SG152197A1 - Cleaning apparatus and immersion lithographic apparatus - Google Patents

Cleaning apparatus and immersion lithographic apparatus

Info

Publication number
SG152197A1
SG152197A1 SG200807999-8A SG2008079998A SG152197A1 SG 152197 A1 SG152197 A1 SG 152197A1 SG 2008079998 A SG2008079998 A SG 2008079998A SG 152197 A1 SG152197 A1 SG 152197A1
Authority
SG
Singapore
Prior art keywords
cleaning
immersion lithographic
substrate
lithographic apparatus
disclosed
Prior art date
Application number
SG200807999-8A
Inventor
Jong Anthonius Martinus Cornelis Petrus De
Jansen Hans
Martinus Hendrikus Antonius Leenders
Blom Paul
Ronald Harm Gunther Kramer
Van Putten Michel
De Graaf Ariel
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG152197A1 publication Critical patent/SG152197A1/en

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

A cleaning apparatus for cleaning a substrate or component of an immersion lithographic apparatus is disclosed. The cleaning apparatus comprise may comprise a plasma radical source, a conduit and a radical confinement system. The plasma radical source may provide a flow of radicals. The conduit may supply radicals from the plasma radical source to the surface to be cleaned. The radical confinement system may direct the radicals to clean a localized portion of said surface. The cleaning apparatus may comprise a rotator and may be configured to clean a substrate edge. An immersion lithographic apparatus comprising the apparatus for cleaning one or more surfaces is also disclosed. The immersion lithographic apparatus may comprise a substrate table for supporting a substrate and a fluid confinement structure for confining immersion fluid between a projection system and substrate table and/or substrate. An immersion lithographic apparatus is disclosed. [Fig. 7]
SG200807999-8A 2007-10-31 2008-10-28 Cleaning apparatus and immersion lithographic apparatus SG152197A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US105007P 2007-10-31 2007-10-31

Publications (1)

Publication Number Publication Date
SG152197A1 true SG152197A1 (en) 2009-05-29

Family

ID=40677407

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200807999-8A SG152197A1 (en) 2007-10-31 2008-10-28 Cleaning apparatus and immersion lithographic apparatus

Country Status (2)

Country Link
CN (1) CN101458459B (en)
SG (1) SG152197A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013004942A (en) * 2011-06-22 2013-01-07 Renesas Electronics Corp Semiconductor device manufacturing method
US10692724B2 (en) * 2016-12-23 2020-06-23 Lam Research Corporation Atomic layer etching methods and apparatus

Also Published As

Publication number Publication date
CN101458459A (en) 2009-06-17
CN101458459B (en) 2012-02-29

Similar Documents

Publication Publication Date Title
SG128452A1 (en) Lithographic apparatus and device manufacturing method
MY159175A (en) Method and apparatus for cleaning a substrate using non-newtonian fluids
TW200707119A (en) Lithographic apparatus and cleaning method therefor
MY142184A (en) Method and apparatus for transporting a substrate using non-newtonian fluid
GEP20115335B (en) Methods of treating surfaces with ionic organosilicon compositions
SG157342A1 (en) Lithographic apparatus and a method of operating the apparatus
GB2449581B (en) Surface cleaning apparatus with cleaning fluid supply
TW200609686A (en) Lithographic apparatus and device manufacturing method
TW200622514A (en) Lithographic apparatus and device manufacturing method
MY140300A (en) Enhanced wafer cleaning method
TW200604755A (en) Lithographic apparatus and device manufacturing method
WO2008002134A3 (en) Arrangement for cleaning a surface in a lithographic apparatus
TW200631915A (en) Apparatus of cleaning glass substrate and method of cleaning glass substrate
MY143763A (en) Method and system for using a two-phases substrate cleaning compound
MX2009002729A (en) Cleaning body and cleaning tool.
TW200743145A (en) Semiconductor apparatus and clean unit thereof
EP1926126A3 (en) Substrate processing apparatus and substrate processing method
MY144394A (en) Apparatuses and methods for cleaning a substrate
WO2007120276A3 (en) An apparatus and a method for cleaning a dielectric film
TW200737320A (en) Apparatus and methods for treating substrates
DE69842170D1 (en) PERFLUOROBUTYL METHYL ETHER COMPOSITIONS AND THEIR USE
SG132651A1 (en) System and method to increase surface tension and contact angle in immersion lithography
WO2009144073A3 (en) Cleaning device and method for cleaning a work piece
TW200725788A (en) Method and apparatus to support a cleanspace fabricator
WO2007020590A3 (en) Apparatus and method for cleaning an electric hair-cutting device, and kit including such an apparatus