SG11202004817QA - An ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating - Google Patents
An ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coatingInfo
- Publication number
- SG11202004817QA SG11202004817QA SG11202004817QA SG11202004817QA SG11202004817QA SG 11202004817Q A SG11202004817Q A SG 11202004817QA SG 11202004817Q A SG11202004817Q A SG 11202004817QA SG 11202004817Q A SG11202004817Q A SG 11202004817QA SG 11202004817Q A SG11202004817Q A SG 11202004817QA
- Authority
- SG
- Singapore
- Prior art keywords
- coating
- manufacturing
- ethynyl
- composition
- derived composite
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/094—Multilayer resist systems, e.g. planarising layers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/02—Condensation polymers of aldehydes or ketones with phenols only of ketones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/28—Chemically modified polycondensates
- C08G8/30—Chemically modified polycondensates by unsaturated compounds, e.g. terpenes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D161/00—Coating compositions based on condensation polymers of aldehydes or ketones; Coating compositions based on derivatives of such polymers
- C09D161/04—Condensation polymers of aldehydes or ketones with phenols only
- C09D161/16—Condensation polymers of aldehydes or ketones with phenols only of ketones with phenols
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- General Chemical & Material Sciences (AREA)
- Wood Science & Technology (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Paints Or Removers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP17208939 | 2017-12-20 | ||
| PCT/EP2018/085147 WO2019121480A1 (en) | 2017-12-20 | 2018-12-17 | An ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11202004817QA true SG11202004817QA (en) | 2020-07-29 |
Family
ID=60953558
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11202004817QA SG11202004817QA (en) | 2017-12-20 | 2018-12-17 | An ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US11609498B2 (en) |
| EP (1) | EP3729196A1 (en) |
| JP (2) | JP7145217B2 (en) |
| KR (1) | KR20200100750A (en) |
| CN (1) | CN111492310A (en) |
| SG (1) | SG11202004817QA (en) |
| TW (2) | TWI802622B (en) |
| WO (1) | WO2019121480A1 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7161451B2 (en) * | 2019-07-05 | 2022-10-26 | 信越化学工業株式会社 | Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and method for forming pattern |
| JP2023521230A (en) | 2020-04-17 | 2023-05-23 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | Spin-coating composition comprising carbon material, metal-organic compound and solvent, and method for producing metal oxide film over substrate |
| JP7445583B2 (en) * | 2020-11-25 | 2024-03-07 | 信越化学工業株式会社 | Resist underlayer film material, pattern forming method, and resist underlayer film forming method |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3474054A (en) | 1966-09-13 | 1969-10-21 | Permalac Corp The | Surface coating compositions containing pyridine salts or aromatic sulfonic acids |
| US4200729A (en) | 1978-05-22 | 1980-04-29 | King Industries, Inc | Curing amino resins with aromatic sulfonic acid oxa-azacyclopentane adducts |
| US4251665A (en) | 1978-05-22 | 1981-02-17 | King Industries, Inc. | Aromatic sulfonic acid oxa-azacyclopentane adducts |
| US5187019A (en) | 1991-09-06 | 1993-02-16 | King Industries, Inc. | Latent catalysts |
| KR100816735B1 (en) * | 2006-12-20 | 2008-03-25 | 제일모직주식회사 | Hardmask composition having antireflective property, process of producing patterned materials by using the same and integrated circuit devices |
| US20090035704A1 (en) * | 2007-08-03 | 2009-02-05 | Hong Zhuang | Underlayer Coating Composition Based on a Crosslinkable Polymer |
| JP2011026375A (en) * | 2009-07-21 | 2011-02-10 | Sumitomo Bakelite Co Ltd | Film-forming composition, insulating film, and semiconductor device |
| KR101866828B1 (en) * | 2010-10-14 | 2018-06-14 | 닛산 가가쿠 고교 가부시키 가이샤 | Lithographic resist underlayer film-forming compound that comprises resin including polyether structure |
| FI20115628L (en) | 2011-06-20 | 2012-12-21 | Silecs Oy | New polymer composition and method for its preparation |
| JP6137486B2 (en) * | 2012-02-01 | 2017-05-31 | 日産化学工業株式会社 | Resist underlayer film forming composition containing copolymer resin containing heterocycle |
| KR102066229B1 (en) | 2013-03-26 | 2020-01-15 | 주식회사 동진쎄미켐 | Under-layer composition of resist and method for forming pattern using the the same |
| KR102134674B1 (en) * | 2014-06-16 | 2020-07-16 | 닛산 가가쿠 가부시키가이샤 | Resist underlayer film-forming composition |
| JP6641879B2 (en) * | 2015-03-03 | 2020-02-05 | Jsr株式会社 | Composition for forming resist underlayer film, method for producing resist underlayer film and patterned substrate |
| US20170137663A9 (en) | 2015-03-03 | 2017-05-18 | Jsr Corporation | Composition for resist underlayer film formation, resist underlayer film, and production method of patterned substrate |
| JP6711104B2 (en) * | 2015-04-24 | 2020-06-17 | Jsr株式会社 | Resist underlayer film forming method and pattern forming method |
| KR102421597B1 (en) * | 2015-07-14 | 2022-07-18 | 에스케이이노베이션 주식회사 | Novel polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and process for forming resist pattern using the composition |
| JP6625934B2 (en) * | 2015-07-14 | 2019-12-25 | 信越化学工業株式会社 | Resist underlayer film material, pattern forming method, and compound |
| JP6714493B2 (en) * | 2015-12-24 | 2020-06-24 | 信越化学工業株式会社 | Organic film forming compound, organic film forming composition, organic film forming method, and pattern forming method |
| JP6462602B2 (en) * | 2016-01-12 | 2019-01-30 | 信越化学工業株式会社 | Multilayer film forming method and pattern forming method |
-
2018
- 2018-12-17 CN CN201880082279.9A patent/CN111492310A/en active Pending
- 2018-12-17 JP JP2020529570A patent/JP7145217B2/en active Active
- 2018-12-17 EP EP18826272.9A patent/EP3729196A1/en active Pending
- 2018-12-17 US US16/956,733 patent/US11609498B2/en active Active
- 2018-12-17 WO PCT/EP2018/085147 patent/WO2019121480A1/en unknown
- 2018-12-17 SG SG11202004817QA patent/SG11202004817QA/en unknown
- 2018-12-17 KR KR1020207020791A patent/KR20200100750A/en active IP Right Grant
- 2018-12-18 TW TW107145722A patent/TWI802622B/en active
- 2018-12-18 TW TW112116049A patent/TW202332709A/en unknown
-
2022
- 2022-09-07 JP JP2022142321A patent/JP2022179491A/en active Pending
-
2023
- 2023-02-23 US US18/113,089 patent/US11914296B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| EP3729196A1 (en) | 2020-10-28 |
| JP2021506996A (en) | 2021-02-22 |
| KR20200100750A (en) | 2020-08-26 |
| JP2022179491A (en) | 2022-12-02 |
| TW202332709A (en) | 2023-08-16 |
| WO2019121480A1 (en) | 2019-06-27 |
| US20200401046A1 (en) | 2020-12-24 |
| US20230194989A1 (en) | 2023-06-22 |
| CN111492310A (en) | 2020-08-04 |
| TW201930379A (en) | 2019-08-01 |
| TWI802622B (en) | 2023-05-21 |
| JP7145217B2 (en) | 2022-09-30 |
| US11609498B2 (en) | 2023-03-21 |
| US11914296B2 (en) | 2024-02-27 |
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