SG132531A1 - Megasonic immersion lithography exposure apparatus and method - Google Patents

Megasonic immersion lithography exposure apparatus and method

Info

Publication number
SG132531A1
SG132531A1 SG200507280-6A SG2005072806A SG132531A1 SG 132531 A1 SG132531 A1 SG 132531A1 SG 2005072806 A SG2005072806 A SG 2005072806A SG 132531 A1 SG132531 A1 SG 132531A1
Authority
SG
Singapore
Prior art keywords
exposure apparatus
immersion lithography
lithography exposure
megasonic
megasonic immersion
Prior art date
Application number
SG200507280-6A
Inventor
Chang Ching-Yu
Lin Chien-Hung
Lin Chin-Hsiang
Lu Ding-Chung
Lin Burn-Jeng
Original Assignee
Taiwan Semiconductor Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg filed Critical Taiwan Semiconductor Mfg
Priority to SG200507280-6A priority Critical patent/SG132531A1/en
Publication of SG132531A1 publication Critical patent/SG132531A1/en

Links

SG200507280-6A 2005-11-22 2005-11-22 Megasonic immersion lithography exposure apparatus and method SG132531A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SG200507280-6A SG132531A1 (en) 2005-11-22 2005-11-22 Megasonic immersion lithography exposure apparatus and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SG200507280-6A SG132531A1 (en) 2005-11-22 2005-11-22 Megasonic immersion lithography exposure apparatus and method

Publications (1)

Publication Number Publication Date
SG132531A1 true SG132531A1 (en) 2007-06-28

Family

ID=38787771

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200507280-6A SG132531A1 (en) 2005-11-22 2005-11-22 Megasonic immersion lithography exposure apparatus and method

Country Status (1)

Country Link
SG (1) SG132531A1 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040134514A1 (en) * 2003-01-10 2004-07-15 Yi Wu Megasonic cleaning system with buffered cavitation method
US20050048223A1 (en) * 2003-09-02 2005-03-03 Pawloski Adam R. Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems
US20050225734A1 (en) * 2004-04-08 2005-10-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040134514A1 (en) * 2003-01-10 2004-07-15 Yi Wu Megasonic cleaning system with buffered cavitation method
US20050048223A1 (en) * 2003-09-02 2005-03-03 Pawloski Adam R. Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems
US20050225734A1 (en) * 2004-04-08 2005-10-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

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