SG81252A1 - A method to improve shallow trench isolation performance - Google Patents

A method to improve shallow trench isolation performance

Info

Publication number
SG81252A1
SG81252A1 SG9804975A SG1998004975A SG81252A1 SG 81252 A1 SG81252 A1 SG 81252A1 SG 9804975 A SG9804975 A SG 9804975A SG 1998004975 A SG1998004975 A SG 1998004975A SG 81252 A1 SG81252 A1 SG 81252A1
Authority
SG
Singapore
Prior art keywords
trench isolation
shallow trench
isolation performance
improve shallow
improve
Prior art date
Application number
SG9804975A
Inventor
Qing Hua Zhong
Qian Gang
Yu Bo
Mei Sheng Zhou
Original Assignee
Chartered Semiconductor Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chartered Semiconductor Mfg filed Critical Chartered Semiconductor Mfg
Publication of SG81252A1 publication Critical patent/SG81252A1/en

Links

SG9804975A 1998-09-10 1998-11-25 A method to improve shallow trench isolation performance SG81252A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15115798A 1998-09-10 1998-09-10

Publications (1)

Publication Number Publication Date
SG81252A1 true SG81252A1 (en) 2001-06-19

Family

ID=22537555

Family Applications (1)

Application Number Title Priority Date Filing Date
SG9804975A SG81252A1 (en) 1998-09-10 1998-11-25 A method to improve shallow trench isolation performance

Country Status (1)

Country Link
SG (1) SG81252A1 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5801083A (en) * 1997-10-20 1998-09-01 Chartered Semiconductor Manufacturing, Ltd. Use of polymer spacers for the fabrication of shallow trench isolation regions with rounded top corners
US5970363A (en) * 1997-12-18 1999-10-19 Advanced Micro Devices, Inc. Shallow trench isolation formation with improved trench edge oxide

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5801083A (en) * 1997-10-20 1998-09-01 Chartered Semiconductor Manufacturing, Ltd. Use of polymer spacers for the fabrication of shallow trench isolation regions with rounded top corners
US5970363A (en) * 1997-12-18 1999-10-19 Advanced Micro Devices, Inc. Shallow trench isolation formation with improved trench edge oxide

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