SG11201610075XA - Purge device, purge system, purge method, and control method in purge system - Google Patents

Purge device, purge system, purge method, and control method in purge system

Info

Publication number
SG11201610075XA
SG11201610075XA SG11201610075XA SG11201610075XA SG11201610075XA SG 11201610075X A SG11201610075X A SG 11201610075XA SG 11201610075X A SG11201610075X A SG 11201610075XA SG 11201610075X A SG11201610075X A SG 11201610075XA SG 11201610075X A SG11201610075X A SG 11201610075XA
Authority
SG
Singapore
Prior art keywords
purge
control method
purge system
control
purge device
Prior art date
Application number
SG11201610075XA
Inventor
Masanao Murata
Takashi Yamaji
Shinji Onishi
Original Assignee
Murata Machinery Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Machinery Ltd filed Critical Murata Machinery Ltd
Publication of SG11201610075XA publication Critical patent/SG11201610075XA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735Closed carriers
    • H01L21/67389Closed carriers characterised by atmosphere control
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041Cleaning
    • H01L21/02043Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02046Dry cleaning only
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67303Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
    • H01L21/67309Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterized by the substrate support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6732Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67346Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders characterized by being specially adapted for supporting a single substrate or by comprising a stack of such individual supports
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735Closed carriers
    • H01L21/67373Closed carriers characterised by locking systems
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735Closed carriers
    • H01L21/67383Closed carriers characterised by substrate supports
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735Closed carriers
    • H01L21/67386Closed carriers characterised by the construction of the closed carrier
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735Closed carriers
    • H01L21/67389Closed carriers characterised by atmosphere control
    • H01L21/67393Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67766Mechanical parts of transfer devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67769Storage means
SG11201610075XA 2014-06-16 2015-04-22 Purge device, purge system, purge method, and control method in purge system SG11201610075XA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014123371 2014-06-16
PCT/JP2015/062225 WO2015194255A1 (en) 2014-06-16 2015-04-22 Purge device, purge system, purge method, and control method in purge system

Publications (1)

Publication Number Publication Date
SG11201610075XA true SG11201610075XA (en) 2017-01-27

Family

ID=54935252

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201610075XA SG11201610075XA (en) 2014-06-16 2015-04-22 Purge device, purge system, purge method, and control method in purge system

Country Status (9)

Country Link
US (1) US9997387B2 (en)
EP (1) EP3157048B1 (en)
JP (1) JP6217855B2 (en)
KR (1) KR101903441B1 (en)
CN (1) CN106415812B (en)
IL (1) IL249214B (en)
SG (1) SG11201610075XA (en)
TW (1) TWI647017B (en)
WO (1) WO2015194255A1 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9875921B2 (en) * 2015-05-07 2018-01-23 Fabmatics Gmbh Flexible purge management system
JP6414525B2 (en) * 2015-09-02 2018-10-31 株式会社ダイフク Storage facilities
US10583983B2 (en) * 2016-03-31 2020-03-10 Daifuku Co., Ltd. Container storage facility
JP6623988B2 (en) * 2016-09-09 2019-12-25 株式会社ダイフク Container storage equipment
JP6572854B2 (en) 2016-09-09 2019-09-11 株式会社ダイフク Container storage equipment
JP6610476B2 (en) * 2016-09-09 2019-11-27 株式会社ダイフク Container storage equipment
WO2018150698A1 (en) * 2017-02-20 2018-08-23 村田機械株式会社 Purge stocker
JP6856015B2 (en) * 2017-12-20 2021-04-14 株式会社ダイフク Storage equipment
JP2019206051A (en) * 2018-05-29 2019-12-05 川崎重工業株式会社 Scavenging device and robot system comprising same, and scavenging method
CN108782330A (en) * 2018-06-22 2018-11-13 宿松县乡园禽业贸易有限责任公司 A kind of high-efficiency washing device of spiced egg
JP7090513B2 (en) * 2018-09-06 2022-06-24 東京エレクトロン株式会社 Board processing equipment and purging method
CN111601759B (en) 2018-12-28 2022-07-08 天津森罗科技股份有限公司 Controlled atmosphere storage system for traditional Chinese medicinal materials and control method thereof
JP7414570B2 (en) 2020-02-14 2024-01-16 キヤノン株式会社 Holding devices and lithography devices
TWI824554B (en) * 2021-06-08 2023-12-01 美商恩特葛瑞斯股份有限公司 Wafer container and purge system
JPWO2023067947A1 (en) * 2021-10-21 2023-04-27

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5879458A (en) * 1996-09-13 1999-03-09 Semifab Incorporated Molecular contamination control system
JPH11168135A (en) * 1997-12-03 1999-06-22 Toshiba Corp Substrate storing equipment and substrate storage method
JP2000332095A (en) * 1999-05-20 2000-11-30 Dan Sangyo Kk Method and device for sorting wafer
JP3902583B2 (en) * 2003-09-25 2007-04-11 Tdk株式会社 Purge system and purge method inside portable airtight container
US20090053017A1 (en) * 2006-03-17 2009-02-26 Shlomo Shmuelov Storage and purge system for semiconductor wafers
JP4670808B2 (en) * 2006-12-22 2011-04-13 ムラテックオートメーション株式会社 Container transport system and measuring container
JP4692584B2 (en) * 2008-07-03 2011-06-01 村田機械株式会社 Purge device
TWI357474B (en) * 2008-10-14 2012-02-01 Gudeng Prec Industral Co Ltd Gas filling socket, gas filling socket set, and ga
JP5236518B2 (en) * 2009-02-03 2013-07-17 株式会社ダン・タクマ Storage system and storage method
KR101433214B1 (en) * 2010-09-13 2014-08-22 무라다기카이가부시끼가이샤 Automated warehouse and article removal method
CN103548130B (en) * 2011-05-25 2016-08-17 村田机械株式会社 Load machine device, handling system and container take out of method
JP5598728B2 (en) 2011-12-22 2014-10-01 株式会社ダイフク Inert gas injection device
JP5709011B2 (en) * 2011-12-26 2015-04-30 株式会社ダイフク Goods storage facility
JP5716968B2 (en) * 2012-01-04 2015-05-13 株式会社ダイフク Goods storage facility
JP5557061B2 (en) * 2012-01-04 2014-07-23 株式会社ダイフク Goods storage facility
JP5598734B2 (en) * 2012-01-06 2014-10-01 株式会社ダイフク Goods storage facility
US9878353B2 (en) * 2012-08-21 2018-01-30 Murata Machinery, Ltd Stocker provided with purging functionality, stocker unit, and method for supplying cleaning gas
KR101575406B1 (en) * 2012-10-23 2015-12-07 가부시키가이샤 히다치 고쿠사이 덴키 Substrate processing apparatus, purging apparatus, method of manufacturing semiconductor device, and recording medium
WO2014141563A1 (en) * 2013-03-15 2014-09-18 株式会社日立国際電気 Substrate processing device, semiconductor device manufacturing method, substrate storage unit conveyance method and program
JP5884780B2 (en) * 2013-06-26 2016-03-15 株式会社ダイフク Storage facilities
JP6044467B2 (en) * 2013-06-26 2016-12-14 株式会社ダイフク Storage system
JP5874691B2 (en) * 2013-06-26 2016-03-02 株式会社ダイフク Inert gas supply equipment
JP6403431B2 (en) * 2013-06-28 2018-10-10 株式会社Kokusai Electric Substrate processing apparatus, flow rate monitoring method, semiconductor device manufacturing method, and flow rate monitoring program
US10438829B2 (en) * 2014-02-07 2019-10-08 Murata Machinery, Ltd. Purge device and purge method
US9607873B2 (en) * 2014-02-07 2017-03-28 Taiwan Semiconductor Manufacturing Company Ltd. Apparatus and operation method thereof
CN105917458B (en) * 2014-04-28 2019-04-23 村田机械株式会社 Purification device and purification method
KR101865091B1 (en) * 2014-06-16 2018-06-07 무라다기카이가부시끼가이샤 Purge stocker and purging method
JP6217598B2 (en) * 2014-11-12 2017-10-25 株式会社ダイフク Goods storage equipment
JP6451453B2 (en) * 2015-03-31 2019-01-16 Tdk株式会社 GAS PURGE DEVICE, LOAD PORT DEVICE, PURGE CONTAINER CONTAINER STAND, AND GAS PURGE METHOD
JP6409716B2 (en) * 2015-09-02 2018-10-24 株式会社ダイフク Storage shelf
JP6610475B2 (en) * 2016-09-09 2019-11-27 株式会社ダイフク Container storage equipment
JP6623988B2 (en) * 2016-09-09 2019-12-25 株式会社ダイフク Container storage equipment
JP6572854B2 (en) * 2016-09-09 2019-09-11 株式会社ダイフク Container storage equipment

Also Published As

Publication number Publication date
CN106415812B (en) 2019-01-11
CN106415812A (en) 2017-02-15
WO2015194255A1 (en) 2015-12-23
US20170133254A1 (en) 2017-05-11
JPWO2015194255A1 (en) 2017-04-20
IL249214B (en) 2020-06-30
US9997387B2 (en) 2018-06-12
EP3157048B1 (en) 2021-03-24
TWI647017B (en) 2019-01-11
IL249214A0 (en) 2017-01-31
TW201607631A (en) 2016-03-01
KR20170015996A (en) 2017-02-10
KR101903441B1 (en) 2018-10-02
JP6217855B2 (en) 2017-10-25
EP3157048A4 (en) 2018-03-14
EP3157048A1 (en) 2017-04-19

Similar Documents

Publication Publication Date Title
IL249214A0 (en) Purge device, purge system, purge method, and control method in purge system
SG11201606480XA (en) System, device and methods for brainwave-based technologies
EP3116166A4 (en) Control system, control device, and control method
IL251781B (en) Posture improvement device, system, and method
HK1244388A1 (en) Method, apparatus and system
GB2538480B (en) Vehicle control device, transport system, vehicle control method, and program
SG11201701316RA (en) Air-conditioning control device, air-conditioning control method, and air-conditioning control program
HK1219304A1 (en) Method, device and system for refrigeration control
HK1213703A1 (en) Login control system, method and device
HK1218451A1 (en) Method, device and system for customizing application function
EP2882180A4 (en) Control method, control apparatus and control device
EP3119130A4 (en) Restriction control device, restriction control system, and restriction control method
PT3232555T (en) Sub-module distributed control method, device and system
PT3210417T (en) Method, apparatus and system
PT3116823T (en) Drink-dispensing device, control system, and drink-dispensing method
EP3193510A4 (en) Control device, system and control method therefor
GB201417624D0 (en) Apparatus, system and method
EP3166262A4 (en) Control device, control system, control method, and control program
GB201701378D0 (en) Display device, display correction device, display correction system, and display correction method
GB2547173B (en) Blade-mounted sensor apparatus, systems, and methods
SG11201500568TA (en) Method for controlling information device, method for providing information, and program
GB2532524B (en) Ranging method, ranging device, location device and location method
GB2527630B (en) Ranging method, ranging device, location device and location method
SG11201608505VA (en) Power-control-network system, control device, and control program
EP3098716A4 (en) Control system, control device, subject device, and control method