SK237892A3 - Packing piece with negative working light-sensitive layer - Google Patents

Abstract

The solution described in this patent deals with the substrate covered by the light sensitive layer for photo chemical reproduction, during the chemical treatment, while this substrate is created based on the metal substrate covered by the light sensitive layer, while this layer consists of 90 up to 98 weight percent phenol formaldehyde resin or substituted phenol formaldehyde resin, of 2 up to 10 weight percent anthracene and of 0,01 up to 0,5 weight percent related to singlet sensitiser, while this light sensitive layer contains 0,05 up to 1 weight percent of organic pigment.

Description

BACKGROUND OF THE INVENTION The present invention relates to a substrate having a negatively practicable resin layer for phenol-formaldehyde or substituted phenol-theoretical aldehyde resins for photo-mechanical reproduction or masking of substrates in the so-called " chcmlokša obrábaní.

BACKGROUND OF THE INVENTION

The recording of the light information into the polymeric material can be carried out in a stepwise manner.

In the light-sensitive negative layers, the chemical processes take place under illumination, leading to a reduction in the physical and chemical properties (especially the solubility) of the aystea. The principle of image formation is the formation of insoluble assembled polymer upon illumination of the uncrosslinked polymer. The initiation of these reactions is usually carried out by a photocherd initiator which decomposes into free radicals by absorption of light energy. As photoinitiators, respectively. photocrosslinkers are used in various substances, such as e.g. benzoin and its derivatives, azide and tetrsazidates, bisazides, cinnamic acid and its derivatives, peroxides, diazo compounds and the like.

The image in the photosensitive layer can be produced by photochemical production of the crosslinking initiator causing chemical and physical changes in the properties of the whole system. Such a possibility is the photo-oxidation reaction of anthracene, as shown in U.S. Pat. No. 172537 (1975) with the oxidation of anthracene by UV radiation, 10-dioxyantracin (9,10-dihydroxy-9, 10-epidinoxidoanthracene) not only in a suitable solvent, but also in a suitable solvent. a matrix of polyolefins. With elevated shade, 9,10-dinxyantracene radically decomposes, prlC & d formed radicals readily abstract the hydrogen of the methylene group, δία are formed on adjacent chains of methylene radicals · These can be caused by increased mobility ´?

caused by an increase in the ambient temperature by rtavzojom rakoubínavar and thus create an insoluble polyajer network. A disadvantage of this process is the development in the developer, which contains organic solvents.

SUMMARY OF THE INVENTION

The invention pad with negative-working sensitive layers for the photomechanical reproduction or sledding trays in © hoaickes girded _t consisting of a metal, preferably zinc · aluminum or magnesium substrate and a photosensitive layer · characterized and on said face side, the svetiocitlivá layer comprises 90-98 £ h and rt Phenolforaaldehyde; or substituted phenol form of the aldehyde resin; anthracene azc · oi to o · ha · ha · ng of the seabreaker · cross-linking in the aviation-sensitive layer is mediated by recorsion of adjacent chain radicals. An organic pigment can be added to the light-sensitive layer of the knife. The properties of the light-sensitive layer are improved by an acetate-based filamentant such as butyl or ethyl acetate. The advantage of said substrate having a negative light-sensitive layer is the solubility of the non-exposure layer in an alkaline developer free of organic solvents. The developing solution after development does not contain toxic components and can be immediately drained.

The light-sensitive substrate is prepared so that the substrate itself is completely cleaned of eleophilic impurities in a manner dependent on its type and dried and coated with a light-sensitive solution prepared by dissolving the phenolforsialdehyde element · anthracene Ô && **. If <? For example, the solvent is suitable to use ethylene glycol sequenate or derivatives thereof and the N, M-dihaophenyl phosphate layer is applied to the substrate by centrifugation, spraying, spraying by machine or hand coating. The light-sensitive layer is reached in the oven or drying tunnel for up to 30 minutes at 5 ° C to 80 ° C. The prepared pad $ <? the world is stable and it can be more than one year *

DETAILED DESCRIPTION OF THE INVENTION The &quot; C &quot;

• · a

Zinkova, r. Magnesium plate and degreased with Viennese lime, rinsed with water, 5 aqueous nitric acid solution and water again · Water is removed from the plate pneumatically · After drying for 5 minutes at 20 to 100 ° C and the plate layered on a centrifuge at 180 rpm Composition: 12 y phenolphthaldehyde resin (50% solution in 2-ethoxyatanol), 10 g saturated solution of ethylene blue-J in 2-cethoxyatanol as a singlet oenzibillizer, 7 g saturated solution of styrene blue in α / β-diethylfomaald ©, 4 g butyl acetate, c, 24 g anthracene as sensitizer · After centrifugation, the plate is dried for 20 and in at 70 ° C and exposed to a traditional mercury vapor lamp through an appropriate mask »developed in a developer of 0.295 g sodium hydroxide, 0.235 g water glass and 933.5 q water · After rinsing and drying with an air jet and the relief on the plate fires for 20 to 30 minutes at 10 ° C. This is followed by etching with conventional nitric acid adhesive emulsions.

The aluminum foil intended for the manufacture of the labels in a photomechanical manner, degreased and dried according to Example 1, is applied by centrifugation.

g of cresol-formaldehyde resin (50% solution in z-ethoxyethanol), 7 g of a saturated solution of acetone blue in 2-ethoxyethanol;

3— · * · - / y ítauyn * solution of Kutylenewj «äOuroj in N,» 4-dithutyl -

It is 4 g of butyl acetate, 3 g of saturated dye solution of the wind and in 2-oxoxyethanol <g Q. 24 g of anthracene coenzene a 1 f - X a -

MiÄ Λ U UVíTtS ·

The exposure, induction of vyp-burn is performed according to Example 1.

The aluminum offset plate is applied in a batch or centrifuged manner »a light-sensitive solution of the composition of Example 2 · Pre-exposure drying is carried out according to Example 2. The plate is developed to produce a composition with the composition: c ·, 36 g of cydro © and hydrophilic Atúx or other equivalent procedure and thus ready to print.

Take advantage!> WT

The negative light-lining mat is useful in the printing industry of the photoeehanic printing industry, for preparing negative-type printing plates, for printing on zinc or magnesium offset printing plates, for masking pads, in so-called &quot; chemical machining.

Claims (1)

le "Negative-working light-sensitive layer = out for technical reproduction"? or trays in neekevanfe cheraickora machining comprising a metal _much much preferably zinc, magnesium or aluminum and the substrate evetlocitlivej vi »t you, vyZňäaujúvn sew abusing the avétlcčitlivá layer was 90 Al. 93 $ wot. phenolForealdehyde, or a substituted phenol oleoldehyde resin, of from 2 to 10 .mu.l anthracene of from 0.01 to 0.5 g. s inuletcvéhí? seaztbllátcrs · Z. Pod of point 1, characterized in that the shining beam contains 0.05 to 1 µl of organic plguent, not the visibility of the record