SG74662A1 - Electronic component method for making and target therefor - Google Patents

Electronic component method for making and target therefor

Info

Publication number
SG74662A1
SG74662A1 SG1998003714A SG1998003714A SG74662A1 SG 74662 A1 SG74662 A1 SG 74662A1 SG 1998003714 A SG1998003714 A SG 1998003714A SG 1998003714 A SG1998003714 A SG 1998003714A SG 74662 A1 SG74662 A1 SG 74662A1
Authority
SG
Singapore
Prior art keywords
making
electronic component
component method
target therefor
therefor
Prior art date
Application number
SG1998003714A
Inventor
Beth A Baumert
Chang Sli-Hsin
Tsai Tse-Lun
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Publication of SG74662A1 publication Critical patent/SG74662A1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76801Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Semiconductor Memories (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Inorganic Insulating Materials (AREA)
  • Ceramic Capacitors (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Non-Volatile Memory (AREA)
SG1998003714A 1997-09-30 1998-09-18 Electronic component method for making and target therefor SG74662A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US94142397A 1997-09-30 1997-09-30

Publications (1)

Publication Number Publication Date
SG74662A1 true SG74662A1 (en) 2000-08-22

Family

ID=25476442

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1998003714A SG74662A1 (en) 1997-09-30 1998-09-18 Electronic component method for making and target therefor

Country Status (4)

Country Link
JP (1) JPH11238412A (en)
KR (1) KR19990030185A (en)
CN (1) CN1213145A (en)
SG (1) SG74662A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100351450B1 (en) * 1999-12-30 2002-09-09 주식회사 하이닉스반도체 Non-volatile memory device and method for fabricating the same
KR20010066386A (en) * 1999-12-31 2001-07-11 박종섭 Method of forming gate electrode of Flash memory

Also Published As

Publication number Publication date
JPH11238412A (en) 1999-08-31
CN1213145A (en) 1999-04-07
KR19990030185A (en) 1999-04-26

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