SG11202111969RA - Closed-loop multiple-output radio frequency (rf) matching - Google Patents

Closed-loop multiple-output radio frequency (rf) matching

Info

Publication number
SG11202111969RA
SG11202111969RA SG11202111969RA SG11202111969RA SG11202111969RA SG 11202111969R A SG11202111969R A SG 11202111969RA SG 11202111969R A SG11202111969R A SG 11202111969RA SG 11202111969R A SG11202111969R A SG 11202111969RA SG 11202111969R A SG11202111969R A SG 11202111969RA
Authority
SG
Singapore
Prior art keywords
matching
closed
radio frequency
output radio
loop multiple
Prior art date
Application number
SG11202111969RA
Inventor
Eller Y Juco
Karl Frederick Leeser
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of SG11202111969RA publication Critical patent/SG11202111969RA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04B—TRANSMISSION
    • H04B1/00—Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission
    • H04B1/02—Transmitters
    • H04B1/04—Circuits
    • H04B1/0483—Transmitters with multiple parallel paths
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
    • G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
    • G01R27/04—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant in circuits having distributed constants, e.g. having very long conductors or involving high frequencies
    • G01R27/06—Measuring reflection coefficients; Measuring standing-wave ratio
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks
    • H03H7/40—Automatic matching of load impedance to source impedance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Signal Processing (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
SG11202111969RA 2019-05-07 2020-04-30 Closed-loop multiple-output radio frequency (rf) matching SG11202111969RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201962844668P 2019-05-07 2019-05-07
PCT/US2020/030835 WO2020227028A1 (en) 2019-05-07 2020-04-30 Closed-loop multiple-output radio frequency (rf) matching

Publications (1)

Publication Number Publication Date
SG11202111969RA true SG11202111969RA (en) 2021-11-29

Family

ID=73050874

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202111969RA SG11202111969RA (en) 2019-05-07 2020-04-30 Closed-loop multiple-output radio frequency (rf) matching

Country Status (7)

Country Link
US (1) US20220190854A1 (en)
JP (1) JP2022531286A (en)
KR (1) KR20200130041A (en)
CN (1) CN113826185A (en)
SG (1) SG11202111969RA (en)
TW (1) TW202107517A (en)
WO (1) WO2020227028A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11984298B2 (en) 2019-12-02 2024-05-14 Lam Research Corporation Impedance transformation in radio-frequency-assisted plasma generation
US11994542B2 (en) 2020-03-27 2024-05-28 Lam Research Corporation RF signal parameter measurement in an integrated circuit fabrication chamber

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DK63694A (en) * 1994-06-06 1995-03-27 Adser Larsen Steen Method and apparatus for controlling the transmission of high frequency power from an electric alternator to a subject to be treated
US6020794A (en) * 1998-02-09 2000-02-01 Eni Technologies, Inc. Ratiometric autotuning algorithm for RF plasma generator
US8744384B2 (en) * 2000-07-20 2014-06-03 Blackberry Limited Tunable microwave devices with auto-adjusting matching circuit
WO2002073794A2 (en) * 2001-03-09 2002-09-19 California Institute Of Technology Switchless multi-resonant, multi-band power amplifier
JP4071044B2 (en) * 2002-02-08 2008-04-02 株式会社ダイヘン Impedance matching device output end characteristic analysis method, impedance matching device, and impedance matching device output end characteristic analysis system
TWI283899B (en) * 2002-07-09 2007-07-11 Applied Materials Inc Capacitively coupled plasma reactor with magnetic plasma control
US20050106873A1 (en) * 2003-08-15 2005-05-19 Hoffman Daniel J. Plasma chamber having multiple RF source frequencies
US9462672B2 (en) * 2012-02-22 2016-10-04 Lam Research Corporation Adjustment of power and frequency based on three or more states
US9214718B2 (en) * 2012-03-08 2015-12-15 Apple Inc. Methods for characterizing tunable radio-frequency elements
CN103533690A (en) * 2012-07-05 2014-01-22 Nxp股份有限公司 Microwave power source and method for automatic adjustment of work frequency
US8995926B2 (en) * 2012-09-27 2015-03-31 Apple Inc. Methods and apparatus for performing coexistence testing for multi-antenna electronic devices
US9294100B2 (en) * 2012-12-04 2016-03-22 Advanced Energy Industries, Inc. Frequency tuning system and method for finding a global optimum
US20180308663A1 (en) * 2017-04-24 2018-10-25 Kenneth S. Collins Plasma reactor with phase shift applied across electrode array
TWI788390B (en) * 2017-08-10 2023-01-01 美商應用材料股份有限公司 A distributed electrode array for plasma processing

Also Published As

Publication number Publication date
WO2020227028A1 (en) 2020-11-12
KR20200130041A (en) 2020-11-18
JP2022531286A (en) 2022-07-06
US20220190854A1 (en) 2022-06-16
CN113826185A (en) 2021-12-21
TW202107517A (en) 2021-02-16

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