SG11202011505RA - Semiconductor charged particle detector for microscopy - Google Patents
Semiconductor charged particle detector for microscopyInfo
- Publication number
- SG11202011505RA SG11202011505RA SG11202011505RA SG11202011505RA SG11202011505RA SG 11202011505R A SG11202011505R A SG 11202011505RA SG 11202011505R A SG11202011505R A SG 11202011505RA SG 11202011505R A SG11202011505R A SG 11202011505RA SG 11202011505R A SG11202011505R A SG 11202011505RA
- Authority
- SG
- Singapore
- Prior art keywords
- microscopy
- charged particle
- particle detector
- semiconductor charged
- semiconductor
- Prior art date
Links
- 238000000386 microscopy Methods 0.000 title 1
- 239000002245 particle Substances 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/24—Measuring radiation intensity with semiconductor detectors
- G01T1/247—Detector read-out circuitry
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/285—Emission microscopes, e.g. field-emission microscopes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/085—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors the device being sensitive to very short wavelength, e.g. X-ray, Gamma-rays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2441—Semiconductor detectors, e.g. diodes
Landscapes
- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- High Energy & Nuclear Physics (AREA)
- Computer Hardware Design (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Measurement Of Radiation (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862682730P | 2018-06-08 | 2018-06-08 | |
| US201862787066P | 2018-12-31 | 2018-12-31 | |
| US201962852816P | 2019-05-24 | 2019-05-24 | |
| PCT/EP2019/064445 WO2019233991A1 (en) | 2018-06-08 | 2019-06-04 | Semiconductor charged particle detector for microscopy |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11202011505RA true SG11202011505RA (en) | 2020-12-30 |
Family
ID=66770483
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11202011505RA SG11202011505RA (en) | 2018-06-08 | 2019-06-04 | Semiconductor charged particle detector for microscopy |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US11508547B2 (en) |
| EP (1) | EP3803933A1 (en) |
| JP (2) | JP7209744B2 (en) |
| KR (2) | KR20210008044A (en) |
| CN (1) | CN112243531A (en) |
| IL (1) | IL279203A (en) |
| SG (1) | SG11202011505RA (en) |
| TW (1) | TWI803644B (en) |
| WO (1) | WO2019233991A1 (en) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020173681A1 (en) * | 2019-02-26 | 2020-09-03 | Asml Netherlands B.V. | Charged particle detector with gain element |
| US11152190B2 (en) * | 2019-04-18 | 2021-10-19 | Decision Sciences International Corporation | Charged particle scanners |
| US11614552B2 (en) * | 2019-04-18 | 2023-03-28 | Decision Sciences International Corporation | Charged particle scanners |
| US12015704B2 (en) * | 2019-06-20 | 2024-06-18 | Bae Systems Information And Electronic Systems Integration Inc. | Particle accelerator to generate random numbers for cryptographic applications |
| US11610757B2 (en) * | 2019-08-28 | 2023-03-21 | Kla Corporation | Sensor module for scanning electron microscopy applications |
| CN111208550B (en) * | 2020-01-08 | 2021-08-17 | 中国科学院近代物理研究所 | Transverse and longitudinal beam schottky signal detector |
| TW202335021A (en) * | 2020-04-10 | 2023-09-01 | 荷蘭商Ａｓｍｌ荷蘭公司 | Systems and methods for signal electron detection |
| US11183361B1 (en) * | 2020-05-19 | 2021-11-23 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device and method for inspecting and/or imaging a sample |
| US11239043B2 (en) * | 2020-05-19 | 2022-02-01 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device and method for inspecting and/or imaging a sample |
| CN115917700A (en) * | 2020-05-28 | 2023-04-04 | Asml荷兰有限公司 | Enhanced architecture for the technical field of high-performance detection equipment |
| EP4020565A1 (en) * | 2020-12-23 | 2022-06-29 | ASML Netherlands B.V. | Detector substrate, an inspection apparatus and method of sample assessment |
| US20230238211A1 (en) * | 2020-07-06 | 2023-07-27 | Asml Netherlands B.V. | A detector substrate for use in a charged particle multi-beam assessment tool |
| TWI803891B (en) | 2020-07-10 | 2023-06-01 | 荷蘭商Ａｓｍｌ荷蘭公司 | Sensing element level circuitry design for electron counting detection device |
| US11798778B2 (en) | 2020-07-20 | 2023-10-24 | Attolight AG | Time-resolved cathodoluminescence sample probing |
| CN116325066A (en) * | 2020-07-29 | 2023-06-23 | Asml荷兰有限公司 | System and method for electronic detection of signals in an inspection device |
| EP3961268A1 (en) | 2020-08-28 | 2022-03-02 | ASML Netherlands B.V. | Readout circuit for pixelized electron detector |
| WO2022135971A1 (en) * | 2020-12-23 | 2022-06-30 | Asml Netherlands B.V. | Monolithic detector |
| KR20230122666A (en) * | 2020-12-23 | 2023-08-22 | 에이에스엠엘 네델란즈 비.브이. | Charged Particle Optical Device |
| EP4063918A1 (en) * | 2021-03-22 | 2022-09-28 | Koninklijke Philips N.V. | Pulse shaper circuit |
| SE545450C2 (en) * | 2021-03-24 | 2023-09-12 | Scienta Omicron Ab | Charged particle spectrometer and method for calibration |
| US11626267B2 (en) * | 2021-04-28 | 2023-04-11 | Applied Materials Israel Ltd. | Back-scatter electrons (BSE) imaging with a SEM in tilted mode using cap bias voltage |
| WO2022248296A2 (en) | 2021-05-27 | 2022-12-01 | Asml Netherlands B.V. | Manipulation of carrier transport behavior in detector |
| CN113791755B (en) * | 2021-08-24 | 2023-10-20 | 中国航天科工集团第二研究院 | Quantum random number sequence generation method, system and device |
| WO2023061688A1 (en) | 2021-10-12 | 2023-04-20 | Asml Netherlands B.V. | Energy band-pass filtering for improved high landing energy backscattered charged particle image resolution |
| EP4266347A1 (en) | 2022-04-19 | 2023-10-25 | ASML Netherlands B.V. | Method of filtering false positives for a pixelated electron detector |
| WO2024013145A1 (en) * | 2022-07-15 | 2024-01-18 | Asml Netherlands B.V. | Method and system for fine focusing secondary beam spots on detector for multi-beam inspection apparatus |
| EP4310884A1 (en) | 2022-07-21 | 2024-01-24 | ASML Netherlands B.V. | Charged particle detector for microscopy |
| WO2024018038A1 (en) | 2022-07-21 | 2024-01-25 | Asml Netherlands B.V. | System and method for counting particles on a detector during inspection |
| WO2024017717A1 (en) | 2022-07-21 | 2024-01-25 | Asml Netherlands B.V. | Enhanced edge detection using detector incidence locations |
| WO2024033071A1 (en) | 2022-08-08 | 2024-02-15 | Asml Netherlands B.V. | Particle detector with reduced inter-symbol interference |
| WO2024078821A1 (en) | 2022-10-11 | 2024-04-18 | Asml Netherlands B.V. | Charged particle detector for microscopy |
| WO2024094644A1 (en) * | 2022-11-02 | 2024-05-10 | Asml Netherlands B.V. | Charged particle beam detector with adaptive detection area for multiple field of view settings |
| US20240194442A1 (en) * | 2022-12-13 | 2024-06-13 | Fei Company | Charged particle sensors including wide bandgap materials |
| US20240212974A1 (en) * | 2022-12-21 | 2024-06-27 | Fei Company | Detecting charged particle events at high dose rates |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5917500B2 (en) * | 1981-03-18 | 1984-04-21 | 株式会社東芝 | Neutral particle detection device |
| JPS6275371A (en) * | 1985-09-30 | 1987-04-07 | Toshiba Corp | Mcp charged particle counting apparatus |
| US6584413B1 (en) * | 2001-06-01 | 2003-06-24 | Sandia Corporation | Apparatus and system for multivariate spectral analysis |
| GB0201260D0 (en) * | 2002-01-21 | 2002-03-06 | Europ Org For Nuclear Research | A sensing and imaging device |
| US7605357B2 (en) * | 2006-03-21 | 2009-10-20 | Epitaxial Technologies | Photon counting optically preamplified photoreceivers with micro-digitized pixels |
| WO2008009139A1 (en) * | 2006-07-21 | 2008-01-24 | Fibics Incorporated | Method and system for counting secondary particles |
| US9153413B2 (en) | 2007-02-22 | 2015-10-06 | Applied Materials Israel, Ltd. | Multi-beam scanning electron beam device and methods of using the same |
| US7928400B1 (en) * | 2008-08-04 | 2011-04-19 | Bruker Axs, Inc. | X-ray detection system for wavelength dispersive and energy dispersive spectroscopy and electron beam applications |
| JP5185207B2 (en) | 2009-02-24 | 2013-04-17 | 浜松ホトニクス株式会社 | Photodiode array |
| US7851764B2 (en) * | 2009-03-20 | 2010-12-14 | Direct Electron, Lp | Method of high-energy particle imaging by computing a difference between sampled pixel voltages |
| WO2012016198A2 (en) | 2010-07-30 | 2012-02-02 | Pulsetor, Llc | Electron detector including an intimately-coupled scintillator-photomultiplier combination, and electron microscope and x-ray detector employing same |
| EP2461347A1 (en) * | 2010-12-06 | 2012-06-06 | Fei Company | Detector system for transmission electron microscope |
| JP6531108B2 (en) * | 2013-10-23 | 2019-06-12 | ナノヴィジョン・テクノロジー・（ベイジン）・カンパニー・リミテッド | Radiation imaging system, method and device based on photon counting |
| US10231687B2 (en) * | 2014-10-17 | 2019-03-19 | Triple Ring Technologies, Inc. | Method and apparatus for enhanced X-ray computing arrays |
| US9966224B2 (en) * | 2014-10-22 | 2018-05-08 | Sciencetomorrow Llc | Quantitative secondary electron detection |
| DE102015202172B4 (en) | 2015-02-06 | 2017-01-19 | Carl Zeiss Microscopy Gmbh | Particle beam system and method for particle-optical examination of an object |
| US9691588B2 (en) | 2015-03-10 | 2017-06-27 | Hermes Microvision, Inc. | Apparatus of plural charged-particle beams |
| US9627190B2 (en) * | 2015-03-27 | 2017-04-18 | Agilent Technologies, Inc. | Energy resolved time-of-flight mass spectrometry |
| US9922799B2 (en) | 2015-07-21 | 2018-03-20 | Hermes Microvision, Inc. | Apparatus of plural charged-particle beams |
| CN111681939B (en) | 2015-07-22 | 2023-10-27 | Asml荷兰有限公司 | Apparatus for multiple charged particle beams |
-
2019
- 2019-06-04 KR KR1020207035295A patent/KR20210008044A/en not_active IP Right Cessation
- 2019-06-04 SG SG11202011505RA patent/SG11202011505RA/en unknown
- 2019-06-04 JP JP2020565872A patent/JP7209744B2/en active Active
- 2019-06-04 CN CN201980038632.8A patent/CN112243531A/en active Pending
- 2019-06-04 WO PCT/EP2019/064445 patent/WO2019233991A1/en unknown
- 2019-06-04 EP EP19728668.5A patent/EP3803933A1/en active Pending
- 2019-06-04 KR KR1020237027103A patent/KR20230122180A/en not_active Application Discontinuation
- 2019-06-05 TW TW108119553A patent/TWI803644B/en active
- 2019-06-07 US US16/435,145 patent/US11508547B2/en active Active
-
2020
- 2020-12-03 IL IL279203A patent/IL279203A/en unknown
-
2022
- 2022-10-20 US US17/970,469 patent/US20230123152A1/en active Pending
-
2023
- 2023-01-10 JP JP2023001471A patent/JP2023052270A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP2023052270A (en) | 2023-04-11 |
| US20190378682A1 (en) | 2019-12-12 |
| JP2021526714A (en) | 2021-10-07 |
| WO2019233991A1 (en) | 2019-12-12 |
| US11508547B2 (en) | 2022-11-22 |
| TW202324482A (en) | 2023-06-16 |
| US20230123152A1 (en) | 2023-04-20 |
| TW202001972A (en) | 2020-01-01 |
| IL279203A (en) | 2021-01-31 |
| KR20210008044A (en) | 2021-01-20 |
| JP7209744B2 (en) | 2023-01-20 |
| KR20230122180A (en) | 2023-08-22 |
| EP3803933A1 (en) | 2021-04-14 |
| CN112243531A (en) | 2021-01-19 |
| TWI803644B (en) | 2023-06-01 |
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