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Priority claimed from US11/455,982external-prioritypatent/US20070292771A1/en
Application filed by Taiwan Semiconductor MfgfiledCriticalTaiwan Semiconductor Mfg
Publication of SG138573A1publicationCriticalpatent/SG138573A1/en
SG200704579-2A2006-06-202007-06-20Method and system for optimizing intra-field critical dimension uniformity using a sacrificial twin mask
SG138573A1
(en)