SG11202006940SA - Processes for Designing and Fabricating a Device Comprising an Array of Micro-Machined Elements, Device Obtained at the End of Such Processes - Google Patents

Processes for Designing and Fabricating a Device Comprising an Array of Micro-Machined Elements, Device Obtained at the End of Such Processes

Info

Publication number
SG11202006940SA
SG11202006940SA SG11202006940SA SG11202006940SA SG11202006940SA SG 11202006940S A SG11202006940S A SG 11202006940SA SG 11202006940S A SG11202006940S A SG 11202006940SA SG 11202006940S A SG11202006940S A SG 11202006940SA SG 11202006940S A SG11202006940S A SG 11202006940SA
Authority
SG
Singapore
Prior art keywords
processes
fabricating
designing
micro
array
Prior art date
Application number
SG11202006940SA
Inventor
Bruno Ghyselen
Original Assignee
Soitec Silicon On Insulator
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Soitec Silicon On Insulator filed Critical Soitec Silicon On Insulator
Publication of SG11202006940SA publication Critical patent/SG11202006940SA/en

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/20Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
    • H10N30/204Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
    • H10N30/2047Membrane type
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B06GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06BMETHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B1/00Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
    • B06B1/02Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
    • B06B1/0292Electrostatic transducers, e.g. electret-type
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/01Manufacture or treatment
SG11202006940SA 2018-01-22 2019-01-18 Processes for Designing and Fabricating a Device Comprising an Array of Micro-Machined Elements, Device Obtained at the End of Such Processes SG11202006940SA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1850484A FR3077163B1 (en) 2018-01-22 2018-01-22 DESIGN AND MANUFACTURING METHODS OF A DEVICE INCLUDING A NETWORK OF MICRO-FACTORY ELEMENTS, A DEVICE OBTAINED AS A RESULT OF SUCH METHODS
PCT/FR2019/050108 WO2019141952A1 (en) 2018-01-22 2019-01-18 Methods for designing and producing a device comprising an array of micromachined elements, and device produced by said methods

Publications (1)

Publication Number Publication Date
SG11202006940SA true SG11202006940SA (en) 2020-08-28

Family

ID=63834070

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202006940SA SG11202006940SA (en) 2018-01-22 2019-01-18 Processes for Designing and Fabricating a Device Comprising an Array of Micro-Machined Elements, Device Obtained at the End of Such Processes

Country Status (9)

Country Link
US (2) US11706989B2 (en)
EP (1) EP3743951B1 (en)
JP (1) JP7215802B2 (en)
KR (1) KR20200108441A (en)
CN (1) CN111630673A (en)
FR (1) FR3077163B1 (en)
SG (1) SG11202006940SA (en)
TW (1) TWI800594B (en)
WO (1) WO2019141952A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11684951B2 (en) * 2019-08-08 2023-06-27 Bfly Operations, Inc. Micromachined ultrasonic transducer devices having truncated circle shaped cavities
FR3113772B1 (en) * 2020-08-25 2024-05-03 Commissariat A Lenergie Atomique Et Aux Energies Alternatives Process for transferring a thin layer onto a receiving substrate comprising cavities and a region devoid of cavities at the edge of a bonding face

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3955241B2 (en) 2002-06-21 2007-08-08 東京エレクトロン株式会社 MEMS array, manufacturing method thereof, and manufacturing method of MEMS device based thereon
EP1524685B1 (en) * 2003-10-17 2013-01-23 Imec Method for processing a semiconductor device comprising an silicon-oxy-nitride dielectric layer
TWI240990B (en) 2003-10-21 2005-10-01 Ind Tech Res Inst Preparation method of micromachined capacitive ultrasonic transducer by the imprinting technique
US7293462B2 (en) 2005-01-04 2007-11-13 General Electric Company Isolation of short-circuited sensor cells for high-reliability operation of sensor array
JP4790315B2 (en) 2005-05-31 2011-10-12 オリンパスメディカルシステムズ株式会社 Capacitive ultrasonic transducer
JP5578836B2 (en) * 2008-12-25 2014-08-27 キヤノン株式会社 Electromechanical transducer and method for manufacturing the same
JP5511260B2 (en) 2009-08-19 2014-06-04 キヤノン株式会社 Capacitive electromechanical transducer and sensitivity adjustment method thereof
JP5876500B2 (en) * 2010-12-03 2016-03-02 リサーチ・トライアングル・インスティチュート Ultrasonic vibrator forming method and related apparatus
US9375850B2 (en) * 2013-02-07 2016-06-28 Fujifilm Dimatix, Inc. Micromachined ultrasonic transducer devices with metal-semiconductor contact for reduced capacitive cross-talk
WO2016011172A1 (en) 2014-07-16 2016-01-21 Chirp Microsystems Piezoelectric micromachined ultrasonic transducers using two bonded substrates
KR20160023154A (en) * 2014-08-21 2016-03-03 삼성전자주식회사 untrasonic transducer
JP6470406B2 (en) * 2015-05-29 2019-02-13 株式会社日立製作所 Ultrasonic transducer and ultrasonic inspection device
CN108886089B (en) 2016-03-23 2023-04-18 应美盛股份有限公司 Integrating AlN ultrasonic transducers on CMOS substrates using fusion bonding
US10441975B2 (en) * 2016-05-10 2019-10-15 Invensense, Inc. Supplemental sensor modes and systems for ultrasonic transducers
US10539539B2 (en) * 2016-05-10 2020-01-21 Invensense, Inc. Operation of an ultrasonic sensor
AU2018225762A1 (en) * 2017-02-27 2019-08-22 Butterfly Network, Inc. Capacitive micromachined ultrasonic transducers (CMUTs) and related apparatus and methods
JP6438544B2 (en) 2017-07-31 2018-12-12 キヤノン株式会社 Electromechanical converter
US10966683B2 (en) * 2018-03-22 2021-04-06 Exo Imaging Inc. Integrated ultrasonic transducers

Also Published As

Publication number Publication date
JP2021511219A (en) 2021-05-06
JP7215802B2 (en) 2023-01-31
US20210043826A1 (en) 2021-02-11
EP3743951A1 (en) 2020-12-02
TW201940250A (en) 2019-10-16
FR3077163A1 (en) 2019-07-26
CN111630673A (en) 2020-09-04
TWI800594B (en) 2023-05-01
WO2019141952A1 (en) 2019-07-25
EP3743951B1 (en) 2021-11-10
FR3077163B1 (en) 2021-08-27
US11706989B2 (en) 2023-07-18
KR20200108441A (en) 2020-09-18
US20230292618A1 (en) 2023-09-14

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