SG11202103673UA - Method for producing perfluorocycloalkene compound - Google Patents
Method for producing perfluorocycloalkene compoundInfo
- Publication number
- SG11202103673UA SG11202103673UA SG11202103673UA SG11202103673UA SG11202103673UA SG 11202103673U A SG11202103673U A SG 11202103673UA SG 11202103673U A SG11202103673U A SG 11202103673UA SG 11202103673U A SG11202103673U A SG 11202103673UA SG 11202103673U A SG11202103673U A SG 11202103673UA
- Authority
- SG
- Singapore
- Prior art keywords
- producing
- perfluorocycloalkene compound
- perfluorocycloalkene
- compound
- producing perfluorocycloalkene
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/35—Preparation of halogenated hydrocarbons by reactions not affecting the number of carbon or of halogen atoms in the reaction
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C23/00—Compounds containing at least one halogen atom bound to a ring other than a six-membered aromatic ring
- C07C23/02—Monocyclic halogenated hydrocarbons
- C07C23/06—Monocyclic halogenated hydrocarbons with a four-membered ring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B61/00—Other general methods
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018190994A JP6753443B2 (en) | 2018-10-09 | 2018-10-09 | Method for producing perfluorocycloalkene compound |
PCT/JP2019/039726 WO2020075729A1 (en) | 2018-10-09 | 2019-10-08 | Method for producing perfluorocycloalkene compound |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202103673UA true SG11202103673UA (en) | 2021-05-28 |
Family
ID=70164534
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202103673UA SG11202103673UA (en) | 2018-10-09 | 2019-10-08 | Method for producing perfluorocycloalkene compound |
Country Status (7)
Country | Link |
---|---|
JP (1) | JP6753443B2 (en) |
KR (1) | KR20210063381A (en) |
CN (1) | CN112912360A (en) |
RU (1) | RU2021137864A (en) |
SG (1) | SG11202103673UA (en) |
TW (1) | TWI791907B (en) |
WO (1) | WO2020075729A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114436759B (en) * | 2020-11-04 | 2023-10-27 | 浙江省化工研究院有限公司 | Gas phase preparation method of 1,2, 4-heptafluoro-2-butene |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5598910B2 (en) * | 2010-06-14 | 2014-10-01 | 独立行政法人産業技術総合研究所 | Method for producing fluorine compound |
JP2014058488A (en) * | 2012-09-19 | 2014-04-03 | National Institute Of Advanced Industrial & Technology | Method for producing 1,1,1,4,4,4-hexafluoro-2-butyne |
CN105348034B (en) * | 2015-12-07 | 2018-06-01 | 天津医科大学 | A kind of method for synthesizing hexafluoro -2- butine |
CN107602340B (en) * | 2017-10-17 | 2020-05-15 | 北京宇极科技发展有限公司 | Method for preparing perfluorodiene and perfluoroalkyne through gas phase isomerization |
-
2018
- 2018-10-09 JP JP2018190994A patent/JP6753443B2/en active Active
-
2019
- 2019-10-08 RU RU2021137864A patent/RU2021137864A/en unknown
- 2019-10-08 CN CN201980066353.2A patent/CN112912360A/en active Pending
- 2019-10-08 KR KR1020217011885A patent/KR20210063381A/en not_active Application Discontinuation
- 2019-10-08 WO PCT/JP2019/039726 patent/WO2020075729A1/en active Application Filing
- 2019-10-08 SG SG11202103673UA patent/SG11202103673UA/en unknown
- 2019-10-09 TW TW108136677A patent/TWI791907B/en active
Also Published As
Publication number | Publication date |
---|---|
WO2020075729A1 (en) | 2020-04-16 |
RU2021137864A (en) | 2022-01-26 |
JP2020059664A (en) | 2020-04-16 |
TWI791907B (en) | 2023-02-11 |
KR20210063381A (en) | 2021-06-01 |
TW202033482A (en) | 2020-09-16 |
JP6753443B2 (en) | 2020-09-09 |
CN112912360A (en) | 2021-06-04 |
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