SG11202111073XA - Methods and systems for combining x-ray metrology data sets to improve parameter estimation - Google Patents

Methods and systems for combining x-ray metrology data sets to improve parameter estimation

Info

Publication number
SG11202111073XA
SG11202111073XA SG11202111073XA SG11202111073XA SG11202111073XA SG 11202111073X A SG11202111073X A SG 11202111073XA SG 11202111073X A SG11202111073X A SG 11202111073XA SG 11202111073X A SG11202111073X A SG 11202111073XA SG 11202111073X A SG11202111073X A SG 11202111073XA
Authority
SG
Singapore
Prior art keywords
combining
systems
methods
data sets
parameter estimation
Prior art date
Application number
SG11202111073XA
Inventor
Christopher Liman
Antonio Arion Gellineau
Andrei V Shchegrov
Sungchul Yoo
Original Assignee
Kla Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Corp filed Critical Kla Corp
Publication of SG11202111073XA publication Critical patent/SG11202111073XA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H01L22/26Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/04Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring contours or curvatures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2210/00Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
    • G01B2210/56Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/10Different kinds of radiation or particles
    • G01N2223/101Different kinds of radiation or particles electromagnetic radiation
    • G01N2223/1016X-ray

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
SG11202111073XA 2019-04-19 2020-04-16 Methods and systems for combining x-ray metrology data sets to improve parameter estimation SG11202111073XA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201962836261P 2019-04-19 2019-04-19
US16/847,388 US11990380B2 (en) 2019-04-19 2020-04-13 Methods and systems for combining x-ray metrology data sets to improve parameter estimation
PCT/US2020/028386 WO2020214745A1 (en) 2019-04-19 2020-04-16 Methods and systems for combining x-ray metrology data sets to improve parameter estimation

Publications (1)

Publication Number Publication Date
SG11202111073XA true SG11202111073XA (en) 2021-11-29

Family

ID=72830850

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202111073XA SG11202111073XA (en) 2019-04-19 2020-04-16 Methods and systems for combining x-ray metrology data sets to improve parameter estimation

Country Status (9)

Country Link
US (1) US11990380B2 (en)
JP (1) JP2022529043A (en)
KR (1) KR20210143922A (en)
CN (1) CN113677983B (en)
DE (1) DE112020002023T5 (en)
IL (1) IL287034A (en)
SG (1) SG11202111073XA (en)
TW (1) TW202104841A (en)
WO (1) WO2020214745A1 (en)

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WO2023068632A1 (en) * 2021-10-18 2023-04-27 라이트비전 주식회사 Diffraction pattern image conversion system and method for interconverting virtual tem sadp image and real tem sadp image by using deep learning
US20230258585A1 (en) * 2022-02-16 2023-08-17 Kla Corporation Semiconductor Measurements With Robust In-Line Tool Matching
CN115983738B (en) * 2023-03-21 2023-06-27 广东仁懋电子有限公司 Method and device for improving gallium nitride preparation efficiency

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Also Published As

Publication number Publication date
WO2020214745A1 (en) 2020-10-22
TW202104841A (en) 2021-02-01
US11990380B2 (en) 2024-05-21
KR20210143922A (en) 2021-11-29
DE112020002023T5 (en) 2022-01-05
JP2022529043A (en) 2022-06-16
US20200335406A1 (en) 2020-10-22
IL287034A (en) 2021-12-01
CN113677983B (en) 2022-11-15
CN113677983A (en) 2021-11-19

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