SG11201806155SA - Fluoropolymer solution for forming a fluoropolymer coating - Google Patents

Fluoropolymer solution for forming a fluoropolymer coating

Info

Publication number
SG11201806155SA
SG11201806155SA SG11201806155SA SG11201806155SA SG11201806155SA SG 11201806155S A SG11201806155S A SG 11201806155SA SG 11201806155S A SG11201806155S A SG 11201806155SA SG 11201806155S A SG11201806155S A SG 11201806155SA SG 11201806155S A SG11201806155S A SG 11201806155SA
Authority
SG
Singapore
Prior art keywords
fluoropolymer
international
delaware
pct
solutions
Prior art date
Application number
SG11201806155SA
Inventor
Xudong Chen
Timothy Hopkins
Robert Clayton Wheland
Original Assignee
Chemours Co Fc Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chemours Co Fc Llc filed Critical Chemours Co Fc Llc
Publication of SG11201806155SA publication Critical patent/SG11201806155SA/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D127/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
    • C09D127/02Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
    • C09D127/12Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F214/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
    • C08F214/18Monomers containing fluorine
    • C08F214/186Monomers containing fluorine with non-fluorinated comonomers
    • C08F214/188Monomers containing fluorine with non-fluorinated comonomers with non-fluorinated vinyl ethers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D129/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Coating compositions based on hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Coating compositions based on derivatives of such polymers
    • C09D129/10Homopolymers or copolymers of unsaturated ethers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/20Diluents or solvents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • C08F230/085Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon the monomer being a polymerisable silane, e.g. (meth)acryloyloxy trialkoxy silanes or vinyl trialkoxysilanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2800/00Copolymer characterised by the proportions of the comonomers expressed
    • C08F2800/20Copolymer characterised by the proportions of the comonomers expressed as weight or mass percentages

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Formation Of Insulating Films (AREA)
  • Organic Insulating Materials (AREA)

Abstract

INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property -, Organization 11M1111101110101011111 Mt 01110111001110101111101111111011110111111 International Bureau .. .... ..Yejd (10) International Publication Number .... ...,,, (43) International Publication Date WO 2017/136266 Al 10 August 2017(10.08.2017) WIPO I PCT (51) International Patent Classification: (81) Designated States (unless otherwise indicated, for every C09D 127/12 (2006.01) C09D 143/04 (2006.01) kind of national protection available): AE, AG, AL, AM, C09D 129/10 (2006.01) AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, (21) International Application Number: DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, PCT/US2017/015593 HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, (22) International Filing Date: KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, 30 January 2017 (30.01.2017) MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, (25) Filing Language: English RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, (26) Publication Language: English TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (30) Priority Data: 62/291,994 5 February 2016 (05.02.2016) US (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, (71) Applicant: THE CHEMOURS COMPANY FC, LLC GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, [US/US]; 1007 Market Street, Wilmington, Delaware TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, 19801 (US). TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, (72) Inventors: CHEN, Xudong; 24 Cinnamon Drive, Hock- LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, essin, Delaware 19707 (US). HOPKINS, Timothy; 5 SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, Chickadee Circle, Newark, Delaware 19711 (US). WHE- — GW, KM, ML, MR, NE, SN, TD, TG). LAND, Robert Clayton; 510 Twaddell Mill Road, Wilm- _ ington, Delaware 19807 (US). Published: Agent: PALMER, Keith; Patent Legal Group, 7028-1, — with international search report (Art. 21(3)) (74) _ 1007 Market Street, Wilmington, Delaware 19801 (US). = = = = = = = = = = = = 1-1 ei en (54) Title: FLUOROPOLYMER SOLUTION FOR FORMING A FLUOROPOLYMER COATING 1-1 ---- (57) : The present disclosure relates to solutions for forming a fluoropolymer coatings, comprising: i) an organic solvent, IN and dissolved therein ii) a fluoropolymer comprising repeat units arising from specific fluoroolefin, alkyl or aryl vinyl ether and al - I-1 kenyl silane monomers. The present fluoropolymer solutions have long shelf stability life, minimal to no formation of insoluble N residue or gel over the period between their manufacture and use, are of a viscosity that allows for facile filtration and so are sub - en. ) stantially free from undesirable submicron size particles, have a dissolved polymer content such that the solutions are of utility in commercial single-coat coating processes, and afford fluoropolymer coatings on substrates that have excellent adhesion to the sub- strate during use and over the lifetime of the electronic device.
SG11201806155SA 2016-02-05 2017-01-30 Fluoropolymer solution for forming a fluoropolymer coating SG11201806155SA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201662291994P 2016-02-05 2016-02-05
PCT/US2017/015593 WO2017136266A1 (en) 2016-02-05 2017-01-30 Fluoropolymer solution for forming a fluoropolymer coating

Publications (1)

Publication Number Publication Date
SG11201806155SA true SG11201806155SA (en) 2018-08-30

Family

ID=58185602

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201806155SA SG11201806155SA (en) 2016-02-05 2017-01-30 Fluoropolymer solution for forming a fluoropolymer coating

Country Status (8)

Country Link
US (1) US11274226B2 (en)
EP (1) EP3411445B1 (en)
JP (2) JP2019511588A (en)
KR (1) KR20180105154A (en)
CN (1) CN108603068A (en)
SG (1) SG11201806155SA (en)
TW (1) TWI826347B (en)
WO (1) WO2017136266A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102542925B1 (en) * 2017-07-21 2023-06-16 더 케무어스 컴퍼니 에프씨, 엘엘씨 Photocrosslinkable fluoropolymer coating composition and passivation layer formed therefrom
JP2022519215A (en) 2019-01-28 2022-03-22 ザ ケマーズ カンパニー エフシー リミテッド ライアビリティ カンパニー A composition for producing a passivation layer and a passivation layer using the composition.
CN114555728B (en) * 2019-08-12 2024-04-09 科慕埃弗西有限公司 Adhesive amorphous perfluoropolymer composition
US20230272137A1 (en) * 2020-07-10 2023-08-31 The Chemours Company Fc, Llc Crosslinkable fluoropolymer and coating formed therefrom

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61141713A (en) * 1984-12-14 1986-06-28 Mitsui Petrochem Ind Ltd Solvent-soluble fluorocarbon polymer and its use
JPS61272273A (en) 1985-05-28 1986-12-02 Mitsui Petrochem Ind Ltd Fluorine-based coating
US4701508A (en) 1984-12-14 1987-10-20 Mitsui Sekiyu Kagaku Kogyo Kabushiki Kaisha Solvent soluble fluorine-containing polymer, coating composition containing the same and coating process thereof
JPH0699655B2 (en) 1985-10-09 1994-12-07 大日本インキ化学工業株式会社 Room temperature curable resin composition
EP0646625A3 (en) 1988-12-02 1996-05-29 Mitsui Petrochemical Ind Fluorine-containing copolymer composition.
US5179181A (en) 1988-12-02 1993-01-12 Mitsui Petrochemical Industries, Ltd. Process for producing fluorine-containing copolymer and fluorine-containing copolymer composition
JP3033105B2 (en) * 1989-11-27 2000-04-17 三井化学株式会社 Fluorine-containing copolymer composition, composition for fluorine-based coating and coating film thereof
JPH04202485A (en) 1990-11-30 1992-07-23 Central Glass Co Ltd Active radiation-curable coating composition
JPH08120212A (en) * 1994-10-25 1996-05-14 Central Glass Co Ltd Fluororesin coating composition
JPH08231919A (en) * 1995-02-24 1996-09-10 Central Glass Co Ltd Composition for fluororesin coating
JP3638065B2 (en) * 1995-11-15 2005-04-13 セントラル硝子株式会社 Fluororesin aqueous dispersion
US5962612A (en) 1996-11-28 1999-10-05 Asahi Glass Company Ltd. Fluorine-containing copolymer having rings on its main chain
EP1095938B1 (en) * 1998-07-09 2010-01-20 JSR Corporation Oxetane compounds, oxetane copolymer, and process for producing oxetane compounds
JP4081929B2 (en) * 1998-08-04 2008-04-30 Jsr株式会社 Photocurable resin composition and cured film
JP2001181551A (en) * 1999-10-13 2001-07-03 Toagosei Co Ltd Fluorine coating composition and application method of this composition
CN1246405C (en) * 2001-03-30 2006-03-22 罗姆和哈斯公司 Improved coating and coating composition
JP4000448B2 (en) * 2002-02-19 2007-10-31 Jsr株式会社 Coating composition for sliding member and sliding member
CN100537688C (en) * 2003-01-27 2009-09-09 大金工业株式会社 Coating composition
KR20050096161A (en) * 2003-01-29 2005-10-05 아사히 가라스 가부시키가이샤 Coating composition, antireflective film, photoresist and pattern forming method using same
CN101589078A (en) * 2007-02-15 2009-11-25 大金工业株式会社 Curable resin composition and method for producing the same
WO2011129011A1 (en) * 2010-04-16 2011-10-20 東ソー・エフテック株式会社 Composition for a low-refractive-index film
JP2012096188A (en) * 2010-11-04 2012-05-24 Toto Ltd Photocatalyst-coated body and photocatalyst coating liquid
CN102911314A (en) * 2011-08-02 2013-02-06 厦门名大科技有限公司 Anti-fouling wear-resisting transparent fluorine-silicone polymer material and preparation method thereof
EP2813540B1 (en) * 2012-02-08 2020-01-15 LG Chem, Ltd. Multilayered film and method for manufacturing same
CN103864996A (en) * 2012-12-13 2014-06-18 陈华 Silicon-fluorine-acrylic acid ternary polymerization latex and preparation method thereof
EP3152620B1 (en) 2014-06-03 2018-08-01 The Chemours Company FC, LLC Passivation layer comprising a photocrosslinked fluoropolymer

Also Published As

Publication number Publication date
EP3411445B1 (en) 2022-07-13
EP3411445A1 (en) 2018-12-12
KR20180105154A (en) 2018-09-27
TW201739851A (en) 2017-11-16
TWI826347B (en) 2023-12-21
JP2022027837A (en) 2022-02-14
JP2019511588A (en) 2019-04-25
CN108603068A (en) 2018-09-28
US20190040274A1 (en) 2019-02-07
US11274226B2 (en) 2022-03-15
WO2017136266A1 (en) 2017-08-10
JP7466513B2 (en) 2024-04-12

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