SG11202008409QA - Adaptive control for a power generator - Google Patents
Adaptive control for a power generatorInfo
- Publication number
- SG11202008409QA SG11202008409QA SG11202008409QA SG11202008409QA SG11202008409QA SG 11202008409Q A SG11202008409Q A SG 11202008409QA SG 11202008409Q A SG11202008409Q A SG 11202008409QA SG 11202008409Q A SG11202008409Q A SG 11202008409QA SG 11202008409Q A SG11202008409Q A SG 11202008409QA
- Authority
- SG
- Singapore
- Prior art keywords
- power generator
- adaptive control
- adaptive
- control
- generator
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/04—Programme control other than numerical control, i.e. in sequence controllers or logic controllers
- G05B19/042—Programme control other than numerical control, i.e. in sequence controllers or logic controllers using digital processors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32926—Software, data control or modelling
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32146—Amplitude modulation, includes pulsing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32155—Frequency modulation
- H01J37/32165—Plural frequencies
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/20—Pc systems
- G05B2219/26—Pc applications
- G05B2219/2639—Energy management, use maximum of cheap power, keep peak load low
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Automation & Control Theory (AREA)
- Amplifiers (AREA)
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862690202P | 2018-06-26 | 2018-06-26 | |
| US16/297,799 US11042140B2 (en) | 2018-06-26 | 2019-03-11 | Adaptive control for a power generator |
| PCT/US2019/038730 WO2020005832A1 (en) | 2018-06-26 | 2019-06-24 | Adaptive control for a power generator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11202008409QA true SG11202008409QA (en) | 2020-09-29 |
Family
ID=68981741
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11202008409QA SG11202008409QA (en) | 2018-06-26 | 2019-06-24 | Adaptive control for a power generator |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US11042140B2 (en) |
| EP (1) | EP3815126B1 (en) |
| JP (1) | JP7074876B2 (en) |
| KR (1) | KR102364185B1 (en) |
| CN (1) | CN111954916B (en) |
| SG (1) | SG11202008409QA (en) |
| TW (1) | TWI750482B (en) |
| WO (1) | WO2020005832A1 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102399816B1 (en) * | 2019-08-05 | 2022-05-20 | 주식회사 히타치하이테크 | plasma processing unit |
| US10741363B1 (en) * | 2019-10-08 | 2020-08-11 | Mks Instruments, Inc. | Extremum seeking control apparatus and method for automatic frequency tuning for RF impedance matching |
| CN113381617B (en) | 2021-06-29 | 2024-10-18 | 昂宝电子（上海）有限公司 | Constant voltage switching power supply and control chip and method thereof |
| US11721523B2 (en) * | 2021-09-07 | 2023-08-08 | Advanced Energy Industries, Inc. | Control of rail voltage in multi-level pulsing RF power amplifier |
| US12080530B2 (en) * | 2021-09-13 | 2024-09-03 | Advanced Energy Industries, Inc | Model reference adaptive control with signum projection tensor operations |
| TWI779965B (en) * | 2021-12-14 | 2022-10-01 | 瑞昱半導體股份有限公司 | Measuring system and associated method |
| US20240012371A1 (en) * | 2022-06-30 | 2024-01-11 | Advanced Energy Industries, Inc. | Adaptive engine with sliding mode predictor |
| US20240055228A1 (en) * | 2022-08-10 | 2024-02-15 | Mks Instruments, Inc. | Plasma Process Control of Multi-Electrode Systems Equipped with Ion Energy Sensors |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5604468A (en) * | 1996-04-22 | 1997-02-18 | Motorola, Inc. | Frequency synthesizer with temperature compensation and frequency multiplication and method of providing the same |
| GB2366906B (en) * | 1999-07-23 | 2003-06-25 | Seagate Technology Llc | Disturbance rejection for disc drives using adaptive accelerometer feedforward servo |
| JP2001137214A (en) * | 1999-11-12 | 2001-05-22 | Hitachi Medical Corp | Power supply device and magnetic resonance imaging apparatus using the same |
| US6707255B2 (en) | 2002-07-10 | 2004-03-16 | Eni Technology, Inc. | Multirate processing for metrology of plasma RF source |
| US7755300B2 (en) * | 2003-09-22 | 2010-07-13 | Mks Instruments, Inc. | Method and apparatus for preventing instabilities in radio-frequency plasma processing |
| US7289341B2 (en) * | 2004-12-14 | 2007-10-30 | Advanced Energy Industries, Inc. | Power supply adaptive feedforward control circuit |
| US7474149B2 (en) * | 2005-03-25 | 2009-01-06 | Pulsewave Rf, Inc. | Radio frequency power amplifier and method using a controlled supply |
| US7602127B2 (en) | 2005-04-18 | 2009-10-13 | Mks Instruments, Inc. | Phase and frequency control of a radio frequency generator from an external source |
| US9214909B2 (en) * | 2005-07-29 | 2015-12-15 | Mks Instruments, Inc. | High reliability RF generator architecture |
| JP4805749B2 (en) * | 2005-07-29 | 2011-11-02 | パナソニック株式会社 | Speaker device |
| CN102089671B (en) * | 2008-07-11 | 2015-08-26 | 皇家飞利浦电子股份有限公司 | There is the digital amplifier of feedforward and FEEDBACK CONTROL |
| US20100323641A1 (en) * | 2009-06-22 | 2010-12-23 | Qualcomm Incorporated | Method and apparatus for using pre-distortion and feedback to mitigate nonlinearity of circuits |
| US8659335B2 (en) * | 2009-06-25 | 2014-02-25 | Mks Instruments, Inc. | Method and system for controlling radio frequency power |
| US8330432B2 (en) | 2009-12-22 | 2012-12-11 | Advanced Energy Industries, Inc | Efficient active source impedance modification of a power amplifier |
| US8576013B2 (en) | 2011-12-29 | 2013-11-05 | Mks Instruments, Inc. | Power distortion-based servo control systems for frequency tuning RF power sources |
| US8781415B1 (en) | 2013-02-07 | 2014-07-15 | Mks Instruments, Inc. | Distortion correction based feedforward control systems and methods for radio frequency power sources |
| US10821542B2 (en) | 2013-03-15 | 2020-11-03 | Mks Instruments, Inc. | Pulse synchronization by monitoring power in another frequency band |
| DE102014105445A1 (en) * | 2013-04-26 | 2014-10-30 | Mks Instruments Inc. | Frequency and phase control of a multi-radio frequency power supply |
| US10049857B2 (en) | 2014-12-04 | 2018-08-14 | Mks Instruments, Inc. | Adaptive periodic waveform controller |
| TWI548198B (en) | 2015-06-03 | 2016-09-01 | 陳正一 | Design of programmable power-quality signal generator |
| US10395895B2 (en) | 2015-08-27 | 2019-08-27 | Mks Instruments, Inc. | Feedback control by RF waveform tailoring for ion energy distribution |
| JP6378234B2 (en) | 2016-03-22 | 2018-08-22 | 東京エレクトロン株式会社 | Plasma processing method and plasma processing apparatus |
| US10229816B2 (en) * | 2016-05-24 | 2019-03-12 | Mks Instruments, Inc. | Solid-state impedance matching systems including a hybrid tuning network with a switchable coarse tuning network and a varactor fine tuning network |
| US20190108976A1 (en) | 2017-10-11 | 2019-04-11 | Advanced Energy Industries, Inc. | Matched source impedance driving system and method of operating the same |
| US10304669B1 (en) | 2018-01-21 | 2019-05-28 | Mks Instruments, Inc. | Adaptive counter measure control thwarting IMD jamming impairments for RF plasma systems |
-
2019
- 2019-03-11 US US16/297,799 patent/US11042140B2/en active Active
- 2019-06-20 TW TW108121605A patent/TWI750482B/en active
- 2019-06-24 WO PCT/US2019/038730 patent/WO2020005832A1/en unknown
- 2019-06-24 EP EP19825918.6A patent/EP3815126B1/en active Active
- 2019-06-24 CN CN201980024263.7A patent/CN111954916B/en active Active
- 2019-06-24 JP JP2020552726A patent/JP7074876B2/en active Active
- 2019-06-24 SG SG11202008409QA patent/SG11202008409QA/en unknown
- 2019-06-24 KR KR1020207028237A patent/KR102364185B1/en active IP Right Grant
-
2021
- 2021-04-16 US US17/232,950 patent/US11531312B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TWI750482B (en) | 2021-12-21 |
| US11531312B2 (en) | 2022-12-20 |
| KR20200125985A (en) | 2020-11-05 |
| JP2021520067A (en) | 2021-08-12 |
| TW202044316A (en) | 2020-12-01 |
| WO2020005832A1 (en) | 2020-01-02 |
| US20210311448A1 (en) | 2021-10-07 |
| EP3815126A1 (en) | 2021-05-05 |
| CN111954916B (en) | 2024-03-29 |
| JP7074876B2 (en) | 2022-05-24 |
| US11042140B2 (en) | 2021-06-22 |
| CN111954916A (en) | 2020-11-17 |
| KR102364185B1 (en) | 2022-02-18 |
| US20190391547A1 (en) | 2019-12-26 |
| EP3815126A4 (en) | 2022-03-30 |
| EP3815126B1 (en) | 2023-06-14 |
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