SG11202100743XA - Membrane diffuser for a substrate container - Google Patents

Membrane diffuser for a substrate container

Info

Publication number
SG11202100743XA
SG11202100743XA SG11202100743XA SG11202100743XA SG11202100743XA SG 11202100743X A SG11202100743X A SG 11202100743XA SG 11202100743X A SG11202100743X A SG 11202100743XA SG 11202100743X A SG11202100743X A SG 11202100743XA SG 11202100743X A SG11202100743X A SG 11202100743XA
Authority
SG
Singapore
Prior art keywords
substrate container
membrane diffuser
diffuser
membrane
container
Prior art date
Application number
SG11202100743XA
Inventor
Mark V Smith
Nicholas Thelen
Matthew A Fuller
Michael C Zabka
Sung In Moon
John P Puglia
Original Assignee
Entegris Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Entegris Inc filed Critical Entegris Inc
Publication of SG11202100743XA publication Critical patent/SG11202100743XA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67389—Closed carriers characterised by atmosphere control
    • H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67389—Closed carriers characterised by atmosphere control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/0039—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with flow guiding by feed or discharge devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/10—Particle separators, e.g. dust precipitators, using filter plates, sheets or pads having plane surfaces
    • B01D46/103—Curved filtering elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/06—Organic material
    • B01D71/26—Polyalkenes
    • B01D71/261—Polyethylene
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6732—Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67376—Closed carriers characterised by sealing arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67383—Closed carriers characterised by substrate supports
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67386—Closed carriers characterised by the construction of the closed carrier
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical & Material Sciences (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Packaging Of Annular Or Rod-Shaped Articles, Wearing Apparel, Cassettes, Or The Like (AREA)
  • Vacuum Packaging (AREA)
SG11202100743XA 2018-08-28 2019-08-27 Membrane diffuser for a substrate container SG11202100743XA (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201862723979P 2018-08-28 2018-08-28
US201962837389P 2019-04-23 2019-04-23
US201962874647P 2019-07-16 2019-07-16
PCT/US2019/048247 WO2020046867A1 (en) 2018-08-28 2019-08-27 Membrane diffuser for a substrate container

Publications (1)

Publication Number Publication Date
SG11202100743XA true SG11202100743XA (en) 2021-02-25

Family

ID=69640054

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202100743XA SG11202100743XA (en) 2018-08-28 2019-08-27 Membrane diffuser for a substrate container

Country Status (7)

Country Link
US (2) US11610795B2 (en)
JP (2) JP7280348B2 (en)
KR (2) KR20230134612A (en)
CN (1) CN112640079A (en)
SG (1) SG11202100743XA (en)
TW (1) TWI726402B (en)
WO (1) WO2020046867A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11610795B2 (en) * 2018-08-28 2023-03-21 Entegris, Inc. Membrane diffuser for a substrate container
EP4115445A4 (en) * 2020-03-06 2024-04-17 Entegris, Inc. Manifold for a substrate container
US20230260813A1 (en) * 2020-07-10 2023-08-17 Miraial Co. Ltd. Substrate storage container
TWI751814B (en) * 2020-09-22 2022-01-01 家登精密工業股份有限公司 Central support device for supporting sheets and storage equipment for storing sheets
WO2023183517A1 (en) * 2022-03-25 2023-09-28 Entegris, Inc. Wafer container purge port assembly

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3367421B2 (en) * 1998-04-16 2003-01-14 東京エレクトロン株式会社 Object storage device and loading / unloading stage
JP3916380B2 (en) * 1999-07-06 2007-05-16 株式会社荏原製作所 Substrate transfer container standby station
JP3939101B2 (en) * 2000-12-04 2007-07-04 株式会社荏原製作所 Substrate transport method and substrate transport container
JP2002170874A (en) * 2000-12-04 2002-06-14 Ebara Corp Substrate transport container
US7328727B2 (en) 2004-04-18 2008-02-12 Entegris, Inc. Substrate container with fluid-sealing flow passageway
US7758338B2 (en) 2007-05-29 2010-07-20 Taiwan Semiconductor Manufacturing Co., Ltd. Substrate carrier, port apparatus and facility interface and apparatus including same
JP5524093B2 (en) 2008-03-13 2014-06-18 インテグリス・インコーポレーテッド Wafer container with tubular control element
WO2011072260A2 (en) * 2009-12-10 2011-06-16 Entegris, Inc. Porous barrier for evenly distributed purge gas in a microenvironment
TWM453233U (en) * 2013-01-07 2013-05-11 Gudeng Prec Ind Co Ltd Gas filling device for substrate storage container
KR102093200B1 (en) 2013-10-14 2020-03-25 엔테그리스, 아이엔씨. Towers for substrate carriers
TWM489155U (en) 2014-06-09 2014-11-01 Gudeng Precision Industrial Co Ltd Gas diffusion device of wafer pod
US9881826B2 (en) 2014-10-24 2018-01-30 Lam Research Corporation Buffer station with single exit-flow direction
JP2016105443A (en) 2014-12-01 2016-06-09 ミライアル株式会社 Substrate housing container
KR101748361B1 (en) 2015-04-29 2017-06-19 (주)젠스엠 Apparatus for supplying gas for wafer container
KR20230085228A (en) * 2015-05-12 2023-06-13 엔테그리스, 아이엔씨. Wafer container with external passive getter module
KR101601600B1 (en) 2015-05-22 2016-03-09 조창현 Wafer carrier container cleaning for purging apparatus
WO2016205191A1 (en) 2015-06-17 2016-12-22 Entegris, Inc. Flow modification fixture for an equipment front end module
TWM526559U (en) 2016-04-22 2016-08-01 Univ Nat Taipei Technology Wafer cassette
SG11201901884RA (en) * 2016-09-06 2019-04-29 Shin Etsu Polymer Co Ltd Substrate Storage Container and Gas Replacement Unit
US10903103B2 (en) * 2018-01-22 2021-01-26 Nanya Technology Corporation Front opening unified pod
US11610795B2 (en) * 2018-08-28 2023-03-21 Entegris, Inc. Membrane diffuser for a substrate container

Also Published As

Publication number Publication date
US20230197490A1 (en) 2023-06-22
TWI726402B (en) 2021-05-01
KR20230134612A (en) 2023-09-21
US11901205B2 (en) 2024-02-13
US11610795B2 (en) 2023-03-21
US20200075374A1 (en) 2020-03-05
CN112640079A (en) 2021-04-09
TW202012288A (en) 2020-04-01
KR20210027495A (en) 2021-03-10
JP2022517892A (en) 2022-03-11
JP7280348B2 (en) 2023-05-23
JP2023099621A (en) 2023-07-13
WO2020046867A1 (en) 2020-03-05

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