SG113572A1 - Arc deposition apparatus and method - Google Patents

Arc deposition apparatus and method

Info

Publication number
SG113572A1
SG113572A1 SG200500260A SG200500260A SG113572A1 SG 113572 A1 SG113572 A1 SG 113572A1 SG 200500260 A SG200500260 A SG 200500260A SG 200500260 A SG200500260 A SG 200500260A SG 113572 A1 SG113572 A1 SG 113572A1
Authority
SG
Singapore
Prior art keywords
deposition apparatus
arc deposition
arc
deposition
Prior art date
Application number
SG200500260A
Inventor
Shi Xu
Kang Cheah Li
Original Assignee
Nanofilm Technologies Int
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanofilm Technologies Int filed Critical Nanofilm Technologies Int
Publication of SG113572A1 publication Critical patent/SG113572A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3452—Magnet distribution
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
SG200500260A 2004-01-21 2005-01-19 Arc deposition apparatus and method SG113572A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0401298A GB2410255A (en) 2004-01-21 2004-01-21 Arc deposition method and apparatus

Publications (1)

Publication Number Publication Date
SG113572A1 true SG113572A1 (en) 2005-08-29

Family

ID=31971217

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200500260A SG113572A1 (en) 2004-01-21 2005-01-19 Arc deposition apparatus and method

Country Status (3)

Country Link
CN (1) CN1648281A (en)
GB (1) GB2410255A (en)
SG (1) SG113572A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120193227A1 (en) * 2011-02-02 2012-08-02 Tryon Brian S Magnet array for a physical vapor deposition system
JP7097172B2 (en) * 2017-11-21 2022-07-07 キヤノントッキ株式会社 Sputtering equipment
JP7390396B2 (en) 2019-03-15 2023-12-01 ナノフィルム テクノロジーズ インターナショナル リミテッド Improved cathodic arc source
CN115074678B (en) * 2022-06-20 2023-05-16 肇庆市科润真空设备有限公司 Multi-arc target mechanism for continuous coating of stainless steel sheet and PVD coating device
JP2024067972A (en) * 2022-11-07 2024-05-17 株式会社神戸製鋼所 Arch evaporation source

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69416963T2 (en) * 1993-12-17 1999-09-16 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Device for coating sheets in a vacuum
PT1357577E (en) * 2002-04-22 2008-04-22 Pivot A S Arc-coating process with rotating cathodes
JP4014982B2 (en) * 2002-09-19 2007-11-28 株式会社神戸製鋼所 Rod target for arc evaporation source, manufacturing method thereof, and arc evaporation apparatus

Also Published As

Publication number Publication date
GB0401298D0 (en) 2004-02-25
CN1648281A (en) 2005-08-03
GB2410255A (en) 2005-07-27

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