SG11202103673UA - Method for producing perfluorocycloalkene compound - Google Patents

Method for producing perfluorocycloalkene compound

Info

Publication number
SG11202103673UA
SG11202103673UA SG11202103673UA SG11202103673UA SG11202103673UA SG 11202103673U A SG11202103673U A SG 11202103673UA SG 11202103673U A SG11202103673U A SG 11202103673UA SG 11202103673U A SG11202103673U A SG 11202103673UA SG 11202103673U A SG11202103673U A SG 11202103673UA
Authority
SG
Singapore
Prior art keywords
producing
perfluorocycloalkene compound
perfluorocycloalkene
compound
producing perfluorocycloalkene
Prior art date
Application number
SG11202103673UA
Inventor
Yuusuke Etou
Shingo Nakamura
Original Assignee
Daikin Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Ind Ltd filed Critical Daikin Ind Ltd
Publication of SG11202103673UA publication Critical patent/SG11202103673UA/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00Preparation of halogenated hydrocarbons
    • C07C17/35Preparation of halogenated hydrocarbons by reactions not affecting the number of carbon or of halogen atoms in the reaction
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C23/00Compounds containing at least one halogen atom bound to a ring other than a six-membered aromatic ring
    • C07C23/02Monocyclic halogenated hydrocarbons
    • C07C23/06Monocyclic halogenated hydrocarbons with a four-membered ring
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065Plasma etching; Reactive-ion etching
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07BGENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B61/00Other general methods
SG11202103673UA 2018-10-09 2019-10-08 Method for producing perfluorocycloalkene compound SG11202103673UA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018190994A JP6753443B2 (en) 2018-10-09 2018-10-09 Method for producing perfluorocycloalkene compound
PCT/JP2019/039726 WO2020075729A1 (en) 2018-10-09 2019-10-08 Method for producing perfluorocycloalkene compound

Publications (1)

Publication Number Publication Date
SG11202103673UA true SG11202103673UA (en) 2021-05-28

Family

ID=70164534

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202103673UA SG11202103673UA (en) 2018-10-09 2019-10-08 Method for producing perfluorocycloalkene compound

Country Status (7)

Country Link
JP (1) JP6753443B2 (en)
KR (1) KR20210063381A (en)
CN (1) CN112912360A (en)
RU (1) RU2021137864A (en)
SG (1) SG11202103673UA (en)
TW (1) TWI791907B (en)
WO (1) WO2020075729A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114436759B (en) * 2020-11-04 2023-10-27 浙江省化工研究院有限公司 Gas phase preparation method of 1,2, 4-heptafluoro-2-butene

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5598910B2 (en) * 2010-06-14 2014-10-01 独立行政法人産業技術総合研究所 Method for producing fluorine compound
JP2014058488A (en) * 2012-09-19 2014-04-03 National Institute Of Advanced Industrial & Technology Method for producing 1,1,1,4,4,4-hexafluoro-2-butyne
CN105348034B (en) * 2015-12-07 2018-06-01 天津医科大学 A kind of method for synthesizing hexafluoro -2- butine
CN107602340B (en) * 2017-10-17 2020-05-15 北京宇极科技发展有限公司 Method for preparing perfluorodiene and perfluoroalkyne through gas phase isomerization

Also Published As

Publication number Publication date
WO2020075729A1 (en) 2020-04-16
RU2021137864A (en) 2022-01-26
JP2020059664A (en) 2020-04-16
TWI791907B (en) 2023-02-11
KR20210063381A (en) 2021-06-01
TW202033482A (en) 2020-09-16
JP6753443B2 (en) 2020-09-09
CN112912360A (en) 2021-06-04

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