SG187326A1 - Glass for substrate, and glass substrate - Google Patents
Glass for substrate, and glass substrate Download PDFInfo
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- SG187326A1 SG187326A1 SG2012049201A SG2012049201A SG187326A1 SG 187326 A1 SG187326 A1 SG 187326A1 SG 2012049201 A SG2012049201 A SG 2012049201A SG 2012049201 A SG2012049201 A SG 2012049201A SG 187326 A1 SG187326 A1 SG 187326A1
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- 239000011521 glass Substances 0.000 title claims abstract description 122
- 239000000758 substrate Substances 0.000 title claims abstract description 102
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 9
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 claims abstract description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 9
- 239000005341 toughened glass Substances 0.000 claims description 9
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 8
- 229910052744 lithium Inorganic materials 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 238000005496 tempering Methods 0.000 claims description 5
- 229910052700 potassium Inorganic materials 0.000 claims description 4
- 101100348017 Drosophila melanogaster Nazo gene Proteins 0.000 claims description 3
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 claims description 2
- 229910018516 Al—O Inorganic materials 0.000 claims 1
- 229910003087 TiOx Inorganic materials 0.000 claims 1
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 claims 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 abstract description 31
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 9
- 238000000280 densification Methods 0.000 abstract description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052681 coesite Inorganic materials 0.000 abstract description 3
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 3
- 229910052682 stishovite Inorganic materials 0.000 abstract description 3
- 229910052905 tridymite Inorganic materials 0.000 abstract description 3
- 230000007423 decrease Effects 0.000 description 18
- 238000006748 scratching Methods 0.000 description 18
- 230000002393 scratching effect Effects 0.000 description 18
- 238000002844 melting Methods 0.000 description 16
- 230000008018 melting Effects 0.000 description 16
- 238000000034 method Methods 0.000 description 13
- 238000005336 cracking Methods 0.000 description 11
- 239000002253 acid Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 230000009477 glass transition Effects 0.000 description 6
- 238000006124 Pilkington process Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000007791 liquid phase Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000011282 treatment Methods 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229910006715 Li—O Inorganic materials 0.000 description 3
- 238000003280 down draw process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000007500 overflow downdraw method Methods 0.000 description 3
- 230000003678 scratch resistant effect Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910020091 MgCa Inorganic materials 0.000 description 2
- 101100003996 Mus musculus Atrn gene Proteins 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000008395 clarifying agent Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 239000006249 magnetic particle Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000006060 molten glass Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000013074 reference sample Substances 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- -1 SQO3 Substances 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
Abstract
18To provide hardly breakable glass for a substrate, which is suitable for densification for a high recording density. Glass for a substrate, which comprises, as represented by mol% based on the following oxides, from 66 to 77% of 5i02, from 7 to 17% of Al203, from 0 to 7% of B203, from 0 to 9% of Li20, from 0 to 8% of Na20, from 0 to 3% of K20, from 0 to 13% of MgO, from 0 to 6% of CaO, from 0 to 5% of TiO2 and from 0 to 5% of Zr02, wherein the total of contents of Si02, Al203 and B203 i.e. Si02+Al203+B203 is from 81 to 92%, the total of contents of Li20, Na20 and K20 i.e. Li20+Na20+K20 is from 3 to 9%, the total of contents of MgO and CaO i.e. Mg0+Ca0 is from 4 to 13%, the total of contents of Na20, K20 and Ca0 i.e. Na20+K20+Ca0 is from 0 to 10%, and the total of contents of TiO2 and Zr02 i.e. Ti02+Zr02 is from 0 to 5%.
Description
y
The present invention relates to an information recording medium such as a magnetic disk (hard disk), a glass substrate to be used for such an information recording medium, and glass to be used for such a substrate.
' In recent years, along with an increase in the recording capacity of a hard disk drive, densification for a high recording density has been in progress at a high pace.
However, along with the densification for a high recording density, microfabrication of magnetic particles is likely to impair thermal stability, thus leading to a problem of cross talk or a decrease in the S/N ratio of a playback signal. Under the circumstance, attention has been drawn to a thermal assist magnetic recording technique as a combined technique of optics and magnetism. This is a technique wherein a magnetic recording layer is irradiated with a laser beam or near field light to lower the coercive force locally at the heated portion, and in such a state, an external magnetic field is applied for recording, and the recorded magnetization is retrieved by e.g. GMR element, whereby recording can be made on a high coercive force medium, and it becomes possible to microfabricate magnetic particles while maintaining the thermal stability. However, in order to form a high coercive force medium in the form of a multi-layered film, it is required to sufficiently heat the substrate, and a highly heat resistant substrate is desired.
Further, also for a perpendicular magnetic recording system, a magnetic recording layer different from a conventional one has been proposed in order to meet the requirement for densification for a high recording density, but for the formation of such a magnetic recording layer, the substrate is required to be heated at a high temperature, in many cases.
Whereas, a silicon substrate has been proposed as a substrate which is useful for the above mentioned thermal assist magnetic recording technique (Patent
Document 1).
A silicon substrate is usually weak in strength as compared with a glass substrate.
Accordingly, also in the production of a magnetic disk to form a magnetic recording layer by heating the substrate at a high temperature, it is preferred to use a glass substrate.
As a substrate for an information recording medium, particularly as a substrate for a magnetic disk, a glass substrate is widely used. For example, lithium-containing aluminosilicate glass having a high Young's modulus or one having chemical tempering treatment applied thereto (Patent Document 2), or crystallized glass having a crystal phase precipitated by heat-treating glass having a specific composition (Patent Documerit 3) is used.
PRIOR ART DOCUMENTS
PATENT DOCUMENTS
Patent Document 1: JP-A-2009-199633
Patent Document 2: JP-A-2001-180969
Patent Document 3: JP-A-2000-119042
Substrate glass for chemical tempering treatment has its heat resistance adjusted to be low so that chemical tempering treatment can efficiently be applied thereto, and accordingly, it is likely to collapse by the heat at the time of forming the above-mentioned high coercive force medium in the form of a multi-layered film.
Further, if a chemically tempered glass substrate is subjected to the above heating, the ion exchange-treated layer is likely to undergo diffusion by such heating, whereby the strength may deteriorate. Further, if it is attempted to use a crystallized glass substrate, the substrate surface is likely to get warped by the above heating due to the difference in the thermal expansion coefficient between the crystal phase and the bulk body.
If the rotational speed of a recording medium is increased, deflection is likely to form in the recording medium, and the resonance becomes large, whereby the surface of the recording medium is likely to collide with a magnetic head, thus leading io an error in reading or a danger of crushing of a magnetic head. Therefore, with a current recording medium, it is not possible to reduce the distance (flying height) between a magnetic head and a recording medium more than a certain level, which tends to be a factor to hinder an increase of a recording density of a magnetic recording layer.
Such a problem of the deflection and resonance of a recording medium can be solved by using a substrate material having a high elastic modulus.
In a case where glass is used as a substrate for a magnetic disk, many processing treatments are required including circular processing, coring, inner and outer circumference processing, etc. During such processing treatments, many scratches which can be starting points for fracture are likely to be formed at e.g. glass edges, and slight scratch marks formed not only in the production steps but also during mounting on a spindle or during other handlings, are likely to cause fracture of a substrate. This problem becomes more serious especially along with an increase in rotational speed of a magnetic disk. This problem may be solved by using glass for a substrate which is less susceptible to cracking.
It is an object of the present invention to provide scratch resistant glass for a substrate which has a high specific modulus and a high glass transition point, which is suitable to comprehensively meet such requirements.
The present invention provides glass for a substrate, which comprises, as represented by mol% based on the following oxides, from 66 to 77% of SiO,, from 7 to 17% of AlbOs5, from 0 to 7% of B,Os3, from 0 to 9% of Li;O, from 0 to 8% of Na,O, from 0 to 3% of K»0, from 0 to 13% of MgO, from 0 to 6% of CaO, from 0 to 5% of TiO; and from 0 to 5% of ZrO,, wherein the total of contents of SiO;, Al;O3 and B2Os i.e.
SiOx+AlLO3+B»03 is from 81 to 92%, the total of contents of Li,O, Na,O and K;O i.e.
Li2O+NaO+K;0 is from 3 to 9%, the total of contents of MgO and CaO i.e. MgO+CaO is from 4 to 13%, the total of contents of Na,O, K,O and CaO i.e. Na;O+K;0+CaO is from 0 to 10%, and the total of contents of TiO, and ZrO; i.e. TiO2+ZrO; is from 0 to 5% (hereinafter referred to as the glass of the present invention). Here, for example “from 0 to 7% of B>O3" means that B,O3 is not essential but may be contained up to 7%.
Further, the present invention provides the above glass for a substrate, wherein the ratio of the B;O3 content to the Al;O3 content i.e. B2O3f AlzO3 is at most 0.6.
Further, the present invention provides the above glass for a substrate, wherein the ratio of Na,O+K,0+Ca0 to SiO.+AILO02+B,0; i.e. (Na, O+K,0+CaO)/(SiOy+Al0s+B,03) is at most 0.125.
Further, the present invention provides the above glass for a substrate, wherein
SiO; is at most 74%, AlzOs is at least 8%, Li;0 is less than 2%, MgO is at most 11%,
TiO; is at most 3%, ZrO; is at most 3%, Li; 0+NaO+K;0 is at least 3.5%, MgO+CaO is from 5 to 12.5%, TiOz+ZrO; is at most 3.5%, and (MgO+CaO)/(SiOz+Al,03+B,03) is at most 0.15.
Further, the present invention provides the above glass for a substrate, which contains Li>O or NayO.
Further, the present invention provides the above glass for a substrate, wherein
B.O3 is at most 3%, Li-O is at least 2%, NayO is at most 4%, and Li; O+Na,O+K,0 is at least 3.5%.
Further, the present invention provides the above glass for a substrate, wherein (MgO+CaO)/(SiO2+Aia03+B,03) is from 0.04 to 0.186.
Further, the present invention provides the above glass for a substrate, wherein the total of contents of the above 10 components is at least 98%.
Further, the present invention provides a glass substrate made of the above glass for a substrate.
Further, the present invention provides the above glass substrate, which is used as a substrate for an information recording medium.
Further, the present invention provides the above glass substrate, wherein the substrate for an information recording medium is a substrate for a magnetic disk.
Further, the present invention provides a chemically tempered glass substrate obtained by chemically tempering a glass plate made of the above glass for a substrate.
Further, the present invention provides the above chemically tempered glass substrate, which is used as a substrate for an information recording medium.
Further, the present invention provides the above chemically tempered glass substrate, wherein the substrate for an information recording medium is a substrate for a magnetic disk.
Further, the present invention provides a magnetic disk having a magnetic recording layer formed on the above glass substrate or on the above chemically tempered glass substrate. 5 ADVANTAGEOUS EFFECTS OF INVENTION
It is possible to obtain glass for a substrate having a high glass transition point, which may be used for e.g. an information recording medium. It is thereby possible to increase the heat treatment temperature to be carried out after forming a magnetic film on a substrate and to obtain an information recording medium having a high recording density. !
Further, it is possible to obtain glass for a substrate having a high specific modulus, which may be used for e.g. an information recording medium. It is thereby possible to prevent warpage or deflection during rotational driving and to obtain an information recording medium having a high recording density.
Further, it is possible to obtain scratch resistant glass for a substrate, which may be used for e.g. an information recording medium. It is thereby possible to prevent scratching in production steps, during mounting on a spindle or during other handlings, or to prevent cracking of a substrate.
Further, at the time of mounting a substrate, a spindle made of metal is fixed by a member made of metal, and therefore, if the difference in thermal expansion coefficient is large between the substrate and such metal spindle or metal member, a stress may be formed at the time of a temperature change, whereby cracking of the substrate may occur. Usually, the thermal expansion coefficient of glass is small as compared with the thermal expansion coefficient of metal, and at the time of using glass as a substrate, it is preferred to use glass for a substrate, which has a thermal expansion coefficient as large as possible thereby to increase matching of the thermal expansion with a metal spindle and other metal drive members.
According to the present invention, it is possible to obtain glass for a substrate having a large average linear expansion coefficient, which may be used for e.g. an information recording medium. tis thereby possible that the thermal expansion matching with other metal drive members becomes high, and the stress formed at the time of a temperature change becomes small, whereby e.g. cracking of the substrate will be less likely to occur.
Now, the glass of the present invention will be described with reference to a case where it is used as a substrate for a magnetic disk, but it should be understood that the present invention is by no means limited thereto.
The glass of the present invention preferably has a specific modulus E/d of at least 32 MNm/kg. If E/d is less than 32 MNm/kg, warpage or deflection is likely to occur during rotational driving, whereby it tends to be difficult to obtain an information recoding medium having a high recording density. Typically, E/d is at most 40
MNm/kg. Here, E is a Young's modulus (unit: GPa), and d is a density (unit: g/cm®).
The glass of the present invention preferably has a glass transition point Tg of at least 890°C. [fit is less than 630°C, the substrate tends to be deformed by a heat, and it becomes difficult to sufficiently increase the thermal treatment temperature for forming a magnetic layer, whereby it tends to be difficult to increase the coercive force of the magnetic layer. It is more preferably at least 700°C.
The average linear expansion coefficient a of the glass of the present invention at from -50 to 70°C is typically from 20x107/°C to 45x107/°C. For example, in a case where it is desired to reduce the difference in the thermal expansion coefficient from another member such as a metal drive thereby to prevent cracking of the substrate due to formation of a stress at the time of a temperature change, a is preferably at least 32x107/°C, more preferably at least 34x107/°C.
The cracking probability P of the glass of the present invention is preferably less than 80%. If itis 80% or higher, scratching is likely to occur in production steps, or during mounting on a spindle or during other handlings, whereby cracking of the substrate is likely fo occur. If is more preferably at most 70%.
Now, the composition of the glass of the present invention will be described, as represented by mol%.
SiO; is a component to form the skeleton of the glass and is essential. [fit is less than 66%, the acid resistance will decrease, d will increase, the glass tends to be susceptible to scratching, Tg will decrease, or the liquid phase temperature will increase, whereby the glass becomes unstable. | is preferably at least 67%, more preferably at least 68%. If it exceeds 77%, the temperature T; at which the viscosity becomes 10% dPa's and the temperature T,4 at which the viscosity becomes 10% dPa's will increase, whereby melting and forming of the glass tend to be difficult, E or E/d will decrease, or a becomes small. It is preferably at most 74%, more preferably at most 72%, particularly preferably at most 70%.
AloO3 has an effect to increase the weather resistance and is essential. [fits less than 7%, such an effect will be small, or E or E/d or Tg will decrease. tis preferably at least 8%, more preferably at least 10%. If it exceeds 17%, the above- mentioned Tz and T4 will increase, whereby melting and forming of the glass tend to be difficult, the acid resistance will decrease, a becomes small, or the liquid phase temperature tends to be {oo high. [tis preferably at most 16%, more preferably at most 15%, further preferably at most 14%.
B,O3 is not essential but may be contained up to 7%, since it has an effect to make the glass scratch-resistant or to improve the melting property of the glass. Ifit exceeds 7%, E or E/d or Tg will decrease, or it becomes very volatile in coexistence with an alkali metal oxide component. It is preferably at most 6.5%. In a case where it is desired to increase Tg or to suppress the volatility, B,Oj3 is preferably at most 4%, more preferably at most 2%, and more preferably, BoO3 is not contained.
If the total] of contents of SiO, A203 and B205 i.e. Si0Ox+Al03+B20; is less than 81%, the glass tends to be susceptible to scratching. If it exceeds 92%, the above T; and T,4 will increase, or melting or molding of the glass tends to be difficult. tis preferably at most 90%, more preferably at most 88%. In a case where it is desired to increase the melling property or moldability of the glass, the above total is preferably at most 86%.
The ratio of the B2O3 content to the Al,O3 content i.e. BoO3/Al,O3 is preferably at most 0.6. If it exceeds 0.6, E or E/d may decrease. It is more preferably at most 0.5, further preferably at most 0.4, particularly preferably at most 0.3, most preferably at most 0.2.
Li-O is not essential but may be contained up to 9%, since it increases E, E/d or q, orto improve the melting property of the glass. If it exceeds 9%, the acid resistance or weather resistance will decrease, Tg will be low, or the glass tends to be susceptible to scratching. It is preferably at most 7%. In a case where it is desired to increase E or E/d, Li:O is preferably at most 3%, more preferably less than 2%, further preferably at most 1%, and particularly preferably, Li;O is not contained.
Nay0 is not essential but may be contained up to 8%, since it has an effect to increase a or to improve the melting property of the glass. If it exceeds 8%, the acid resistance or weather resistance will decrease, Tg will be low, or the glass tends to be susceptible to scratching. It is preferably at most 7.5%. Further, when NaO is contained, its content is preferably at least 1%. In a case where it is desired to increase a, NayO is preferably at least 3%, more preferably at least 4%, further preferably at least 5%, particularly preferably at least 6%.
Kz20 is not essential but may be contained up to 3%, since it has an effect to increase a or to improve the melting property of the glass. If it exceeds 3%, the acid resistance or weather resistance will decrease, Tg tends to be low, or the glass tends to be susceptible to scratching. It is preferably at most 2%, more preferably at most 1%, and further preferably, K;O is not contained.
If the total R»0 of contents of Li-O, Na,O and K;O is less than 3%, a becomes small, or the melting property of the glass decreases. tis preferably at least 3.5%, more preferably at least 4%, further preferably at least 4.5%, particularly preferably at least 5%. If R,O exceeds 9%, the acid resistance or weather resistance will decrease,
Tg tends to be low, or the glass tends to be susceptible to scratching. It is preferably at most 8.5%, more preferably at most 8%, further preferably at most 7.5%.
MgO is not essential but may be contained up to 13%, since it will increase E,
E/d or a, or will improve the melting property of the glass. If it exceeds 13%, Tg tends to be low, the glass tends to be susceptible to scratching, or the liquid phase temperature tends to be too high. It is preferably at most 12%, more preferably at most 11%, further preferably at most 10.5%, particularly preferably at most 10%.
When MgO is contained, its content is preferably at least 4%. In a case where it is desired to increase E or E/d, MgO is preferably at least 5%, more preferably at least 6%, further preferably at least 7%, particularly preferably at least 8%.
CaO is not essential but may be contained up to 6% since it increases a or improves the melting property of the glass. If it exceeds 6%, Tg tends to be low, the glass tends to be susceptible to scratching, or the liquid phase temperature tends to be too high. It is preferably at most 5%, more preferably at most 3%, further preferably at most 2%, particularly preferably at most 1%.
If the total of contents of MgO and CaO i.e. MgO+CaO is less than 4%, a becomes small, or the melting property of the glass will decrease. It is preferably at least 5%, more preferably at least 6%, further preferably at least 7%, particularly preferably at least 8%, most preferably at least 9%. If the above total exceeds 13%, the acid resistance or weather resistance will decrease, Tg tends to be low, or the glass tends to be susceptible to scratching. tis preferably at most 12.5, more preferably at most 12%, particularly preferably at omost 11.5%, most preferably at most 11%.
The ratio of MgO+CaO fo SiOz+Al,03+B203 i.e. (MgO+Ca0)/(SiOz+Al,03+B203) is preferably at most 0.16. If it exceeds 0.16, the acid resistance or weather resistance will decrease, Tg becomes low, or the glass tends to be susceptible to scratching. It is more preferably at most 0.15%, further preferably at most 0.14%.
If the total of contents of Na,O, KO and CaQ i.e. Na;O+K,0+CaO exceeds 10%, the acid resistance or weather resistance will decrease, Tg tends to be low, or the glass tends to be susceptible to scratching. It is preferably at most 9%. For example, in a case where it is desired to increase a, Na;O+K;0+CaO is preferably at least 2%, more preferably at least 5%, further preferably at least 7%, particularly preferably at least 8%.
The ratio of Na; O+K,0+CaO to SiO+Al,03+B>05 i.e. (NazO+K;0+CaO)/( SiOz +AlLO3+B,03) is preferably at least 0.125. If it exceeds 0.125, the acid resistance or weather resistance will decrease, Tg tends to be low, or the glass tends to be susceptible to scratching. It is more preferably at most 0.124, further preferably at most 0.123, particularly preferably at most 0.122, most preferably atmost 0.121.
TiOz is not essential but may be contained up to 5%, since it has an effect to increase E or E/d while maintaining the weather resistance, to increase Tg, or to improve the melting property of the glass. If it exceeds 5%, d will increase, a becomes small, the glass tends to be susceptible to scratching, or a phase separation is likely to occur. It is more preferably at most 3%, further preferably at most 2%, particularly preferably at most 1%, and more preferably TiO; is not contained.
ZrO» is not essential but may be contained up to 5%, since it has an effect to increase E or E/d while maintaining the weather resistance, to increase Tg, or fo improve the melting property of the glass. If it exceeds 5%, d becomes large, a becomes small, the glass tends to be susceptibie to scratching, and the liquid phase temperature is likely to be too high. [i is more preferably at most 3%, further preferably at most 2%, particularly preferably at most 1%, and most preferably, ZrO; is not contained.
The total of contents of TiO; and ZrO; is 5% at the maximum and is typically at most 3.5%. If it exceeds 5%, d will increase, a becomes small, or the glass tends to be more susceptible to scratching. It is more preferably at most 3%, further preferably at most 2%, particularly preferably at most 1%, and most preferably, neither TiOz nor
ZrO; may be contained.
The glass of the present invention consists essentially of the above components, but it may contain other components within a range not to impair the purpose of the present invention i.e. in a total within a range of less than 3%, preferably less than 2%, typically less than 1%.
SrO or BaO may increase d or may make the glass susceptible to scratching but may sometimes have an effect to increase a while maintaining the weather resistance or to improve the melting property of the glass. Their content in such a case is preferably at most 2% in total. The total is more preferably at most 1.5%, further preferably at most 1%, and typically SrO and BaO are not contained.
Further, clarifying agents such as SQO3, Cl, Asp03, Sby03, Sn0Oy, etc. may be contained up to 2% in total. Further, coloring agents such as Fe,03, C0304, NiO, etc. may be contained up to 2% in total.
A glass substrate for an information recording medium made of the glass of the present invention is usually a circular glass plate.
The glass substrate for a magnetic disk is widely used for e.g. a 2.5 inch substrate (outer diameter of the glass substrate: 65 mm) to be used for e.g. a notebook personal computer, or for a 1.8 inch substrate (outer diameter of the glass substrate: 48 mm) to be used for e.g. a portable MP3 player, and its market is expanding every year. On the other hand, its supply at a low price is desired. Glass to be used for such a glass substrate is preferably one suitable for mass production.
Mass production of plate glass is widely carried out by a continuous-forming method such as a float process, a fusion method or a downdraw method, and as mentioned above, the glass of the present invention is glass which can be formed by a float process, and thus, it is suitable for mass production.
The process for producing the glass and the glass substrate of the present invention is not particularly limited, and various processes may be used. For example, materials for the respective components commonly used are blended to have a desired composition, and such a mixture is heated and melted in a glass melting furnace.
Then, the glass is homogenized by e.g. bubbling, stirring or addition of a clarifying agent, followed by forming into a plate glass having a predetermined thickness by a well-known method such as a float process, a press method, a fusion method or a downdraw method, and then, after annealing, processing such as grinding or polishing is carried out as the case requires, to obtain a glass plate having a prescribed size and shape. As the forming method, a float process suitable for mass production is particularly preferred. Otherwise, a continuous forming method other than the float process, i.e. a fusion method or a downdraw method is also suitable.
Materials of the respective components were blended to obtain compositions as shown by mol% in the rows for from SiO; to ZrO, in Examples 1 to 8 in Table 1 and in
Examples 28 and 28 in Table 3 and melted at a temperature of from 1,550 to 1,600°C for from 3 to 5 hours using a platinum crucible to prepare glass. In the melting, a platinum stirrer was inserted in the molten glass, and the glass was stirred for 2 hours and homogenized. Then, the molten glass was cast to form a plate and annealed to room temperature at a cooling rate of 1°C/min, and then, processed into a glass plate having a desired thickness. In the Tables, Si+Al+B represents the total (unit: mol%) of contents of SiO;, Al,O3 and B203;, B/AIl represents the ratio of the BOs content to the
AlzO3 content, R,O represents the total (unit: mol%) of contents of Li;O, NazO and KO,
Mg+Ca represents the total (unit: mel%) of contents of MgO and CaO, MgCa/SiAIB represents (MgO+CaO)/(SiOx+Al05+B203), Na+K+Ca represents the total (unit: mol%) of contents of NagO, K2O and CaO, NaKCa/SiAIB represents (Na,O+K,0+Ca0)/(Si0,+Al,03+B,03), and Ti+Zr represents the total (unit: mol%) of contents of TiO; and ZrO».
With respect to each glass plate thus obtained, the density d (unit: g/em?), the above-mentioned average linear expansion coefficient a (unit: x107/°C), the Young's modulus E (unit: GPa), the specific modulus E/d (unit: MNm/kg), the glass transition point Tg (unit: °C) and the cracking probability P (unit: %) were measured by the following methods. The results are shown in the Tables. d: Measured by an Archimedes method using from 20 to 50 g of glass free from bubbles. a: By means of a differential thermal dilatometer and using quartz glass as a reference sample, the rate of elongation of glass when it was heated at a rate of 5°C/min from room temperature to a temperature at which the glass was softened and elongation was no longer observed, i.e. to an yield point, was measured, and from the obtained thermal expansion curve, an average linear expansion coefficient within a range of -50 to 70°C was calculaied.
E. With respect to a glass plate having a thickness of from 5 to 10 mm and a size of 3 cm square, the measurement was carried out by an ulirasonic pulse method.
Tg: By means of a differential thermal dilatometer and using quartz glass as a reference sample, the rate of elongation of glass when it was heated at a rate of 5°C/min from room temperature to its yield point, and the temperature corresponding to the critical point in the obtained thermal expansion curve was taken as the glass transition point.
P. Both surfaces of a glass plate having a thickness of from 1 to 2 mm and a size of 4 cm x 4 cm, were mirror-polished with colloidal silica, to obtain a sample, and by using such a sample, the cracking probability was measured. In an atmosphere of the dew point -28°C to -27°C, by adjusting the load of a Vickers hardness tester to be 2 kgf= 19.6 N, 15 points Vickers indenters were driven in, whereupon the number of cracks formed at four corners of indentations was measured. The number of such cracks was divided by the possible number of cracks being 60 {o obtain the cracking probability (unit: %). Here, the precision in measurement of P is about £10%.
Examples 1 to 27 in Tables 1 to 3 are working Examples of the present invention, and Examples 28 and 29 are Comparative Examples. From these results, it is evident that glasses in Examples have high specific modulus as compared with the giass in
Example 28 and have high cracking resistance as compared with the glass in Example
29, while having high glass transition points.
TABLE 1
Ex. [1 [2 [3 |4 [5 [6 _|7 |8 |9 |10
SiO, [67.0 [685 [685 |685 [66.0 [66.0 |685 |68.5 |74.0 |66.0 [BOs 40 Jo J20 [20 [61 [61 Jo Jo Jo [50
L,O Jo Jo [40 [33 [33 [42 [62 [0 Jo Jo
Na,O [50 72 [52 [12 [12 [12 [10 [10 [60 [6.0
KO ~~ [oo Jo Jo Jo Jo Jo Jo Jo Jo Jo
MgO [65 99 [79 [79 [51 [51 [7.7 |77 [50 [60 (CaO [50 [10 [10 [10 |46 [16 [52 [12 [20 [0
Tio, Jo Jo Jo Jo Jo fo Jo Jo Jo Jo 20, [05 {05 J05 [05 [25 [25 |o0o5 |05 [0 |O
B/AL__ 033 Jo |013 [0.13 [054 [043 [0 |O 0 [0.29
RO [50 [72 [52 [52 [45 |45 [52 |72 |60 [60
Mg+Ca [115 [109 [89 [89 [97 [67 [129 |89 [70 [60
Na+K+Ca [100 [82 [62 [22 |58 [28 |62 [22 (80 [60
Ti+zr 105 [05 [05 [05 [25 [25 [05 [05 [0 [0 d [243 [247 [245 |245 [247 [246 [248 [246 [241 [240 la [343 [420 [327 [228 [285 [236 [27.7 [242 [355 [33.0
E [783 [820 [834 [884 [828 [850 [89.6 |90.9 [81.3 [79.9 (ip [e7 [53 [47 [33 [53 [47 [65 [40 [6 [56
TABLE 2
SiO, [70.0 [74.0 [70.0 [71.0 [72.0 |69.0 [69.0 [71.0 [71.0 |66.0
ALO; [17.0 [80 [11.0 [150 |105 |140 |11.0 [120 |115 [17.0
BO, [50 [20 Jo [0 [15 [20 [30 [0 Jo Jo
L,lO [0 Jo fo jo Jo [20 [00 Jo [0 [90
NaO ~~ [60 [30 [60 [80 [35 [0 [60 [60 [6.0 [0
KO [10 [10 [10 [10 [0 [30 Jo Jo jo Jo
MgO ~~ Jo |70 [11.0 [50 [65 [10.0 [7.0 [7.0 [70 [80 [CaO Jo [50 Jo Jo [60 [0 [10 [10 [1.0 JO (Tio, Jo Jo Jo Jo Jo Jo |o [30 [20 |O 1 Zf0, [10 Jo |10 Jo Jo fo [30 Jo [15 [0
B/AL_ |029 |025 [0.00 [0.00 [0.14 |0.14 [027 {0 [0 |O 'R,O [70 |40 [70 [9.0 [35 [50 {6.0 [6.0 [60 [90 (Mg+Ca __ |0 [12.0 [110 [50 [125 [10.0 [80 [80 [80 [B80
MgCa/SIAB_ 0 [014 [014 [0.06 [0.15 [0.12 [0.10 [0.10 [0.10 [0.10
Nat+K+Ca [7.0 [9.0 [70 [90 [95 [30 [70 [70 [70 [0
NaKCa/SiAIB | 0.076 | 0.107 | 0.086 [0.105 [0.113 | 0.035 [0.084 | 0.084 | 0.085 [0
Ti+zr [1.0 Jo {10 Jo Jo [o [30 [30 [35 [0 ___ 'd 1239 [241 [246 [242 [243 [241 [249 [246 [249 |243 la 1337 [352 [41.6 [452 [325 [307 [352 [364 [356 [206
E767 [796 |84.0 [802 [816 [832 [832 [837 [847 [90.6 p45 Jo [31 [50 [27 [49 {35 [44 [45 [53
TABLE 3 [Si0, [700 [77.0 [73.0 [73.0 [720 [69.0 [73.0 [66.0 [685
BO; [30 Jo Jo fo Jo Jo Jo [78 [0 [LkblO 150 [30 [20 [40 [50 [40 [40 [0 [0 [Na,O [0 Jo 40 [o Jo Jo Jo Jo [52 [Ko ~~ [10 fo Jo Jo Jo [30 Jo fo [oOo
MgO [40 [130 [100 [00 [80 [100 [70 [51 [77
Ca0 lo Jo Jo [60 [0 |o 0 [46 [52 so Jo fo Jo Jo Jo Jo Jo 52 Jo
BaO Jo Jo fo Jo Jo fo fo Jo1 fo
Tio, [oo jo Jo fo Jo [50 Jo [0 zi0, Jo fo Jo Jo [50 jo Jo [0 [05
Si+tAl+B [900 [840 [840 [900 [82.0 [83.0 [840 [850 [815
B/AI 018 [0 Jo [0 Jo Jo JO : [070 [0 [RO [60 [30 [60 [40 [50 [70 [40 [0 [52Mg+Ca [40 [130 [100 f6.0 [80 [100 [70 [97 [129MgCa/SiAB [0.04 [0.15 [042 [007 [0.10 [0.12 [008 [011 [0.16
Na+K+Ca {10 [0 [40 [60 [0 [30 lo [98 [103
NaKCa/SiAIB [0.011 [0 [0.048 [0.067 [0 [0.036 [0 [0.116 | 0.126
Ti#ze [0 [0 Jo fo [50 [0 [50 Jo [05 ld [238 [240 [242 [241 [255 [243 [245 [25 [244 la 1235 [225 [332 [212 [20.7 1349 [207 [30.1 [405
Pp [21 fo Jo feo [1 [58 [1 [eo [92
The present invention is applicable fo an information recording medium such as a magnetic disk and to the production of a glass substrate to be used for e.g. an information recording medium.
The entire disclosure of Japanese Patent Application No. 2011-166934 filed on
July 28, 2011 including specification, claims and summary is incorporated herein by reference in its entirety.
Claims (15)
1. Glass for a substrate, which comprises, as represented by moi% based on the following oxides, from 66 to 77% of SiOg, from 7 to 17% of Al;O3, from 0 to 7% of B20, from 0 to 9% of Li,O, from 0 to 8% of NayO, from 0 to 3% of K,0, from 0 to 13% of MgO, from 0 to 6% of CaO, from 0 to 5% of TiO; and from 0 to 5% of ZrO, wherein the total of contents of SiO;, Al;O3 and B20; i.e. SiO+Al03+B,0; is from 81 to 92%, the total of contents of Li2O, Na>O and K,O i.e. Li;O+Na,O+K,0 is from 3 to 9%, the total of contents of MgO and CaO i.e. MgO+CaO is from 4 to 13%, the total of contents of Na;0, K20 and Ca0 i.e. Na,O+K,0+Ca0 is from 0 to 10%, and the total of contents of TiO, and ZrO; i.e. TiOx+Zr0; is from 0 to 5%.
2. The giass for a substrate according to Claim 1, wherein the ratio of the B;O3 content to the Al;O3 content i.e. BoO4/Al-O;5 is at most 0.6.
3. The glass for a substrate according to Claim 1 or 2, wherein the ratio of NazO+K;0+Ca0 to SiO+Al,03+B,03 i.e. (NapyO+K;0+Ca0)/(Si0x+Al,O3+B,03) is at most 0.125.
4. The glass for a substrate according to Claim 1, 2 or 3, wherein SiO; is at most 74%, Al,O3 is at least 8%, LioO is less than 2%, MgO is at most 11%, TiO; is at most 3%, ZrO; is at most 3%, Li;O+Na,O+K;0 is at least 3.5%, MgO+CaO is from 5 to 12.5%, TiO2+Zr0Q; is at most 3.5%, and (MgO+CaQ)/(SiO,+Al,03+B203) is at most 0.15.
5. The glass for a substrate according to Claim 1, 2, 3 or 4, which contains Li;O or Na,O.
6. The glass for a substrate according to Claim 1, 2, 3 or 4, wherein B,0;3 is at most 3%, LioO is at least 2%, NaxO is at most 4%, and LioO+Na,O+K,0 is at least 3.5%.
7. The glass for a substrate according to Claim 6, wherein (MgO+CaO)/(SiOz+Al;03+B,03) is from 0.04 ta 0.16.
8. The glass for a substrate according to any one of Claims 1 to 7, wherein the total of contents of the above 10 components is at least 98%.
9. Aglass substrate made of the glass for a substrate as defined in any one of Claims 1 to 8.
10. The glass substrate according to Claim 9, which is used as a substrate for an information recording medium.
11. The glass substrate according to Claim 10, wherein the substrate for an information recording medium is a substrate for a magnetic disk.
12. A chemically tempered glass substrate obtained by chemically tempering a glass plate made of the glass for a substrate as defined in any one of Claims 1 to 8.
13. The chemically tempered glass substrate according to Claim 12, which is used as a substrate for an information recording medium.
14. The chemically tempered glass substrate according to Claim 13, wherein the substrate for an information recording medium is a substrate for a magnetic disk.
15. A magnetic disk having a magnetic recording layer formed on the glass substrate as defined in Claim 11 or on the chemically tempered glass substrate as defined in ! 10 Claim 14.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011166934A JP5737043B2 (en) | 2011-07-29 | 2011-07-29 | Substrate glass and glass substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG187326A1 true SG187326A1 (en) | 2013-02-28 |
Family
ID=47570551
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201401901WA SG10201401901WA (en) | 2011-07-29 | 2012-07-03 | Glass for substrate, and glass substrate |
| SG2012049201A SG187326A1 (en) | 2011-07-29 | 2012-07-03 | Glass for substrate, and glass substrate |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
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| SG10201401901WA SG10201401901WA (en) | 2011-07-29 | 2012-07-03 | Glass for substrate, and glass substrate |
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| Country | Link |
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| JP (1) | JP5737043B2 (en) |
| CN (1) | CN102898022A (en) |
| MY (2) | MY162039A (en) |
| SG (2) | SG10201401901WA (en) |
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- 2012-07-03 SG SG2012049201A patent/SG187326A1/en unknown
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Also Published As
| Publication number | Publication date |
|---|---|
| SG10201401901WA (en) | 2014-07-30 |
| JP2013028512A (en) | 2013-02-07 |
| MY161708A (en) | 2017-05-15 |
| CN102898022A (en) | 2013-01-30 |
| JP5737043B2 (en) | 2015-06-17 |
| MY162039A (en) | 2017-05-31 |
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