SG11202110823VA - Electrostatic chucking process - Google Patents

Electrostatic chucking process

Info

Publication number
SG11202110823VA
SG11202110823VA SG11202110823VA SG11202110823VA SG11202110823VA SG 11202110823V A SG11202110823V A SG 11202110823VA SG 11202110823V A SG11202110823V A SG 11202110823VA SG 11202110823V A SG11202110823V A SG 11202110823VA SG 11202110823V A SG11202110823V A SG 11202110823VA
Authority
SG
Singapore
Prior art keywords
electrostatic chucking
chucking process
electrostatic
chucking
Prior art date
Application number
SG11202110823VA
Inventor
Sarah Michelle Bobek
Venkata Sharat Chandra Parimi
Prashant Kumar Kulshreshtha
Kwangduk Douglas Lee
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of SG11202110823VA publication Critical patent/SG11202110823VA/en

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    • H—ELECTRICITY
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    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
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    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
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  • Drying Of Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemical Vapour Deposition (AREA)
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