SG32430A1 - Projection exposure method and projection exposure apparatus and mask therefor - Google Patents

Projection exposure method and projection exposure apparatus and mask therefor

Info

Publication number
SG32430A1
SG32430A1 SG1995000979A SG1995000979A SG32430A1 SG 32430 A1 SG32430 A1 SG 32430A1 SG 1995000979 A SG1995000979 A SG 1995000979A SG 1995000979 A SG1995000979 A SG 1995000979A SG 32430 A1 SG32430 A1 SG 32430A1
Authority
SG
Singapore
Prior art keywords
projection exposure
exposure apparatus
mask therefor
exposure method
therefor
Prior art date
Application number
SG1995000979A
Inventor
Ho-Young Kang
Cheol-Hong Kim
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1019940018943A external-priority patent/KR960005757A/en
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Priority to SG1995000979A priority Critical patent/SG32430A1/en
Publication of SG32430A1 publication Critical patent/SG32430A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
SG1995000979A 1994-07-30 1995-07-28 Projection exposure method and projection exposure apparatus and mask therefor SG32430A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SG1995000979A SG32430A1 (en) 1994-07-30 1995-07-28 Projection exposure method and projection exposure apparatus and mask therefor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1019940018943A KR960005757A (en) 1994-07-30 1994-07-30 Projection exposure method, projection exposure apparatus and mask used therein
SG1995000979A SG32430A1 (en) 1994-07-30 1995-07-28 Projection exposure method and projection exposure apparatus and mask therefor

Publications (1)

Publication Number Publication Date
SG32430A1 true SG32430A1 (en) 1996-08-13

Family

ID=26630520

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1995000979A SG32430A1 (en) 1994-07-30 1995-07-28 Projection exposure method and projection exposure apparatus and mask therefor

Country Status (1)

Country Link
SG (1) SG32430A1 (en)

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