SG135026A1 - A nozzle source for thermal evaporation process - Google Patents
A nozzle source for thermal evaporation processInfo
- Publication number
- SG135026A1 SG135026A1 SG200401521-0A SG2004015210A SG135026A1 SG 135026 A1 SG135026 A1 SG 135026A1 SG 2004015210 A SG2004015210 A SG 2004015210A SG 135026 A1 SG135026 A1 SG 135026A1
- Authority
- SG
- Singapore
- Prior art keywords
- thermal evaporation
- evaporation process
- nozzle source
- nozzle
- source
- Prior art date
Links
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW093105443A TWI256419B (en) | 2002-11-18 | 2004-03-02 | A nozzle source for a thermal evaporation process |
SG200401521-0A SG135026A1 (en) | 2004-03-03 | 2004-03-03 | A nozzle source for thermal evaporation process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG200401521-0A SG135026A1 (en) | 2004-03-03 | 2004-03-03 | A nozzle source for thermal evaporation process |
Publications (1)
Publication Number | Publication Date |
---|---|
SG135026A1 true SG135026A1 (en) | 2007-09-28 |
Family
ID=38800862
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200401521-0A SG135026A1 (en) | 2002-11-18 | 2004-03-03 | A nozzle source for thermal evaporation process |
Country Status (1)
Country | Link |
---|---|
SG (1) | SG135026A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114075649A (en) * | 2020-12-24 | 2022-02-22 | 广东聚华印刷显示技术有限公司 | Crucible nozzle structure, crucible device, and evaporation device |
CN115768916A (en) * | 2020-06-29 | 2023-03-07 | 应用材料公司 | Nozzle assembly, evaporation source and deposition system and method for depositing evaporated material onto a substrate |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2248852A (en) * | 1990-10-16 | 1992-04-22 | Secr Defence | Vapour deposition |
JPH0598425A (en) * | 1991-10-04 | 1993-04-20 | Mitsubishi Electric Corp | Thin film forming device |
RU2031187C1 (en) * | 1991-06-06 | 1995-03-20 | Индивидуальное частное предприятие "Электрон-Вега" | Evaporator |
JPH07232992A (en) * | 1994-02-17 | 1995-09-05 | Mitsubishi Electric Corp | Film forming device, its vaporization source crucible and formation of thin film of sublimable vaporization material |
KR20040043361A (en) * | 2002-11-18 | 2004-05-24 | 주식회사 야스 | Circular nozzle source for thermal evaporation process |
-
2004
- 2004-03-03 SG SG200401521-0A patent/SG135026A1/en unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2248852A (en) * | 1990-10-16 | 1992-04-22 | Secr Defence | Vapour deposition |
RU2031187C1 (en) * | 1991-06-06 | 1995-03-20 | Индивидуальное частное предприятие "Электрон-Вега" | Evaporator |
JPH0598425A (en) * | 1991-10-04 | 1993-04-20 | Mitsubishi Electric Corp | Thin film forming device |
JPH07232992A (en) * | 1994-02-17 | 1995-09-05 | Mitsubishi Electric Corp | Film forming device, its vaporization source crucible and formation of thin film of sublimable vaporization material |
KR20040043361A (en) * | 2002-11-18 | 2004-05-24 | 주식회사 야스 | Circular nozzle source for thermal evaporation process |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115768916A (en) * | 2020-06-29 | 2023-03-07 | 应用材料公司 | Nozzle assembly, evaporation source and deposition system and method for depositing evaporated material onto a substrate |
CN114075649A (en) * | 2020-12-24 | 2022-02-22 | 广东聚华印刷显示技术有限公司 | Crucible nozzle structure, crucible device, and evaporation device |
CN114075649B (en) * | 2020-12-24 | 2023-12-19 | 广东聚华印刷显示技术有限公司 | Crucible nozzle structure, crucible device and evaporation device |
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