SG132531A1 - Megasonic immersion lithography exposure apparatus and method - Google Patents
Megasonic immersion lithography exposure apparatus and methodInfo
- Publication number
- SG132531A1 SG132531A1 SG200507280-6A SG2005072806A SG132531A1 SG 132531 A1 SG132531 A1 SG 132531A1 SG 2005072806 A SG2005072806 A SG 2005072806A SG 132531 A1 SG132531 A1 SG 132531A1
- Authority
- SG
- Singapore
- Prior art keywords
- exposure apparatus
- immersion lithography
- lithography exposure
- megasonic
- megasonic immersion
- Prior art date
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG200507280-6A SG132531A1 (en) | 2005-11-22 | 2005-11-22 | Megasonic immersion lithography exposure apparatus and method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG200507280-6A SG132531A1 (en) | 2005-11-22 | 2005-11-22 | Megasonic immersion lithography exposure apparatus and method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG132531A1 true SG132531A1 (en) | 2007-06-28 |
Family
ID=38787771
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200507280-6A SG132531A1 (en) | 2005-11-22 | 2005-11-22 | Megasonic immersion lithography exposure apparatus and method |
Country Status (1)
Country | Link |
---|---|
SG (1) | SG132531A1 (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040134514A1 (en) * | 2003-01-10 | 2004-07-15 | Yi Wu | Megasonic cleaning system with buffered cavitation method |
US20050048223A1 (en) * | 2003-09-02 | 2005-03-03 | Pawloski Adam R. | Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems |
US20050225734A1 (en) * | 2004-04-08 | 2005-10-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2005
- 2005-11-22 SG SG200507280-6A patent/SG132531A1/en unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040134514A1 (en) * | 2003-01-10 | 2004-07-15 | Yi Wu | Megasonic cleaning system with buffered cavitation method |
US20050048223A1 (en) * | 2003-09-02 | 2005-03-03 | Pawloski Adam R. | Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems |
US20050225734A1 (en) * | 2004-04-08 | 2005-10-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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