SI2286000T1 - Postopek in sistem za izdelavo nanostruktur - Google Patents

Postopek in sistem za izdelavo nanostruktur

Info

Publication number
SI2286000T1
SI2286000T1 SI200931510A SI200931510A SI2286000T1 SI 2286000 T1 SI2286000 T1 SI 2286000T1 SI 200931510 A SI200931510 A SI 200931510A SI 200931510 A SI200931510 A SI 200931510A SI 2286000 T1 SI2286000 T1 SI 2286000T1
Authority
SI
Slovenia
Prior art keywords
manufacturing nanostructures
nanostructures
manufacturing
Prior art date
Application number
SI200931510A
Other languages
English (en)
Inventor
Massimo Tormen
Roberto Gotter
Mauro Prasciolu
Original Assignee
Consiglio Nazionale Delle Ricerche
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Consiglio Nazionale Delle Ricerche filed Critical Consiglio Nazionale Delle Ricerche
Publication of SI2286000T1 publication Critical patent/SI2286000T1/sl

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00031—Regular or irregular arrays of nanoscale structures, e.g. etch mask layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0156—Lithographic techniques
    • B81C2201/0159—Lithographic techniques not provided for in B81C2201/0157

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Composite Materials (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Electron Beam Exposure (AREA)
SI200931510A 2008-05-14 2009-05-14 Postopek in sistem za izdelavo nanostruktur SI2286000T1 (sl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IT000358A ITTO20080358A1 (it) 2008-05-14 2008-05-14 Procedimento e sistema per la fabbricazione di nanostrutture e nanodispositivi tramite proiezione di materiale in forma atomica o molecolare da sorgente sagomata attraverso un diaframma con aperture di dimensioni nanometriche
EP09746254.3A EP2286000B1 (en) 2008-05-14 2009-05-14 Method and system for manufacturing nanostructures
PCT/IB2009/051995 WO2009138960A1 (en) 2008-05-14 2009-05-14 Method and system for manufacturing nanostructures

Publications (1)

Publication Number Publication Date
SI2286000T1 true SI2286000T1 (sl) 2016-10-28

Family

ID=40303088

Family Applications (1)

Application Number Title Priority Date Filing Date
SI200931510A SI2286000T1 (sl) 2008-05-14 2009-05-14 Postopek in sistem za izdelavo nanostruktur

Country Status (5)

Country Link
US (1) US20110303634A1 (sl)
EP (1) EP2286000B1 (sl)
IT (1) ITTO20080358A1 (sl)
SI (1) SI2286000T1 (sl)
WO (1) WO2009138960A1 (sl)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130288078A1 (en) * 2012-04-30 2013-10-31 Seagate Technology Llc Thin Film with Reduced Stress Anisotropy
CN114524406A (zh) * 2021-12-23 2022-05-24 浙江大学 一种通过操纵衬底宏观移动轨迹实现纳米结构书写的方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3934057A (en) * 1973-12-19 1976-01-20 International Business Machines Corporation High sensitivity positive resist layers and mask formation process
US4278710A (en) * 1979-08-27 1981-07-14 The United States Of America As Represented By The Secretary Of The Navy Apparatus and method for submicron pattern generation
US4776868A (en) * 1985-09-09 1988-10-11 Corning Glass Works Lenses and lens arrays
US5948468A (en) * 1997-05-01 1999-09-07 Sandia Corporation Method for correcting imperfections on a surface

Also Published As

Publication number Publication date
WO2009138960A1 (en) 2009-11-19
US20110303634A1 (en) 2011-12-15
EP2286000A1 (en) 2011-02-23
EP2286000B1 (en) 2016-06-29
ITTO20080358A1 (it) 2009-11-15

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