SG152197A1 - Cleaning apparatus and immersion lithographic apparatus - Google Patents
Cleaning apparatus and immersion lithographic apparatusInfo
- Publication number
- SG152197A1 SG152197A1 SG200807999-8A SG2008079998A SG152197A1 SG 152197 A1 SG152197 A1 SG 152197A1 SG 2008079998 A SG2008079998 A SG 2008079998A SG 152197 A1 SG152197 A1 SG 152197A1
- Authority
- SG
- Singapore
- Prior art keywords
- cleaning
- immersion lithographic
- substrate
- lithographic apparatus
- disclosed
- Prior art date
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
A cleaning apparatus for cleaning a substrate or component of an immersion lithographic apparatus is disclosed. The cleaning apparatus comprise may comprise a plasma radical source, a conduit and a radical confinement system. The plasma radical source may provide a flow of radicals. The conduit may supply radicals from the plasma radical source to the surface to be cleaned. The radical confinement system may direct the radicals to clean a localized portion of said surface. The cleaning apparatus may comprise a rotator and may be configured to clean a substrate edge. An immersion lithographic apparatus comprising the apparatus for cleaning one or more surfaces is also disclosed. The immersion lithographic apparatus may comprise a substrate table for supporting a substrate and a fluid confinement structure for confining immersion fluid between a projection system and substrate table and/or substrate. An immersion lithographic apparatus is disclosed. [Fig. 7]
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US105007P | 2007-10-31 | 2007-10-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG152197A1 true SG152197A1 (en) | 2009-05-29 |
Family
ID=40677407
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200807999-8A SG152197A1 (en) | 2007-10-31 | 2008-10-28 | Cleaning apparatus and immersion lithographic apparatus |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN101458459B (en) |
SG (1) | SG152197A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013004942A (en) * | 2011-06-22 | 2013-01-07 | Renesas Electronics Corp | Semiconductor device manufacturing method |
US10692724B2 (en) * | 2016-12-23 | 2020-06-23 | Lam Research Corporation | Atomic layer etching methods and apparatus |
-
2008
- 2008-10-28 SG SG200807999-8A patent/SG152197A1/en unknown
- 2008-10-31 CN CN2008101868923A patent/CN101458459B/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN101458459A (en) | 2009-06-17 |
CN101458459B (en) | 2012-02-29 |
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