SG140609A1 - Polishing pad - Google Patents

Polishing pad

Info

Publication number
SG140609A1
SG140609A1 SG200801564-6A SG2008015646A SG140609A1 SG 140609 A1 SG140609 A1 SG 140609A1 SG 2008015646 A SG2008015646 A SG 2008015646A SG 140609 A1 SG140609 A1 SG 140609A1
Authority
SG
Singapore
Prior art keywords
polishing
polishing pad
region
light
transmitting region
Prior art date
Application number
SG200801564-6A
Inventor
Kazuyuki Ogawa
Tetsuo Shimomura
Atsushi Kazuno
Yoshiyuki Nakai
Masahiro Watanabe
Takatoshi Yamada
Masahiko Nakamori
Original Assignee
Toyo Tire & Rubber Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2005001635A external-priority patent/JP4726108B2/en
Priority claimed from JP2005001628A external-priority patent/JP2006187837A/en
Priority claimed from JP2005001668A external-priority patent/JP2006190826A/en
Priority claimed from JP2005044027A external-priority patent/JP4964420B2/en
Application filed by Toyo Tire & Rubber Co filed Critical Toyo Tire & Rubber Co
Publication of SG140609A1 publication Critical patent/SG140609A1/en

Links

Landscapes

  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

POLISHING PAD It is an object of the invention to provide a polishing pad capable of high precision optical detection of an endpoint during polishing in progress and prevention of slurry leakage from between a polishing region and a light- transmitting region during the use thereof even after the polishing pad has been used for a long period. It is a second object of the invention to provide a polishing pad capable of suppression of deterioration of polishing characteristics (such as in-plane uniformity) and generation of scratches due to a difference in behavior of a polishing region and a light-transmitting region during polishing. It is a third object of the invention to provide a polishing pad having a polishing region and a light-transmitting region with a concentration of a specific metal equal to or lower than a specific value (threshold value).
SG200801564-6A 2005-01-06 2005-12-08 Polishing pad SG140609A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2005001635A JP4726108B2 (en) 2005-01-06 2005-01-06 Polishing pad and semiconductor device manufacturing method
JP2005001628A JP2006187837A (en) 2005-01-06 2005-01-06 Polishing pad
JP2005001668A JP2006190826A (en) 2005-01-06 2005-01-06 Polishing pad and method of manufacturing semiconductor device
JP2005044027A JP4964420B2 (en) 2005-02-21 2005-02-21 Polishing pad

Publications (1)

Publication Number Publication Date
SG140609A1 true SG140609A1 (en) 2008-03-28

Family

ID=39205065

Family Applications (2)

Application Number Title Priority Date Filing Date
SG200801567-9A SG140610A1 (en) 2005-01-06 2005-12-08 Polishing pad
SG200801564-6A SG140609A1 (en) 2005-01-06 2005-12-08 Polishing pad

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG200801567-9A SG140610A1 (en) 2005-01-06 2005-12-08 Polishing pad

Country Status (1)

Country Link
SG (2) SG140610A1 (en)

Also Published As

Publication number Publication date
SG140610A1 (en) 2008-03-28

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