpxrfocTH grow on the H input Tp: irre; K: i 12 through the second amplification signal i 3 receives a signal 1, which does not change the state of the trigger 12, With / further decreasing the solution level There comes the time of departure of Dat1-1ka 8 chizhpogo uoovn; as a result of which the f-approach of trigger 12 is transmitted through the first amplifier. 10 and the element W. And, the signal O is received, and it plays into the control unit: the first vc is the CLEAR condition, when it is not its right output, R: h.: Sgtgtal I, who opens the key 14 and then z.e.e to tr o to l and n 7, In the Jesulth / gate of the radiannan of hydrogen through core1; ajny: the channel in the tube 6 is the level of strainer It starts up again until it enters the experimental contact tube 6. On AB iOfie of trigger 12, it again appears c1- (signal O and it returns to its original state. Later og1 1sanny passwith periodically cycles repeats, the number of cycles is detected by counter 15 pulses, and displayed with the numbered indicator 16, 3 In the second variant, the number of cycles is also recorded by counter 15 pulses, but with a dividing ratio. with a predetermined program defined by block 17 of the task, a parameter whose execution is recorded by the igadicator 16. Thus, the second version of the device focuses on using it in automating these process control systems. The lower level sensor 8 is made with the possibility of moving and positioning; its upper part, located above the gas collector 55, is provided with a scale 9 in connection with the fact that a significant assortment of parts with different depth parameters of milling or applying galvanic coatings is subjected to chemical treatment. crowds. As a result, the dimensions of the reference plate will also vary within wide limits, which means that the amount of hydrogen released during the reaction will also vary to maintain acceptable metrological characteristics of the device in a wide range of measurements of the controlled parameter, which is the volume ( or weight) of gas, it is advisable to enter the adjustment of discreteness in it. In this case, the scale of 9 sensor 8 of the lower level can be performed in units of the volume of gas enclosed between the two levels. Example 1. At chemical milling of a part from aluminum (atm. 27, density (P) 2.7 g / cm-), the milling process is carried out in accordance with the equation 2Al + 6NaOH 2NaA10j. From the equation it follows that 2 g -mole of aluminum corresponds to 3 g-mole of hydrogen (atm. 1.008, P 89882-10 g / s or 89882 10 g / l). By mathematical transformation, the scientific research institutes deriving from the process equation and the parameters of the elements included in it (A1 and H) have ql iL-L where P is the amount of hydrogen released during the chemical reaction between the metal and the reference and solution, g; the area of the reference plate, participating, and in the chemical reaction, cm; TOjmnnia of stadium detail, cm; The ratio of 1 value obtained from the equation x and the frequency of the reaction of 2 atm. X3.307. Example 1a Suppose it is required to make a chemical milling of a part (or part of it) from al to a depth of 1 Fm. The area of the reference part is selected, for example, 10 cNr, and its thickness is the required depth of processing of the part d 0.1 cm. Using the formula given, the weight of hydrogen that is released during the reaction, P), 3024 ig or units is determined. , 36 p. The quantization process of the monitored parameter is characterized by discreteness, which is chosen in the wording of iost 1 from the required accuracy of processing the part. If you choose 01 l impulses for the first and second variants, the devices will register I-336 pulses in npoiecce of the whole monitoring time, 0.1 l 33 impulses, and with l - only 3 and myca. The accuracy of control of the processing process is different and is: in the first case, 0.3, in the second 3 and in the third 30%. EXAMPLE 2. When a layer of nickel of a given thickness is applied to the machined part (atm. 59, P; 8.9 g / cm), the process is carried out in accordance with the equation of the chemical PeNiFO, + 2KpF rC + 2H O at + 2H GO + + H, rC) ,. Carried out similar calculations, they learn. where K is the proportionality coefficient obtained from the chemical reaction equation to Ci of 3.288. N: 2 atm. 5 PRI me R 2o. Processes of nickel deposition with a thickness of 100 microns will be monitored. The size of the reference part is selected, for example, cm. The thickness of the reference part d is arbitrary, so the formula for P is substituted for d in the formula, the required thickness of the coating. The amount of hydrogen that is released during the reaction is 3.04 g. corresponds to the volume of hydrogen, 8 l When selected, 01 l pulse counters of the first and second variants of the device will register - 3380 pulses during the entire monitoring time; with, 1 l 338 pulses and with l - only 33 pulses. Accordingly, the accuracy of control of the processing process is also different, as in the first example, and is: in the first case, 0.03, in the second, 0.3 and in the third 3%. . Thus, the proposed technical solution meets the goal - the expansion of the measurement range of the monitored parameter by sampling it. Claim 1. Device for controlling the process of chemical processing of metal, mainly in a bath with a solution e placed in it processed and reference parts, equipped with a gas collector with a tube installed in its upper part, characterized in that in order to extend the measurement range of the monitored parameter it is equipped with two amplifiers, a trigger, an element NOT, a counter, an indicator key, a sensor for the lower level of the solution and an electroflap valve, with the electrovalve installed the tube, the low level sensor and the tube are electrically connected to the inputs of the first and second amplifiers, the first amplifier is NOT connected to the S-input of the trigger, and the output of the second amplifier is connected to the R-input of the trigger, the output of which is connected to the indicator via pulse counter through the key - with solenoid valve.

2. The device according to claim 1, characterized in that the sensor of the lower level is made in the form of a rod of electrically conductive material and is fixed in the upper part of the gas collector.

3.Device "on nn. 1 and 2, in contrast to the fact that the lower level sensor is made with the possibility of mixing in the vertical direction and fixing its position, and its upper part is located outside the gas collector and is equipped with a scale.

4. The device according to claim 1, that is so that the tube is made of electrically conductive material. .

5. The device according to claim I, characterized in that the counter is made with a variable division factor.

6. The device according to paragraphs. I and 2, characterized in that the rod and the tube are electrically insulated from each other.