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Application filed by E Sun Prec Ind Co LtdfiledCriticalE Sun Prec Ind Co Ltd
Priority to SG200708879-2ApriorityCriticalpatent/SG151127A1/en
Publication of SG151127A1publicationCriticalpatent/SG151127A1/en
Preparing Plates And Mask In Photomechanical Process
(AREA)
Abstract
CONTAINER FOR RETICLE A container includes a base for supporting a flat object, a covering device for covering the flat object on the base and at least one conductive unit in conductive contact with at least one of the base and the covering device. The conductive unit includes at least one conductive column exposed from the container for conductive contact with an external object and at lest one spring for biasing the column into firm contact with the external object.
SG200708879-2A2007-09-262007-09-26Container for reticle
SG151127A1
(en)