SG11202001895RA - Methods and apparatus for controlling contaminant deposition on a dynode electron-emmissive surface - Google Patents

Methods and apparatus for controlling contaminant deposition on a dynode electron-emmissive surface

Info

Publication number
SG11202001895RA
SG11202001895RA SG11202001895RA SG11202001895RA SG11202001895RA SG 11202001895R A SG11202001895R A SG 11202001895RA SG 11202001895R A SG11202001895R A SG 11202001895RA SG 11202001895R A SG11202001895R A SG 11202001895RA SG 11202001895R A SG11202001895R A SG 11202001895RA
Authority
SG
Singapore
Prior art keywords
emmissive
methods
dynode electron
contaminant deposition
controlling contaminant
Prior art date
Application number
SG11202001895RA
Inventor
Wayne Sheils
Toby Shanley
Original Assignee
Adaptas Solutions Pty Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from AU2017904061A external-priority patent/AU2017904061A0/en
Application filed by Adaptas Solutions Pty Ltd filed Critical Adaptas Solutions Pty Ltd
Publication of SG11202001895RA publication Critical patent/SG11202001895RA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J43/00Secondary-emission tubes; Electron-multiplier tubes
    • H01J43/04Electron multipliers
    • H01J43/06Electrode arrangements
    • H01J43/10Dynodes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/025Detectors specially adapted to particle spectrometers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2209/00Apparatus and processes for manufacture of discharge tubes
    • H01J2209/01Generalised techniques
    • H01J2209/017Cleaning
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26Bombardment with radiation
    • H01L21/263Bombardment with radiation with high-energy radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
SG11202001895RA 2017-10-09 2018-08-29 Methods and apparatus for controlling contaminant deposition on a dynode electron-emmissive surface SG11202001895RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AU2017904061A AU2017904061A0 (en) 2017-10-09 Methods and apparatus for controlling contaminant deposition on a dynode electron-emmissive surface
PCT/AU2018/050930 WO2019071294A1 (en) 2017-10-09 2018-08-29 Methods and apparatus for controlling contaminant deposition on a dynode electron-emmissive surface

Publications (1)

Publication Number Publication Date
SG11202001895RA true SG11202001895RA (en) 2020-04-29

Family

ID=66100109

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202001895RA SG11202001895RA (en) 2017-10-09 2018-08-29 Methods and apparatus for controlling contaminant deposition on a dynode electron-emmissive surface

Country Status (9)

Country Link
US (1) US20210175043A1 (en)
EP (1) EP3695436A4 (en)
JP (1) JP7181288B2 (en)
KR (1) KR20200094130A (en)
CN (1) CN111466010A (en)
AU (1) AU2018349073A1 (en)
CA (1) CA3078239A1 (en)
SG (1) SG11202001895RA (en)
WO (1) WO2019071294A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112420477B (en) * 2020-10-30 2022-09-06 北方夜视技术股份有限公司 High-gain and low-luminescence ALD-MCP and preparation method and application thereof

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4347458A (en) * 1980-03-26 1982-08-31 Rca Corporation Photomultiplier tube having a gain modifying Nichrome dynode
US4978885A (en) * 1989-03-02 1990-12-18 Galileo Electro-Optics Corporation Electron multipliers with reduced ion feedback
JPH02288140A (en) * 1989-04-28 1990-11-28 Hitachi Ltd Charged particle sensor
US5205902A (en) * 1989-08-18 1993-04-27 Galileo Electro-Optics Corporation Method of manufacturing microchannel electron multipliers
DE69030145T2 (en) * 1989-08-18 1997-07-10 Galileo Electro Optics Corp Continuous thin film dynodes
JP4627916B2 (en) * 2001-03-29 2011-02-09 キヤノンアネルバ株式会社 Ionizer
GB2412231B (en) * 2004-02-26 2008-09-24 Electron Tubes Ltd Photomultiplier
US20090014644A1 (en) * 2007-07-13 2009-01-15 Inficon, Inc. In-situ ion source cleaning for partial pressure analyzers used in process monitoring
EP2447979A1 (en) 2009-06-22 2012-05-02 Shimadzu Corporation Mass spectrometer
CN106575598B (en) * 2014-08-01 2020-04-28 安捷伦科技有限公司 Plasma cleaning of mass spectrometer
US9799490B2 (en) * 2015-03-31 2017-10-24 Fei Company Charged particle beam processing using process gas and cooled surface
JP6889169B2 (en) * 2016-02-03 2021-06-18 アダプタス ソリューションズ プロプライエタリー リミテッド Devices and methods for controlling charged particles in a magnetic field

Also Published As

Publication number Publication date
CN111466010A (en) 2020-07-28
EP3695436A4 (en) 2021-06-16
EP3695436A1 (en) 2020-08-19
JP2020537283A (en) 2020-12-17
CA3078239A1 (en) 2019-04-18
KR20200094130A (en) 2020-08-06
WO2019071294A1 (en) 2019-04-18
JP7181288B2 (en) 2022-11-30
US20210175043A1 (en) 2021-06-10
AU2018349073A1 (en) 2020-04-16

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